Author: Don W. Shaw
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 678
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Epitaxial Heterostructures: Volume 198
Author: Don W. Shaw
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 678
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 678
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Epitaxial Crystal Growth
Author: E. Lendvay
Publisher: Trans Tech Publications Ltd
ISBN: 3035739757
Category : Technology & Engineering
Languages : en
Pages : 979
Book Description
Proceedings of the 1st International Conference on Epitaxial Crystal Growth, Budapest, Hungary, April 1990
Publisher: Trans Tech Publications Ltd
ISBN: 3035739757
Category : Technology & Engineering
Languages : en
Pages : 979
Book Description
Proceedings of the 1st International Conference on Epitaxial Crystal Growth, Budapest, Hungary, April 1990
Epitaxial Growth of Complex Metal Oxides
Author: Gertjan Koster
Publisher: Elsevier
ISBN: 1782422552
Category : Technology & Engineering
Languages : en
Pages : 505
Book Description
The atomic arrangement and subsequent properties of a material are determined by the type and conditions of growth leading to epitaxy, making control of these conditions key to the fabrication of higher quality materials. Epitaxial Growth of Complex Metal Oxides reviews the techniques involved in such processes and highlights recent developments in fabrication quality which are facilitating advances in applications for electronic, magnetic and optical purposes. Part One reviews the key techniques involved in the epitaxial growth of complex metal oxides, including growth studies using reflection high-energy electron diffraction, pulsed laser deposition, hybrid molecular beam epitaxy, sputtering processes and chemical solution deposition techniques for the growth of oxide thin films. Part Two goes on to explore the effects of strain and stoichiometry on crystal structure and related properties, in thin film oxides. Finally, the book concludes by discussing selected examples of important applications of complex metal oxide thin films in Part Three. - Provides valuable information on the improvements in epitaxial growth processes that have resulted in higher quality films of complex metal oxides and further advances in applications for electronic and optical purposes - Examines the techniques used in epitaxial thin film growth - Describes the epitaxial growth and functional properties of complex metal oxides and explores the effects of strain and defects
Publisher: Elsevier
ISBN: 1782422552
Category : Technology & Engineering
Languages : en
Pages : 505
Book Description
The atomic arrangement and subsequent properties of a material are determined by the type and conditions of growth leading to epitaxy, making control of these conditions key to the fabrication of higher quality materials. Epitaxial Growth of Complex Metal Oxides reviews the techniques involved in such processes and highlights recent developments in fabrication quality which are facilitating advances in applications for electronic, magnetic and optical purposes. Part One reviews the key techniques involved in the epitaxial growth of complex metal oxides, including growth studies using reflection high-energy electron diffraction, pulsed laser deposition, hybrid molecular beam epitaxy, sputtering processes and chemical solution deposition techniques for the growth of oxide thin films. Part Two goes on to explore the effects of strain and stoichiometry on crystal structure and related properties, in thin film oxides. Finally, the book concludes by discussing selected examples of important applications of complex metal oxide thin films in Part Three. - Provides valuable information on the improvements in epitaxial growth processes that have resulted in higher quality films of complex metal oxides and further advances in applications for electronic and optical purposes - Examines the techniques used in epitaxial thin film growth - Describes the epitaxial growth and functional properties of complex metal oxides and explores the effects of strain and defects
Epitaxy of Semiconductors
Author: Udo W. Pohl
Publisher: Springer Nature
ISBN: 3030438694
Category : Technology & Engineering
Languages : en
Pages : 546
Book Description
The extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today’s advanced electronic and optoelectronic devices, and it is considered one of the most important fields in materials research and nanotechnology. The book discusses the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and it describes the major growth techniques: metalorganic vapor-phase epitaxy, molecular-beam epitaxy, and liquid-phase epitaxy. It also examines in detail cubic and hexagonal semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures, and processes during nucleation and growth. Requiring only minimal knowledge of solid-state physics, it provides natural sciences, materials science and electrical engineering students and their lecturers elementary introductions to the theory and practice of epitaxial growth, supported by references and over 300 detailed illustrations. In this second edition, many topics have been extended and treated in more detail, e.g. in situ growth monitoring, application of surfactants, properties of dislocations and defects in organic crystals, and special growth techniques like vapor-liquid-solid growth of nanowires and selective-area epitaxy.
Publisher: Springer Nature
ISBN: 3030438694
Category : Technology & Engineering
Languages : en
Pages : 546
Book Description
The extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today’s advanced electronic and optoelectronic devices, and it is considered one of the most important fields in materials research and nanotechnology. The book discusses the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and it describes the major growth techniques: metalorganic vapor-phase epitaxy, molecular-beam epitaxy, and liquid-phase epitaxy. It also examines in detail cubic and hexagonal semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures, and processes during nucleation and growth. Requiring only minimal knowledge of solid-state physics, it provides natural sciences, materials science and electrical engineering students and their lecturers elementary introductions to the theory and practice of epitaxial growth, supported by references and over 300 detailed illustrations. In this second edition, many topics have been extended and treated in more detail, e.g. in situ growth monitoring, application of surfactants, properties of dislocations and defects in organic crystals, and special growth techniques like vapor-liquid-solid growth of nanowires and selective-area epitaxy.
Heteroepitaxy of Semiconductors
Author: John E. Ayers
Publisher: CRC Press
ISBN: 1420006649
Category : Technology & Engineering
Languages : en
Pages : 476
Book Description
Heteroepitaxy has evolved rapidly in recent years. With each new wave of material/substrate combinations, our understanding of how to control crystal growth becomes more refined. Most books on the subject focus on a specific material or material family, narrowly explaining the processes and techniques appropriate for each. Surveying the principles common to all types of semiconductor materials, Heteroepitaxy of Semiconductors: Theory, Growth, and Characterization is the first comprehensive, fundamental introduction to the field. This book reflects our current understanding of nucleation, growth modes, relaxation of strained layers, and dislocation dynamics without emphasizing any particular material. Following an overview of the properties of semiconductors, the author introduces the important heteroepitaxial growth methods and provides a survey of semiconductor crystal surfaces, their structures, and nucleation. With this foundation, the book provides in-depth descriptions of mismatched heteroepitaxy and lattice strain relaxation, various characterization tools used to monitor and evaluate the growth process, and finally, defect engineering approaches. Numerous examples highlight the concepts while extensive micrographs, schematics of experimental setups, and graphs illustrate the discussion. Serving as a solid starting point for this rapidly evolving area, Heteroepitaxy of Semiconductors: Theory, Growth, and Characterization makes the principles of heteroepitaxy easily accessible to anyone preparing to enter the field.
Publisher: CRC Press
ISBN: 1420006649
Category : Technology & Engineering
Languages : en
Pages : 476
Book Description
Heteroepitaxy has evolved rapidly in recent years. With each new wave of material/substrate combinations, our understanding of how to control crystal growth becomes more refined. Most books on the subject focus on a specific material or material family, narrowly explaining the processes and techniques appropriate for each. Surveying the principles common to all types of semiconductor materials, Heteroepitaxy of Semiconductors: Theory, Growth, and Characterization is the first comprehensive, fundamental introduction to the field. This book reflects our current understanding of nucleation, growth modes, relaxation of strained layers, and dislocation dynamics without emphasizing any particular material. Following an overview of the properties of semiconductors, the author introduces the important heteroepitaxial growth methods and provides a survey of semiconductor crystal surfaces, their structures, and nucleation. With this foundation, the book provides in-depth descriptions of mismatched heteroepitaxy and lattice strain relaxation, various characterization tools used to monitor and evaluate the growth process, and finally, defect engineering approaches. Numerous examples highlight the concepts while extensive micrographs, schematics of experimental setups, and graphs illustrate the discussion. Serving as a solid starting point for this rapidly evolving area, Heteroepitaxy of Semiconductors: Theory, Growth, and Characterization makes the principles of heteroepitaxy easily accessible to anyone preparing to enter the field.
Applications of High-Tc Superconductivity
Author: Adir Luiz
Publisher: BoD – Books on Demand
ISBN: 953307308X
Category : Science
Languages : en
Pages : 276
Book Description
This book is a collection of the chapters intended to study only practical applications of HTS materials. You will find here a great number of research on actual applications of HTS as well as possible future applications of HTS. Depending on the strength of the applied magnetic field, applications of HTS may be divided in two groups: large scale applications (large magnetic fields) and small scale applications (small magnetic fields). 12 chapters in the book are fascinating studies about large scale applications as well as small scale applications of HTS. Some chapters are presenting interesting research on the synthesis of special materials that may be useful in practical applications of HTS. There are also research about properties of high-Tc superconductors and experimental research about HTS materials with potential applications. The future of practical applications of HTS materials is very exciting. I hope that this book will be useful in the research of new radical solutions for practical applications of HTS materials and that it will encourage further experimental research of HTS materials with potential technological applications.
Publisher: BoD – Books on Demand
ISBN: 953307308X
Category : Science
Languages : en
Pages : 276
Book Description
This book is a collection of the chapters intended to study only practical applications of HTS materials. You will find here a great number of research on actual applications of HTS as well as possible future applications of HTS. Depending on the strength of the applied magnetic field, applications of HTS may be divided in two groups: large scale applications (large magnetic fields) and small scale applications (small magnetic fields). 12 chapters in the book are fascinating studies about large scale applications as well as small scale applications of HTS. Some chapters are presenting interesting research on the synthesis of special materials that may be useful in practical applications of HTS. There are also research about properties of high-Tc superconductors and experimental research about HTS materials with potential applications. The future of practical applications of HTS materials is very exciting. I hope that this book will be useful in the research of new radical solutions for practical applications of HTS materials and that it will encourage further experimental research of HTS materials with potential technological applications.
Materials for Optoelectronic Devices, OEICs and Photonics
Author: H. Schlötterer
Publisher: Elsevier
ISBN: 0444596755
Category : Science
Languages : en
Pages : 542
Book Description
The aim of the contributions in this volume is to give a current overview on the basic properties and applications of semiconductor and nonlinear optical materials for optoelectronics and integrated optics. They provide a cross-linkage between different materials (III-V, II-VI, Si-Ge, glasses, etc.), various sample dimensions (from bulk crystals to quantum dots), and a range of techniques for growth (LPE to MOMBE) and for processing (from surface passivation to ion beams). Major growth techniques and materials are discussed, including the sophisticated technologies required to exploit the exciting properties of low dimensional semiconductors. These proceedings will prove an invaluable guide to the current state of optoelectronic and nonlinear optical materials development, as well as indicating trends and also future markets for optoelectronic devices.
Publisher: Elsevier
ISBN: 0444596755
Category : Science
Languages : en
Pages : 542
Book Description
The aim of the contributions in this volume is to give a current overview on the basic properties and applications of semiconductor and nonlinear optical materials for optoelectronics and integrated optics. They provide a cross-linkage between different materials (III-V, II-VI, Si-Ge, glasses, etc.), various sample dimensions (from bulk crystals to quantum dots), and a range of techniques for growth (LPE to MOMBE) and for processing (from surface passivation to ion beams). Major growth techniques and materials are discussed, including the sophisticated technologies required to exploit the exciting properties of low dimensional semiconductors. These proceedings will prove an invaluable guide to the current state of optoelectronic and nonlinear optical materials development, as well as indicating trends and also future markets for optoelectronic devices.
Semiconductor Heterostructures
Author: Zh. I. Alferov
Publisher:
ISBN:
Category : Compound semiconductors
Languages : en
Pages : 296
Book Description
Publisher:
ISBN:
Category : Compound semiconductors
Languages : en
Pages : 296
Book Description
Silicon Molecular Beam Epitaxy
Author: E. Kasper
Publisher: CRC Press
ISBN: 1351085077
Category : Technology & Engineering
Languages : en
Pages : 306
Book Description
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
Publisher: CRC Press
ISBN: 1351085077
Category : Technology & Engineering
Languages : en
Pages : 306
Book Description
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
Nanoscale Ferroelectrics and Multiferroics
Author: Miguel Alguero
Publisher: John Wiley & Sons
ISBN: 1118935705
Category : Technology & Engineering
Languages : en
Pages : 984
Book Description
This two volume set reviews the key issues in processing and characterization of nanoscale ferroelectrics and multiferroics, and provides a comprehensive description of their properties, with an emphasis in differentiating size effects of extrinsic ones like boundary or interface effects. Recently described nanoscale novel phenomena are also addressed. Organized into three parts it addresses key issues in processing (nanostructuring), characterization (of the nanostructured materials) and nanoscale effects. Taking full advantage of the synergies between nanoscale ferroelectrics and multiferroics, the text covers materials nanostructured at all levels, from ceramic technologies like ferroelectric nanopowders, bulk nanostructured ceramics and thick films, and magnetoelectric nanocomposites, to thin films, either polycrystalline layer heterostructures or epitaxial systems, and to nanoscale free standing objects with specific geometries, such as nanowires and tubes at different levels of development. This set is developed from the high level European scientific knowledge platform built within the COST (European Cooperation in Science and Technology) Action on Single and multiphase ferroics and multiferroics with restricted geometries (SIMUFER, ref. MP0904). Chapter contributors have been carefully selected, and have all made major contributions to knowledge of the respective topics, and overall, they are among most respected scientists in the field.
Publisher: John Wiley & Sons
ISBN: 1118935705
Category : Technology & Engineering
Languages : en
Pages : 984
Book Description
This two volume set reviews the key issues in processing and characterization of nanoscale ferroelectrics and multiferroics, and provides a comprehensive description of their properties, with an emphasis in differentiating size effects of extrinsic ones like boundary or interface effects. Recently described nanoscale novel phenomena are also addressed. Organized into three parts it addresses key issues in processing (nanostructuring), characterization (of the nanostructured materials) and nanoscale effects. Taking full advantage of the synergies between nanoscale ferroelectrics and multiferroics, the text covers materials nanostructured at all levels, from ceramic technologies like ferroelectric nanopowders, bulk nanostructured ceramics and thick films, and magnetoelectric nanocomposites, to thin films, either polycrystalline layer heterostructures or epitaxial systems, and to nanoscale free standing objects with specific geometries, such as nanowires and tubes at different levels of development. This set is developed from the high level European scientific knowledge platform built within the COST (European Cooperation in Science and Technology) Action on Single and multiphase ferroics and multiferroics with restricted geometries (SIMUFER, ref. MP0904). Chapter contributors have been carefully selected, and have all made major contributions to knowledge of the respective topics, and overall, they are among most respected scientists in the field.