High Mobility Materials for CMOS Applications PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download High Mobility Materials for CMOS Applications PDF full book. Access full book title High Mobility Materials for CMOS Applications by Nadine Collaert. Download full books in PDF and EPUB format.
Author: Nadine Collaert
Publisher: Woodhead Publishing
ISBN: 0081020627
Category : Technology & Engineering
Languages : en
Pages : 390
Get Book Here
Book Description
High Mobility Materials for CMOS Applications provides a comprehensive overview of recent developments in the field of (Si)Ge and III-V materials and their integration on Si. The book covers material growth and integration on Si, going all the way from device to circuit design. While the book's focus is on digital applications, a number of chapters also address the use of III-V for RF and analog applications, and in optoelectronics. With CMOS technology moving to the 10nm node and beyond, however, severe concerns with power dissipation and performance are arising, hence the need for this timely work on the advantages and challenges of the technology. - Addresses each of the challenges of utilizing high mobility materials for CMOS applications, presenting possible solutions and the latest innovations - Covers the latest advances in research on heterogeneous integration, gate stack, device design and scalability - Provides a broad overview of the topic, from materials integration to circuits
Author: Nadine Collaert
Publisher: Woodhead Publishing
ISBN: 0081020627
Category : Technology & Engineering
Languages : en
Pages : 390
Get Book Here
Book Description
High Mobility Materials for CMOS Applications provides a comprehensive overview of recent developments in the field of (Si)Ge and III-V materials and their integration on Si. The book covers material growth and integration on Si, going all the way from device to circuit design. While the book's focus is on digital applications, a number of chapters also address the use of III-V for RF and analog applications, and in optoelectronics. With CMOS technology moving to the 10nm node and beyond, however, severe concerns with power dissipation and performance are arising, hence the need for this timely work on the advantages and challenges of the technology. - Addresses each of the challenges of utilizing high mobility materials for CMOS applications, presenting possible solutions and the latest innovations - Covers the latest advances in research on heterogeneous integration, gate stack, device design and scalability - Provides a broad overview of the topic, from materials integration to circuits
Author: Shadpour Mallakpour
Publisher: Elsevier
ISBN: 0323886442
Category : Technology & Engineering
Languages : en
Pages : 480
Get Book Here
Book Description
Industrial Applications of Nanoceramics shows the unique processing, mechanical and surface characteristics of nanoceramics, covering their industrial application areas. These include the fabrication of capacitors, dense ceramics, corrosion-resistant coatings, solid electrolytes for fuel cells, sensors, batteries, cosmetic health, thermal barrier coatings, catalysts, bioengineering, automotive engineering, optoelectronics, computers, electronics, etc. This is an important reference source for materials scientists and engineers who are seeking to understand more about how nanoceramics are being used in a variety of industry sectors. Nanoceramics have the ability to show improved and unique properties, compared with conventional bulk ceramic materials. Zirconia (ZrO2), alumina (Al2O3), silicon carbide (SiC), silicon nitride (Si3N4) and titanium carbide fall into this category. - Outlines the superior chemical, physical and mechanical properties of nanoceramics compared with their macroscale counterparts - Includes major industrial applications of nanoceramics in energy, engineering and biomedicine - Explains the major processing techniques used for nanoceramic-based materials
Author: Jacopo Franco
Publisher: Springer Science & Business Media
ISBN: 9400776632
Category : Technology & Engineering
Languages : en
Pages : 203
Get Book Here
Book Description
Due to the ever increasing electric fields in scaled CMOS devices, reliability is becoming a showstopper for further scaled technology nodes. Although several groups have already demonstrated functional Si channel devices with aggressively scaled Equivalent Oxide Thickness (EOT) down to 5Å, a 10 year reliable device operation cannot be guaranteed anymore due to severe Negative Bias Temperature Instability. This book focuses on the reliability of the novel (Si)Ge channel quantum well pMOSFET technology. This technology is being considered for possible implementation in next CMOS technology nodes, thanks to its benefit in terms of carrier mobility and device threshold voltage tuning. We observe that it also opens a degree of freedom for device reliability optimization. By properly tuning the device gate stack, sufficiently reliable ultra-thin EOT devices with a 10 years lifetime at operating conditions are demonstrated. The extensive experimental datasets collected on a variety of processed 300mm wafers and presented here show the reliability improvement to be process - and architecture-independent and, as such, readily transferable to advanced device architectures as Tri-Gate (finFET) devices. We propose a physical model to understand the intrinsically superior reliability of the MOS system consisting of a Ge-based channel and a SiO2/HfO2 dielectric stack. The improved reliability properties here discussed strongly support (Si)Ge technology as a clear frontrunner for future CMOS technology nodes.
Author: David Louis Harame
Publisher: The Electrochemical Society
ISBN: 9781566774208
Category : Science
Languages : en
Pages : 1242
Get Book Here
Book Description
Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 328
Get Book Here
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2004, brings together researchers interested in strained SiGe, strain-relaxed buffers, strained Si on bulk Si and on SOI, SiGe on SOI, Ge substrates, and Ge on insulator.
Author: Fred Roozeboom
Publisher: The Electrochemical Society
ISBN: 1607687143
Category :
Languages : en
Pages : 356
Get Book Here
Book Description
Author: Cor Claeys
Publisher: Elsevier
ISBN: 008047490X
Category : Science
Languages : en
Pages : 476
Get Book Here
Book Description
Germanium is a semiconductor material that formed the basis for the development of transistor technology. Although the breakthrough of planar technology and integrated circuits put silicon in the foreground, in recent years there has been a renewed interest in germanium, which has been triggered by its strong potential for deep submicron (sub 45 nm) technologies. Germanium-Based technologies: From Materials to Devices is the first book to provide a broad, in-depth coverage of the field, including recent advances in Ge-technology and the fundamentals in material science, device physics and semiconductor processing. The contributing authors are international experts with a world-wide recognition and involved in the leading research in the field. The book also covers applications and the use of Ge for optoelectronics, detectors and solar cells. An ideal reference work for students and scientists working in the field of physics of semiconductor devices and materials, as well as for engineers in research centres and industry. Both the newcomer and the expert should benefit from this unique book. - State-of-the-art information available for the first time as an all-in-source - Extensive reference list making it an indispensable reference book - Broad coverage from fundamental aspects up to industrial applications
Author: Abhijit Biswas
Publisher: Springer Nature
ISBN: 9811615705
Category : Technology & Engineering
Languages : en
Pages : 251
Get Book Here
Book Description
This book presents a collection of peer-reviewed articles from the 7th International Conference on Microelectronics, Circuits, and Systems – Micro 2020. The volume covers the latest development and emerging research topics of material sciences, devices, microelectronics, circuits, nanotechnology, system design and testing, simulation, sensors, photovoltaics, optoelectronics, and its different applications. This book also deals with several tools and techniques to match the theme of the conference. It will be a valuable resource for researchers, professionals, Ph.D. scholars, undergraduate and postgraduate students working in Electronics, Microelectronics, Electrical, and Computer Engineering.
Author: Sneh Saurabh
Publisher: Cambridge University Press
ISBN: 1009200801
Category :
Languages : en
Pages : 983
Get Book Here
Book Description
Author: Angsuman Sarkar
Publisher: Elsevier
ISBN: 0323918336
Category : Technology & Engineering
Languages : en
Pages : 550
Get Book Here
Book Description
Approx.528 pagesApprox.528 pages
