Author: Harry A. Atwater
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 784
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Evolution of Surface and Thin Film Microstructure: Volume 280
Author: Harry A. Atwater
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 784
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 784
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Evolution of Surface and Thin Film Microstructure:
Author: Harry A. Atwater
Publisher: Cambridge University Press
ISBN: 9781107409590
Category : Technology & Engineering
Languages : en
Pages : 776
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Cambridge University Press
ISBN: 9781107409590
Category : Technology & Engineering
Languages : en
Pages : 776
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Evolution of Thin-Film and Surface Structure and Morphology: Volume 355
Author: B. G. Demczyk
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 696
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 696
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Mechanisms of Thin Film Evolution: Volume 317
Author: Steven M. Yalisove
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 664
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 664
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Thin Films: Volume 308
Author: Paul H. Townsend
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 808
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 808
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Handbook of Deposition Technologies for Films and Coatings
Author: Peter M. Martin
Publisher: William Andrew
ISBN: 0815520328
Category : Technology & Engineering
Languages : en
Pages : 932
Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Publisher: William Andrew
ISBN: 0815520328
Category : Technology & Engineering
Languages : en
Pages : 932
Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices
Author: Eric Garfunkel
Publisher: Springer Science & Business Media
ISBN: 9780792350071
Category : Technology & Engineering
Languages : en
Pages : 528
Book Description
An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.
Publisher: Springer Science & Business Media
ISBN: 9780792350071
Category : Technology & Engineering
Languages : en
Pages : 528
Book Description
An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.
Phase Transformations in Thin Films
Author: M. Atzmon
Publisher:
ISBN:
Category : Metals
Languages : en
Pages : 424
Book Description
Publisher:
ISBN:
Category : Metals
Languages : en
Pages : 424
Book Description
Atomic-scale Imaging of Surfaces and Interfaces
Author: D. K. Biegelsen
Publisher:
ISBN:
Category : Computers
Languages : en
Pages : 312
Book Description
Materials tunneling microscopy for hydrogen-desorption-induced structural change of Si(111) surface; Steps on the (110) surface InP; Scanning tunneling microscopy on charge density waves in layered compounds; Design of ultra high vacuum scanning electron microscope combined with scanning tunneling microscope; Scanning tunneling microscopy perspective of structures on reduced SrTiO3(001) surfaces; Surface structure and electronic property of reduced SrTiO3(100) surface observed by STM/STS; Metastable structural surface excitations and concerted adatom motions: a STM study of atomic motions within a semiconductor surface; Mechanisms and energetics of surface atomic processes: an atom-probe field ion microscope study; Atomic arrangement of Al near the phase boundaries between square root 3X square root 3-Al and 7X7 structures on Si(111) surfaces; Growth and surface morphology of thin silicon films using an atomic force microscope; Solving interface structures by combined electron microscopy and X-ray diffraction; Quantitative hrem study of the atomic structure of the sum(310)/[001] symmetric tilt grain boundary in Nb; Hrtem observation of a sum =3 \{112\} bicrystal boundary in aluminum; Atomic structure of the (310) twin in niobium; theoretical predictions and comparison with experimental observation; Quantitative high-resolution electron microscopy of grain boundaries in gamma-Al2=3; Comparisons of observed and simulated atomic structures of Pd/NiO heterophase interfaces; Atomic structure of sum =5 (130) symmetrical tilt boundary in strontium titanate; Assessment of GaInAs/GaInAsP interdiffusion profiles obtained using stem-edx and hrem; Electron microscopy characterization of epitaxial growth of Ag deposited on MgO microcubes; Real-time viewinf of dynamic processes on CdTe surfaces at elevated temperature; AFM imaging of the crystalline-to-amorphous transition on the surface of ion-implanted mica; AFM imagings of ferritin molecules bound to LB films of poly-1-benzyl-L-histidine; Artifacts in atomic force microscopy of nanoporous and mesoporous fiducial samples; Al induced reconstructions on the Si(111) surfaces studied by scanning tunneling microscopy; Structure of the sum =3 (111) grain boundary in Cu-1.5%Sb; High resolution electron microscopy of sum =3 NiSi2 (111)/(115) Si and NiSi2(221)/(001)Si interfaces; Image simulations of Ge twin boundaries; Surface structure of oxide catalyst microcrystals: high resolution electron microscopy study; A microstructural study of reaction-bonded silicon carbide...
Publisher:
ISBN:
Category : Computers
Languages : en
Pages : 312
Book Description
Materials tunneling microscopy for hydrogen-desorption-induced structural change of Si(111) surface; Steps on the (110) surface InP; Scanning tunneling microscopy on charge density waves in layered compounds; Design of ultra high vacuum scanning electron microscope combined with scanning tunneling microscope; Scanning tunneling microscopy perspective of structures on reduced SrTiO3(001) surfaces; Surface structure and electronic property of reduced SrTiO3(100) surface observed by STM/STS; Metastable structural surface excitations and concerted adatom motions: a STM study of atomic motions within a semiconductor surface; Mechanisms and energetics of surface atomic processes: an atom-probe field ion microscope study; Atomic arrangement of Al near the phase boundaries between square root 3X square root 3-Al and 7X7 structures on Si(111) surfaces; Growth and surface morphology of thin silicon films using an atomic force microscope; Solving interface structures by combined electron microscopy and X-ray diffraction; Quantitative hrem study of the atomic structure of the sum(310)/[001] symmetric tilt grain boundary in Nb; Hrtem observation of a sum =3 \{112\} bicrystal boundary in aluminum; Atomic structure of the (310) twin in niobium; theoretical predictions and comparison with experimental observation; Quantitative high-resolution electron microscopy of grain boundaries in gamma-Al2=3; Comparisons of observed and simulated atomic structures of Pd/NiO heterophase interfaces; Atomic structure of sum =5 (130) symmetrical tilt boundary in strontium titanate; Assessment of GaInAs/GaInAsP interdiffusion profiles obtained using stem-edx and hrem; Electron microscopy characterization of epitaxial growth of Ag deposited on MgO microcubes; Real-time viewinf of dynamic processes on CdTe surfaces at elevated temperature; AFM imaging of the crystalline-to-amorphous transition on the surface of ion-implanted mica; AFM imagings of ferritin molecules bound to LB films of poly-1-benzyl-L-histidine; Artifacts in atomic force microscopy of nanoporous and mesoporous fiducial samples; Al induced reconstructions on the Si(111) surfaces studied by scanning tunneling microscopy; Structure of the sum =3 (111) grain boundary in Cu-1.5%Sb; High resolution electron microscopy of sum =3 NiSi2 (111)/(115) Si and NiSi2(221)/(001)Si interfaces; Image simulations of Ge twin boundaries; Surface structure of oxide catalyst microcrystals: high resolution electron microscopy study; A microstructural study of reaction-bonded silicon carbide...
III-V Electronic and Photonic Device Fabrication and Performance: Volume 300
Author: K. S. Jones
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 648
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 648
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.