Author: Chris A. Mack
Publisher: Society of Photo Optical
ISBN: 9780819462077
Category : Technology & Engineering
Languages : en
Pages : 122
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Book Description
This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Author: Bernard C. Kress
Publisher:
ISBN: 9781628411843
Category : Diffraction gratings
Languages : en
Pages : 172
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Book Description
Traditional macro-optics can be designed without complex design software tools. However, digital optics, especially wafer-scale micro-optics, require specific software and tools. There is often no analytical solution, and thus complex iterative optimization algorithms may be required. This book covers refractive and diffractive micro-optics, the iterative optimization process, and modeling and fabrication techniques crucial to this field. The ability to create hybrid systems capable of producing analog and digital functionality is also addressed.
Author: Ray Williamson
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819486769
Category : Optical instruments
Languages : en
Pages : 0
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Book Description
Provides optical designers, shop managers, opticians, and purchasers a concise reference explaining what the designer needs to know before making final choices and how to specify the components before they are ordered. It presents how conventional fabrication proceeds for representative components, alternative and emerging methods to optical fabrication, product evaluation, and the calculations used.
Author: Chris Mack
Publisher: John Wiley & Sons
ISBN: 1119965071
Category : Technology & Engineering
Languages : en
Pages : 503
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Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author: Raul Martín-Palma
Publisher:
ISBN: 9781510638594
Category :
Languages : en
Pages : 122
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Book Description
Author: Alan Symmons
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9781510640658
Category : Infrared equipment
Languages : en
Pages : 0
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Book Description
"Today's SWIR, MWIR, LWIR and multispectral technologies cover a wide range of commercial and military applications and continue to rapidly expand in almost every aspect of our lives. This Field Guide focuses on the most common infrared crystals and glasses used in these systems, from their manufacturing methods through modern optical fabrication technologies to the end-use applications. Detailed optical, crystallographic, mechanical, chemical, and thermal properties of the most popular infrared materials are reviewed in detail along with process flows and relative comparisons. The Field Guide to Infrared Optical Materials provides a concise and convenient resource for those interested in the materials used in infrared optical systems"--
Author: Paul F. McManamon
Publisher:
ISBN: 9781628416558
Category : Laser beams
Languages : en
Pages : 171
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Book Description
This Field Guide covers the various components and types of active electro-optical sensors - referred to as lidars in the text - from simple 2D direct-detection lidars to multiple subaperture synthetic aperture lidars. Other topics covered include receivers, apertures, atmospheric effects, and appropriate processing of different lidars. Lasers and modulation are presented in terms of their use in lidars. The lidar range equation in its many variations is discussed along with receiver noise issues that determine how much signal must be received to detect an object. This book is a handy reference to quickly look up any aspect of active electro-optical sensors. It will be useful to students, lidar scientists, or engineers needing an occasional reminder of the correct approaches or equations in certain applications, and systems engineers interested in gaining a perspective on this rapidly growing technology.
Author: Burn Jeng Lin
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9781510639959
Category : Lasers
Languages : en
Pages : 0
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Book Description
This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
Author: J. Scott Tyo
Publisher:
ISBN: 9781628415483
Category : Mathematics
Languages : en
Pages : 102
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Book Description
Linear systems is a broad and important area in many scientific and engineering disciplines, and it is especially important in optics because it forms the basis for Fourier optics, diffraction theory, image-quality assessment, and many other areas. This Field Guide provides the practicing optical engineer with a reference for the basic concepts and techniques of linear systems, including Fourier series, continuous and discrete Fourier transforms, convolution, sampling and aliasing, and MTF/PSF using the language, notation, and applications from optics, imaging, and diffraction.
Author: Xu Ma
Publisher: John Wiley & Sons
ISBN: 111804357X
Category : Technology & Engineering
Languages : en
Pages : 225
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Book Description
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
