Ferroelectric Thin Films XII: Volume 784

Ferroelectric Thin Films XII: Volume 784 PDF Author:
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 616

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2004, offers scientific and technological information on ferroelectric thin films from an international mix of academia, industry and government organizations.

Ferroelectric Thin Films XII: Volume 784

Ferroelectric Thin Films XII: Volume 784 PDF Author:
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 616

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2004, offers scientific and technological information on ferroelectric thin films from an international mix of academia, industry and government organizations.

Ferroelectric Thin Films

Ferroelectric Thin Films PDF Author:
Publisher:
ISBN:
Category : Ferroelectric thin films
Languages : en
Pages : 746

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Book Description


Domains in Ferroic Crystals and Thin Films

Domains in Ferroic Crystals and Thin Films PDF Author: Alexander Tagantsev
Publisher: Springer Science & Business Media
ISBN: 1441914226
Category : Science
Languages : en
Pages : 828

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Book Description
At present, the marketplace for professionals, researchers, and graduate students in solid-state physics and materials science lacks a book that presents a comprehensive discussion of ferroelectrics and related materials in a form that is suitable for experimentalists and engineers. This book proposes to present a wide coverage of domain-related issues concerning these materials. This coverage includes selected theoretical topics (which are covered in the existing literature) in addition to a plethora of experimental data which occupies over half of the book. The book presents experimental findings and theoretical understanding of ferroic (non-magnetic) domains developed during the past 60 years. It addresses the situation by looking specifically at bulk crystals and thin films, with a particular focus on recently-developed microelectronic applications and methods for observations of domains with techniques such as scanning force microscopy, polarized light microscopy, scanning optical microscopy, electron microscopy, and surface decorating techniques. "Domains in Ferroic Crystals and Thin Films" covers a large area of material properties and effects connected with static and dynamic properties of domains, which are extremely relevant to materials referred to as ferroics. In other textbooks on solid state physics, one large group of ferroics is customarily covered: those in which magnetic properties play a dominant role. Numerous books are specifically devoted to magnetic ferroics and cover a wide spectrum of magnetic domain phenomena. In contrast, "Domains in Ferroic Crystals and Thin Films" concentrates on domain-related phenomena in nonmagnetic ferroics. These materials are still inadequately represented in solid state physics textbooks and monographs.

New Materials for Microphotonics: Volume 817

New Materials for Microphotonics: Volume 817 PDF Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 304

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Interfacial Engineering for Optimized Properties

Interfacial Engineering for Optimized Properties PDF Author:
Publisher:
ISBN:
Category : Grain boundaries
Languages : en
Pages : 336

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Book Description


Thin Films

Thin Films PDF Author:
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 616

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Book Description


Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics - 2004

Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics - 2004 PDF Author: R. J. Carter
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 432

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Book Description
The scaling of device dimensions with a simultaneous increase in functional density has imposed tremendous challenges for materials, technology, integration and reliability of interconnects. To meet requirements of the ITRS roadmap, new materials are being introduced at a faster pace in all functions of multilevel interconnects. The issues addressed in this book cannot be dispelled as simply selecting a low-k material and integrating it into a copper damascene process. The intricacies of the back end for sub-100nm technology include novel processing of low-k materials, employing pore-sealing techniques and capping layers, introducing advanced dielectric and diffusion barriers, and developing novel integration schemes. This is in addition to concerns of performance, yield, and reliability appropriate to nanoscaled interconnects. Although many challenges continue to impede progress along the ITRS roadmap, the contributions in this book confront them head-on. It provides a scientific understanding of the issues and stimulate new approaches to advanced multilevel interconnects.

Amorphous and Nanocrystalline Silicon Science and Technology ...

Amorphous and Nanocrystalline Silicon Science and Technology ... PDF Author:
Publisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 768

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Book Description


Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics

Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics PDF Author:
Publisher:
ISBN:
Category : Dielectric films
Languages : en
Pages : 440

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Book Description


Amorphous and Nanocrystalline Silicon Science and Technology 2004: Volume 808

Amorphous and Nanocrystalline Silicon Science and Technology 2004: Volume 808 PDF Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 776

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Book Description
This book celebrates 20 years of MRS symposia on the topic of amorphous silicon. Contributors showed that the simplified theories developed to explain the limited experimental information available in the early eighties have spurred more sophisticated experimentation - either refining the early understanding or making it irrelevant. The differences of opinion that continue to exist and emerge are probably the hallmark of the amazing vitality of this field. Applications range from 'mature' thin-film transistors, solar cells and image sensors, to the 'emerging' possibility of erbium-doped nanocrystalline silicon-based materials for lasers and amorphous silicon quantum dots for luminescent devices. The book discusses material characterization, growth processes and devices. Each chapter is further subdivided into sections that group papers around common themes. Topics include: nanomaterials; electronic structure; metastable effects; understanding of growth processes; laser-induced crystallization; metal-induced crystallization; other growth techniques; newer devices; solar cells and thin-film transistors.