Dry Etching Technology for Semiconductors PDF Download
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Author: Kazuo Nojiri
Publisher: Springer
ISBN: 3319102958
Category : Technology & Engineering
Languages : en
Pages : 126
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Book Description
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
Author: Kazuo Nojiri
Publisher: Springer
ISBN: 3319102958
Category : Technology & Engineering
Languages : en
Pages : 126
Get Book
Book Description
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
Author: Catherine Jenkins
Publisher: Metropolitan Museum of Art
ISBN: 1588396495
Category : Art
Languages : en
Pages : 311
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Book Description
The Renaissance of Etching is a groundbreaking study of the origins of the etched print. Initially used as a method for decorating armor, etching was reimagined as a printmaking technique at the end of the fifteenth century in Germany and spread rapidly across Europe. Unlike engraving and woodcut, which required great skill and years of training, the comparative ease of etching allowed a wide variety of artists to exploit the expanding market for prints. The early pioneers of the medium include some of the greatest artists of the Renaissance, such as Albrecht Dürer, Parmigianino, and Pieter Bruegel the Elder, who paved the way for future printmakers like Rembrandt, Goya, and many others in their wake. Remarkably, contemporary artists still use etching in much the same way as their predecessors did five hundred years ago. Richly illustrated and including a wealth of new information, The Renaissance of Etching explores how artists in Germany, the Netherlands, Italy, and France developed the new medium of etching, and how it became one of the most versatile and enduring forms of printmaking. p.p1 {margin: 0.0px 0.0px 0.0px 0.0px; font: 14.0px Verdana}
Author: Henry Thomas Alken
Publisher:
ISBN:
Category : Etching
Languages : en
Pages : 92
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Book Description
Author: G. S. Mathad
Publisher: The Electrochemical Society
ISBN: 9781566772532
Category : Integrated circuits
Languages : en
Pages : 396
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Book Description
Author: M. Sugawara
Publisher: OUP Oxford
ISBN: 0191590290
Category : Technology & Engineering
Languages : en
Pages : 362
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Book Description
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Author: Ernest S. Lumsden
Publisher:
ISBN:
Category : Dry-point
Languages : en
Pages : 384
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Book Description
Author: G. S. Mathad
Publisher: The Electrochemical Society
ISBN: 9781566770668
Category : Technology & Engineering
Languages : en
Pages : 452
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Book Description
Author: Ruth Leaf
Publisher: Courier Corporation
ISBN: 0486139247
Category : Art
Languages : en
Pages : 242
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Book Description
Comprehensive handbook covers materials and equipment, tools, printing papers, presses, and other essentials. Detailed instructions for etching, engraving, drypoint, collagraphs, tuilegraphs, and the Blake transfer method.
Author: Norman Dobbins
Publisher: Cke Publications
ISBN:
Category : Art
Languages : en
Pages : 116
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Book Description
Instructions and patterns for glass etching using a sandblaster.
Author: Kathan Brown
Publisher:
ISBN:
Category : Art
Languages : en
Pages : 132
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Book Description
Cultural Writing. Art. Essays. MAGICAL SECRETS ABOUT THINKING CREATIVELY: THE ART OF ETCHING AND THE TRUTH OF LIFE by Kathan Brown is a new volume in the Magical Secrets series published by Crown Point Press in San Francisco. What are Magical Secrets? They are ways of setting yourself up for thinking creatively, for a sudden understanding, something like a miracle. Kathan Brown learned the Magical Secrets in this book by helping artists of extraordinary acclaim make etchings. She founded Crown Point Press, now probably the world's most influential etching publisher, in 1962. In this book, you'll meet sixteen artists who will be remembered by future generations. Kathan Brown knows them well, and with pictures and graceful, inviting prose she shares with you their ways of working, thinking, and being.
