Fluorine Atom Probe Techniques for Chemical Lasers PDF Download
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Author: H. R. Schlossberg
Publisher:
ISBN:
Category : Chemical lasers
Languages : en
Pages : 16
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Book Description
The infrared absorption coefficient and Raman scattering cross sections of the fluorine atom triplet P(3/2) to triplet P(1/2) transition at 404/cm are estimated. The results are discussed in terms of probing fluorine atom concentrations in chemical lasers. It is shown that absorption and coherent anti-Stokes Raman scattering can give sensitivity better than 10 raised to the fifteenth power atoms per cc.
Author: H. R. Schlossberg
Publisher:
ISBN:
Category : Chemical lasers
Languages : en
Pages : 16
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Book Description
The infrared absorption coefficient and Raman scattering cross sections of the fluorine atom triplet P(3/2) to triplet P(1/2) transition at 404/cm are estimated. The results are discussed in terms of probing fluorine atom concentrations in chemical lasers. It is shown that absorption and coherent anti-Stokes Raman scattering can give sensitivity better than 10 raised to the fifteenth power atoms per cc.
Author:
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ISBN:
Category : Aeronautics
Languages : en
Pages : 288
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Author: United States. Energy Research and Development Administration. Technical Information Center
Publisher:
ISBN:
Category : Force and energy
Languages : en
Pages : 1680
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Author:
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ISBN:
Category :
Languages : en
Pages : 724
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Author: National Research Council
Publisher: National Academies Press
ISBN: 0309175135
Category : Science
Languages : en
Pages : 74
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Book Description
In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.
Author:
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ISBN:
Category : Power resources
Languages : en
Pages : 1684
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Author:
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ISBN:
Category : Government reports announcements & index
Languages : en
Pages : 1052
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Author: United States. Energy Research and Development Administration
Publisher:
ISBN:
Category : Medicine
Languages : en
Pages :
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Author:
Publisher:
ISBN:
Category : Chemical lasers
Languages : en
Pages : 510
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Author: United States. Energy Research and Development Administration
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 716
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