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Languages : en
Pages : 31
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Book Description
Magnetron sputtering deposition is potentially the most economical deposition method for thin films. Presently sputtering can't deposit high temperature superconductors like Yttrium Barium Copper Oxide (YBCO) because of negative oxygen ion bombardment damage. Lowering the plasma discharge voltage to less than 100 volts would decrease such damage and make YBCO economically practical. The goal of this phase I effort was to lower plasma discharge voltages using high magnetic fields. Our results showed that high magnetic fields alone can lower plasma voltages to about 200 volts. Just as important, we showed that plasma impedance was lowered by more than ten times. Low plasma impedance allows high magnetic fields and electron injection into the plasma to be combined to lower plasma voltage to 30 volts. This combination removes the power limitations of electron injection. It should also produce epitaxial quality thin film semiconductors because low voltages allow 'self-bombardment' where the adatoms have the optimum energy to form a crystalline matrix at lower temperatures. The method is also applicable to thin film semiconductors such as II-VI solar cells and III-V films.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 31
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Book Description
Magnetron sputtering deposition is potentially the most economical deposition method for thin films. Presently sputtering can't deposit high temperature superconductors like Yttrium Barium Copper Oxide (YBCO) because of negative oxygen ion bombardment damage. Lowering the plasma discharge voltage to less than 100 volts would decrease such damage and make YBCO economically practical. The goal of this phase I effort was to lower plasma discharge voltages using high magnetic fields. Our results showed that high magnetic fields alone can lower plasma voltages to about 200 volts. Just as important, we showed that plasma impedance was lowered by more than ten times. Low plasma impedance allows high magnetic fields and electron injection into the plasma to be combined to lower plasma voltage to 30 volts. This combination removes the power limitations of electron injection. It should also produce epitaxial quality thin film semiconductors because low voltages allow 'self-bombardment' where the adatoms have the optimum energy to form a crystalline matrix at lower temperatures. The method is also applicable to thin film semiconductors such as II-VI solar cells and III-V films.
Author: Shigeru Hayakawa
Publisher: William Andrew Publishing
ISBN: 9780815512806
Category : Reference
Languages : en
Pages : 304
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Book Description
A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.
Author: Harald W. Weber
Publisher: Springer Science & Business Media
ISBN: 1489908463
Category : Technology & Engineering
Languages : en
Pages : 343
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Book Description
In the past two years conferences on superconductivity have been characterized by the attendance of hundreds of scientists. Consequently, the organizers were forced to schedule numerous parallel sessions and poster presentations with an almost unsurveyable amount of information. It was, therefore, felt that a more informal get-together, providing ample time for a thourough discussion of some topics of current interest in high-temperature superconductivity, was timely and benefitial for leading scientists as well as for newcomers in the field. The present volume contains the majority of papers presented at the International Discussion Meeting on High-Tc Superconductors held at the Mauterndorf Castle in the Austrian Alps from February 7 to 11, 1988. Each subject was introduced in review form by a few invited speakers and then discussed together with the contributed poster presentations. These discussion sessions chaired by selected scientists turned out to be the highlights of the meeting, not only because all the participants truly appreciated the possibility of an information exchange, but mainly because of the magnificent job done by the discussion chairmen, John A. Mydosh (Leiden), Martin Peter (Geneva) and Ken E. Gray (Argonne). First results on the just discovered Bi-superconductors and the clarification of electron resonance experiments on (123)-compounds should be mentioned in particular. The relaxed atomosphere favoring free discussions was certainly promoted by the surroundings offered in the Mauterndorf Castle, which dates back to 1253. Poster presentations and a conference banquet in historic knight's halls are certainly not found everyday in conference routines.
![High Rate Sputter Deposited Nb/sub 3/X Containing Oxygen. [Phases, Deposition Kinetics]. PDF](https://books.google.com/books/content/images/frontcover/tjPpwQEACAAJ?fife=w80-h100)
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Category :
Languages : en
Pages :
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The sputtering technique was used to make the following superconductors, for which the phases and deposition kinetics are discussed: Nb/sub 3/Ge + GeO/sub 2/, Nb/sub 3/Al + Al/sub 2/O/sub 3/, Nb/sub 3/Sn + SnO/sub 2/, Nb/sub 3/Si + Al/sub 2/O/sub 3/, Nb/sub 3/Ge + Al/sub 2/O/sub 3/. (JFP).
Author: United States. Congress. Joint Committee on Atomic Energy
Publisher:
ISBN:
Category :
Languages : en
Pages : 746
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Author: Kiyotaka Wasa
Publisher: William Andrew
ISBN: 1437734847
Category : Technology & Engineering
Languages : en
Pages : 657
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Book Description
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Author: United States. Congress. House. Committee on Science and Technology. Subcommittee on Energy Research, Development, and Demonstration
Publisher:
ISBN:
Category :
Languages : en
Pages : 720
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Author: United States. Energy Research and Development Administration
Publisher:
ISBN:
Category : Medicine
Languages : en
Pages :
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Author: Vipulkumar Patel
Publisher:
ISBN:
Category : Backscattering
Languages : en
Pages : 222
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Author: United States. Congress. Joint Committee on Atomic Energy
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 1042
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