Electrical Characterization of N-type Gallium Nitride Grown by Metalorganic Vapor Deposition (MOCVD) on Sapphire

Electrical Characterization of N-type Gallium Nitride Grown by Metalorganic Vapor Deposition (MOCVD) on Sapphire PDF Author: Gabel Chong
Publisher:
ISBN:
Category :
Languages : en
Pages : 370

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Electrical Characterization of N-type Gallium Nitride Grown by Metalorganic Vapor Deposition (MOCVD) on Sapphire

Electrical Characterization of N-type Gallium Nitride Grown by Metalorganic Vapor Deposition (MOCVD) on Sapphire PDF Author: Gabel Chong
Publisher:
ISBN:
Category :
Languages : en
Pages : 370

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Growth and Characterization of Gallium Nitride on (0001) Sapphire by Plasma Enhanced Atomic Layer Epitaxy and by Low Pressure Metalorganic Chemical Vapor Deposition

Growth and Characterization of Gallium Nitride on (0001) Sapphire by Plasma Enhanced Atomic Layer Epitaxy and by Low Pressure Metalorganic Chemical Vapor Deposition PDF Author: Chiao-Yi Hwang
Publisher:
ISBN:
Category :
Languages : en
Pages : 326

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Gallium Nitride and Related Materials: Volume 395

Gallium Nitride and Related Materials: Volume 395 PDF Author: F. A. Ponce
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1008

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This book reflects the excitement in the scientific community about III-V nitrides. Based on papers presented at the First International Symposium on Gallium Nitride and Related Materials (ISGN-1), it reveals the large amount of work that has taken place since the field exploded with the announcement of commercial blue-light-emitting devices. The compound semiconductors in the III-V nitride systems are of increasing interest for high-performance optoelectronic and electronic device applications. These wide-bandgap semiconductor materials are also of great fundamental scientific interest because of their unique structural, electrical and optical properties. From the advances in the technologies for the heteroepitaxial growth of these materials, leading to improved quality and device performance, it is expected that III-V nitrides will soon be of significant practical and commercial interest. Topics include: crystal growth - substrates and early stages; molecular beam growth techniques; chemical vapor phase and alloys and novel growth techniques; structural properties; electronic properties; optical properties; point defects; hydrogen, etching and other materials processes; surfaces and metal contacts and devices.

The processing and characterization of gallium nitride devices grown by metalorganic chemical vapor deposition

The processing and characterization of gallium nitride devices grown by metalorganic chemical vapor deposition PDF Author: Bryan Stephen Shelton
Publisher:
ISBN:
Category :
Languages : en
Pages : 136

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State-of-the-Art Program on Compound Semiconductors 45 (SOTAPOCS 45) and Wide Bandgap Semiconductor Materials and Devices 7

State-of-the-Art Program on Compound Semiconductors 45 (SOTAPOCS 45) and Wide Bandgap Semiconductor Materials and Devices 7 PDF Author: F. Ren
Publisher: The Electrochemical Society
ISBN: 1566775051
Category : Compound semiconductors
Languages : en
Pages : 491

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Book Description
This volume contains papers from two symposia: State of the Art Program on Compound Semiconductors 45 and Wide Bandgap Semiconductor Materials and Devices VII.

Electrical, Optical, and Defect Properties of Carbon-doped Gallium Nitride Grown by Molecular-beam Epitaxy

Electrical, Optical, and Defect Properties of Carbon-doped Gallium Nitride Grown by Molecular-beam Epitaxy PDF Author: Robert David Armitage
Publisher:
ISBN:
Category :
Languages : en
Pages : 462

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Fabrication and Characterization of Gallium Nitride Electroluminescent Devices Co-doped with Rare Earth and Silicon

Fabrication and Characterization of Gallium Nitride Electroluminescent Devices Co-doped with Rare Earth and Silicon PDF Author: Wang Rui
Publisher:
ISBN:
Category :
Languages : en
Pages : 130

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Rare Earth (RE) doped III-nitrides are being widely investigated for potential applications in optical communication and displays, due to the wide and direct energy bandgap of GaN resulting in low thermal quenching of RE ion sharp emission from ultraviolet (UV) through visible to infrared (IR) region. The UC Nanolab has been conducting RE doped GaN research for more than 10 years and many achievements were obtained, ranging from material growth to device fabrication. This dissertation studied RE emission in GaN material, focusing on the effects of electronic impurity (Si) co-doping on RE luminescence. Advanced RE doped GaN electroluminescent devices (ELDs) were also designed and fabricated. Detailed device characterization was carried out and the effect of co-dopant was investigated. Eu-doped GaN thin films were grown on sapphire wafers by molecular beam epitaxy (MBE) technique and the growth conditions were optimized for the strongest Eu luminescence. It was found that GaN thin film quality and Eu doping concentration mutually affected Eu luminescence. High quality GaN:Eu thin films were grown under Ga rich condition (III/V>1), but the strongest Eu luminescence was obtained under slightly N rich condition (III/V1). The optimum Eu doping concentration is ~0.1-1.0at.%, depending on the GaN:Eu thin film quality. Higher growth temperature (750°C) was also found to enhance Eu luminescence intensity (~10x) and efficiency (~30x). The effect of Si co-doping in GaN:RE thin films was investigated. Eu photoluminescence (PL) was enhanced ~5-10x by moderate Si co-doping (~0.05at.%) mostly due to the increase of Eu PL lifetime, but decreased very fast at high Si co-doping concentration (>0.08at.%). The increase of Eu PL lifetime is possibly due to the incorporation of Si uniformly distributing Eu ions and shielding Eu-Eu interactions. Combined with the increase in excitation cross section and carrier flux, there is a significant enhancement on Eu PL intensity. The electrical properties of GaN:RE thin films were changed from high resistive to weakly n-type due to increased electron concentration introduced by Si co-doping. GaN:RE ELDs were fabricated and the electrical and optical properties were studied by I-V and electroluminescence (EL) measurements. A hetero-junction PIN structure was designed on n-GaN:Si/GaN:RE/p-Si, employing p-Si substrates as p-type conductive layer. RE ions EL emission was found to be much stronger under forward bias than under reverse bias. The Si co-doping was also studied in GaN:RE ELDs. It was found that Er EL had strong visible & IR emission under forward bias, while there is little or no emission under reverse bias. A pn hetero-junction structure formed between p-Si and n-GaN:(Si, Er) layers was proposed to be responsible for the emission control. GaN:(Si, Eu) AC thin film ELDs were also fabricated and shown that the Si co-doping increased the Eu ions emission intensity and efficiency.

Gallium Nitride and Related Materials II: Volume 468

Gallium Nitride and Related Materials II: Volume 468 PDF Author: C. R. Abernathy
Publisher: Materials Research Society
ISBN: 9781558993723
Category : Technology & Engineering
Languages : en
Pages : 534

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Book Description
This book from MRS dedicated to III-Nitrides, focuses on developments in AlN, GaN, InN and their alloys that are now finding application in short-wavelength lasers (~400nm, cw at room temperature) and high-power electronics (2.8W/mm at GHz). Experts from fields including crystal growth, condensed matter theory, source chemistry, device processing and device design come together in the volume to address issues of both scientific and technological relevance. And while much of the book reports on advances in material preparation and the understanding of defect issues, similar advances in material and device processing are also reported. Topics include: growth and doping; substrates and substrate effects; characterization; processing and device performance and design.

Synthesis of Compound Semiconducting Materials and Device Applications; Gallium Nitride Light Emitting Diodes

Synthesis of Compound Semiconducting Materials and Device Applications; Gallium Nitride Light Emitting Diodes PDF Author: Stanford University. Center for Materials Research
Publisher:
ISBN:
Category :
Languages : en
Pages : 222

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The synthesis and characterization of hetero-epitaxial gallium nitride (GaN) films were undertaken with particular reference to the phenomenon of light emission. Gallium nitride was grown by the chemical vapor deposition technique using sapphire substrates. Techniques for characterization included optical, scanning electron, and transmission electron microscopy and measurements of various electrical and optical properties of the films. The thin films of GaN were doped during growth with zinc and magnesium to form n-i junctions. Such material provided the basis for the fabrication of m-i-n light-emitting diodes, which emitted light in the high-energy violet region of the visible spectrum with Mg doping and green light with Zn doping. (Modified author abstract).

Handbook of GaN Semiconductor Materials and Devices

Handbook of GaN Semiconductor Materials and Devices PDF Author: Wengang (Wayne) Bi
Publisher: CRC Press
ISBN: 1351648055
Category : Science
Languages : en
Pages : 775

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Book Description
This book addresses material growth, device fabrication, device application, and commercialization of energy-efficient white light-emitting diodes (LEDs), laser diodes, and power electronics devices. It begins with an overview on basics of semiconductor materials, physics, growth and characterization techniques, followed by detailed discussion of advantages, drawbacks, design issues, processing, applications, and key challenges for state of the art GaN-based devices. It includes state of the art material synthesis techniques with an overview on growth technologies for emerging bulk or free standing GaN and AlN substrates and their applications in electronics, detection, sensing, optoelectronics and photonics. Wengang (Wayne) Bi is Distinguished Chair Professor and Associate Dean in the College of Information and Electrical Engineering at Hebei University of Technology in Tianjin, China. Hao-chung (Henry) Kuo is Distinguished Professor and Associate Director of the Photonics Center at National Chiao-Tung University, Hsin-Tsu, Taiwan, China. Pei-Cheng Ku is an associate professor in the Department of Electrical Engineering & Computer Science at the University of Michigan, Ann Arbor, USA. Bo Shen is the Cheung Kong Professor at Peking University in China.