Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 10
Book Description
We describe initial experiments with a large (30 in.) plasma source chamber to explore the problems associated with large-area Inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400 mm semiconductor wafers. Our experiments typically use a 25 in. diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N2 over the pressure range 3--50 mtorr. R.F. Inductive power was run up to 2000W, but typically data were taken over the range 100--1000W. Diagnostics Include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400 mm processing are attainable. We present a comparison between computer modeling and experimental results for this source. Computer simulations using the fluid code INDUCT94 are used to explain variations In the plasma density profile measurements as a function of Inductive power, gas pressure and gas composition. Both Argon and Nitrogen discharges are modeled. INDUCT94 solves the 2D time-dependent fluid equations for electrons, ions and neutrals Including effects of both Inductive and capacitive coupling. Detailed volume and surface chemistry reactions are treated. We discuss the effects of pressure and power on plasma uniformity.
Experiments and Modeling with a Large-area Inductively Coupled Plasma (ICP) Source
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 10
Book Description
We describe initial experiments with a large (30 in.) plasma source chamber to explore the problems associated with large-area Inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400 mm semiconductor wafers. Our experiments typically use a 25 in. diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N2 over the pressure range 3--50 mtorr. R.F. Inductive power was run up to 2000W, but typically data were taken over the range 100--1000W. Diagnostics Include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400 mm processing are attainable. We present a comparison between computer modeling and experimental results for this source. Computer simulations using the fluid code INDUCT94 are used to explain variations In the plasma density profile measurements as a function of Inductive power, gas pressure and gas composition. Both Argon and Nitrogen discharges are modeled. INDUCT94 solves the 2D time-dependent fluid equations for electrons, ions and neutrals Including effects of both Inductive and capacitive coupling. Detailed volume and surface chemistry reactions are treated. We discuss the effects of pressure and power on plasma uniformity.
Publisher:
ISBN:
Category :
Languages : en
Pages : 10
Book Description
We describe initial experiments with a large (30 in.) plasma source chamber to explore the problems associated with large-area Inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400 mm semiconductor wafers. Our experiments typically use a 25 in. diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N2 over the pressure range 3--50 mtorr. R.F. Inductive power was run up to 2000W, but typically data were taken over the range 100--1000W. Diagnostics Include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400 mm processing are attainable. We present a comparison between computer modeling and experimental results for this source. Computer simulations using the fluid code INDUCT94 are used to explain variations In the plasma density profile measurements as a function of Inductive power, gas pressure and gas composition. Both Argon and Nitrogen discharges are modeled. INDUCT94 solves the 2D time-dependent fluid equations for electrons, ions and neutrals Including effects of both Inductive and capacitive coupling. Detailed volume and surface chemistry reactions are treated. We discuss the effects of pressure and power on plasma uniformity.
最新粉粒体プロセス技術集成
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
LLNL Large-area Inductively Coupled Plasma (ICP) Source
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 6
Book Description
We describe initial experiments with a large (76-cm diameter) plasma source chamber to explore the problems associated with large-area inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400-mm semiconductor wafers. Our experiments typically use a 640-nun diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N2 over the pressure range 3-50 mtorr. RF inductive power was run up to 2000W, but typically data were taken over the range 100-1000W. Diagnostics include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400-mm processing are attainable.
Publisher:
ISBN:
Category :
Languages : en
Pages : 6
Book Description
We describe initial experiments with a large (76-cm diameter) plasma source chamber to explore the problems associated with large-area inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400-mm semiconductor wafers. Our experiments typically use a 640-nun diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N2 over the pressure range 3-50 mtorr. RF inductive power was run up to 2000W, but typically data were taken over the range 100-1000W. Diagnostics include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400-mm processing are attainable.
Experimental Investigations on Scalability of Inductively Coupled-plasma Sources and an Improved Model for Characterization of ICP Sources
Author: Lakshmi Jyothi Pratti
Publisher:
ISBN:
Category : Inductively coupled plasma spectrometry
Languages : en
Pages : 302
Book Description
Publisher:
ISBN:
Category : Inductively coupled plasma spectrometry
Languages : en
Pages : 302
Book Description
Diagnostic Studies and Modeling of Inductively Coupled Plasmas
Author: Cheng-Che Hsu
Publisher:
ISBN:
Category :
Languages : en
Pages : 502
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 502
Book Description
Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing
Author: M. Meyyappan
Publisher: The Electrochemical Society
ISBN: 9781566771368
Category : Technology & Engineering
Languages : en
Pages : 366
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771368
Category : Technology & Engineering
Languages : en
Pages : 366
Book Description
JJAP
Author:
Publisher:
ISBN:
Category : Engineering
Languages : en
Pages : 986
Book Description
Publisher:
ISBN:
Category : Engineering
Languages : en
Pages : 986
Book Description
Journal of Research of the National Institute of Standards and Technology
Author:
Publisher:
ISBN:
Category : Measurement
Languages : en
Pages : 476
Book Description
Publisher:
ISBN:
Category : Measurement
Languages : en
Pages : 476
Book Description
Proceedings of the Symposium Om Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing
Author: M. Meyyappan
Publisher: The Electrochemical Society
ISBN: 9781566770965
Category : Technology & Engineering
Languages : en
Pages : 644
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566770965
Category : Technology & Engineering
Languages : en
Pages : 644
Book Description
Experimental Modeling of a Traveling-wave-excited Inductively Driven Coil for a Large Area Plasma Source for Flat Panel Processing
Author: Yaoxi Wu
Publisher:
ISBN:
Category :
Languages : en
Pages : 22
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 22
Book Description