Electrical Probes for Plasma Diagnostics PDF Download
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Author: John Douglas Swift
Publisher: Iliffe
ISBN:
Category : Science
Languages : en
Pages : 350
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Book Description
Author: John Douglas Swift
Publisher: Iliffe
ISBN:
Category : Science
Languages : en
Pages : 350
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Book Description
Author: NN Misra
Publisher: Academic Press
ISBN: 012801489X
Category : Technology & Engineering
Languages : en
Pages : 382
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Book Description
Cold Plasma in Food and Agriculture: Fundamentals and Applications is an essential reference offering a broad perspective on a new, exciting, and growing field for the food industry. Written for researchers, industry personnel, and students interested in nonthermal food technology, this reference will lay the groundwork of plasma physics, chemistry, and technology, and their biological applications. Food scientists and food engineers interested in understanding the theory and application of nonthermal plasma for food will find this book valuable because it provides a roadmap for future developments in this emerging field. This reference is also useful for biologists, chemists, and physicists who wish to understand the fundamentals of plasma physics, chemistry, and technology and their biological interactions through applying novel plasma sources to food and other sensitive biomaterials. - Examines the topic of cold plasma technology for food applications - Demonstrates state-of-the-art developments in plasma technology and potential solutions to improve food safety and quality - Presents a solid introduction for readers on the topics of plasma physics and chemistry that are required to understand biological applications for foods - Serves as a roadmap for future developments for food scientists, food engineers, and biologists, chemists, and physicists working in this emerging field
Author: Francis F. Chen
Publisher: Springer Science & Business Media
ISBN: 1461501814
Category : Science
Languages : en
Pages : 213
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Book Description
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Author: Richard H. Huddlestone
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 652
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Book Description
Author: Anton Nikiforov
Publisher: BoD – Books on Demand
ISBN: 1838802495
Category : Science
Languages : en
Pages : 146
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Book Description
Plasma as the fourth state of matter is an ionized gas consisting of both negative and positive ions, electrons, neutral atoms, radicals, and photons. In the last few decades, atmospheric-pressure plasmas have started to attract increasing attention from both scientists and industry due to a variety of potential applications. Because of increasing interest in the topic, the focus of this book is on providing engineers and scientists with a fundamental understanding of the physical and chemical properties of different atmospheric-pressure plasmas via plasma diagnostic techniques and their applications. The book has been organized into two parts. Part I focuses on the latest achievements in advanced diagnostics of different atmospheric-pressure plasmas. Part II deals with applications of different atmospheric-pressure plasmas.
Author: Michael Keidar
Publisher: Academic Press
ISBN: 0128137037
Category : Technology & Engineering
Languages : en
Pages : 587
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Book Description
Plasma Engineering, Second Edition, applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields, such as materials processing, spacecraft propulsion and nanofabrication. The book considers this rapidly expanding discipline from a unified standpoint, addressing fundamentals of physics and modeling, as well as new and real-word applications in aerospace, nanotechnology and bioengineering. This updated edition covers the fundamentals of plasma physics at a level suitable for students using application examples and contains the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology and nanobioengineering. This is highly useful for courses on plasma engineering or plasma physics in departments of Aerospace Engineering, Electrical Engineering and Physics. It is also useful as an introduction to plasma engineering and its applications for early career researchers and practicing engineers. - Features new material relevant to application, including emerging areas of plasma nanotechnology and medicine - Contains a new chapter on plasma-based control, as well as a description of RF and microwave-based plasma applications, plasma lighting, reforming and other most recent application areas - Provides a technical treatment of the fundamental and engineering principles used in plasma applications
Author: André Anders
Publisher: Andre Anders
ISBN: 9783055012631
Category : Science
Languages : en
Pages : 280
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Book Description
Author: P.M. Chung
Publisher: Springer Science & Business Media
ISBN: 3642658865
Category : Science
Languages : en
Pages : 163
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Book Description
The electric probe has long been used as a fundamental diagnostic tool for measuring the local properties of a plasma. Since Langmuir first developed the electric-probe technique in 1924, probes have been used to measure electron densities and temperatures in a wide variety of gaseous ionized media, such as electric discharges, afterglows, ionizing shock waves, flames, MHD, and plasma-jet flows, reentry vehicle flow fields, and atmospheric and space plasmas. The first systematic account of modern theories of electriC-probe behavior was given by Chen (1965), who also provided practical information on experimental techniques. A subsequent survey by Swift and Schwar (1970), which was representative of results contained in the literature through 1969, included additional information on some of the modern theories and on practical details of probe utilization. The purpose of this volume is to supplement the previously mentioned two works by providing an account of a large body of the up-to-date informa tion available on electric probes, particularly in the areas of transitional and continuum-flow phenomena, and by offering, for all domains of probe appli cation, a critical appraisal of the more significant probe theories and experi mental investigations in the literature.
Author: John Douglas Swift
Publisher:
ISBN: 9780592050515
Category : Ionized gases
Languages : en
Pages : 343
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Book Description
Author: I. H. Hutchinson
Publisher: Cambridge University Press
ISBN: 9780521675741
Category : Science
Languages : en
Pages : 460
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Book Description
This book provides a systematic introduction to the physics of plasma diagnostics measurements. It develops from first principles the concepts needed to plan, execute and interpret plasma measurements, making it a suitable book for graduate students and professionals with little plasma physics background. The book will also be a valuable reference for seasoned plasma physicists, both experimental and theoretical, as well as those with an interest in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field.
