Electrical and Optical Properties of Indium Tin Oxide PDF Download
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Author: Wing Yui Lam
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 114
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Book Description
Author: Wing Yui Lam
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 114
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Book Description
![Optical and Electrical Properties of Indium Tin Oxide Films Near Their Laser Damage Threshold [Electrical and Optical Properties of Indium Tin Oxide Films Under Multi-pulse Laser Irradiation at 1064 Nm]. PDF](https://books.google.com/books/content/images/frontcover/u43ctwEACAAJ?fife=w80-h100)
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 10
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Book Description
In this paper, we investigated whether the optical and electrical properties of indium tin oxide (ITO) films are degraded under laser irradiation below their laser ablation threshold. While performing multi-pulse laser damage experiments on a single ITO film (4.7 ns, 1064 nm, 10 Hz), we examined the optical and electrical properties in situ. A decrease in reflectance was observed prior to laser damage initiation. However, under sub-damage threshold irradiation, conductivity and reflectance of the film were maintained without measurable degradation. This indicates that ITO films in optoelectronic devices may be operated below their lifetime laser damage threshold without noticeable performance degradation.
Author: Gul Mohammed
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author: Hassan Memarian
Publisher:
ISBN:
Category :
Languages : en
Pages : 286
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Author: Richard A. Nyquist
Publisher: Academic Press
ISBN: 0125234503
Category : Science
Languages : en
Pages : 155
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Book Description
Handbook of Infrared and Raman Spectra of Inorganic Compounds and Organic Salts.
Author: Rongxin Wang
Publisher: Open Dissertation Press
ISBN: 9781361207796
Category :
Languages : en
Pages :
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Book Description
This dissertation, "Preparation and Post-annealing Effects on the Optical Properties of Indium Tin Oxide Thin Films" by Rongxin, Wang, 王榮新, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. Abstract: Abstract of thesis entitled PREPARATION AND POST-ANNEALING EFFECTS ON THE OPTICAL PROPERTIES OF INDIUM TIN OXIDE THIN FILMS Submitted by WANG Rong Xin for the degree of Doctor of Philosophy at The University of Hong Kong in April 2005 Many opto-electronic devices, such as III-V compound devices, liquid crystal displays, solar cells, organic and inorganic light emitting devices, and ultraviolet photodetectors, demand transparent electrode materials simultaneously having high electrical conductance. To meet the requirements for particular applications, a great deal of basic research and studies have been carried out on the electrical and optical properties of these materials. As a most promising candidate for such materials, indium tin oxide (ITO) has attracted interest in recent years. Furthermore, ITO has many unique properties such as excellent adhesion on the substrate, thermal stability and ease of patterning. The deposition of high-quality ITO thin films is a key step for successful application of ITO thin films as transparent electrode materials. To obtain optimal electrical and optical properties of ITO films, the growth parameters and conditions must be determined. Moreover, the optical and electrical properties of ITO contact layers, which can either be on the top side or the bottom side of a device, are influenced by various post-deposition treatments. For the present work, ITO thin films were deposited on glass and quartz substrates using e-beam evaporation with different deposition rates. The influence of substrate material, deposition rate, deposition gas environment and post-deposition annealing on the optical properties of the films was investigated in detail. Atomic force microscopy, X-ray diffraction and X-ray photoemission spectroscopy was employed to obtain information on the chemical state and crystallization of the films. Analysis of these data suggests that the substrate material, deposition rate, deposition gas environment and post-deposition annealing conditions strongly affect the chemical composition and the microstructure of the ITO films and these in turn influence the optical properties of the film. Oxygen incorporation transfers the In O phase to the In O phase and removes metallic In to form both indium oxide 2 3-x 2 3 phases. Both of these reactions are beneficial for the optical transmittance of ITO thin films. Moreover, it was found that the incorporation and decomposition reactions of oxygen can be controlled so as to change the optical properties of the ITO thin films reversibly. DOI: 10.5353/th_b3154617 Subjects: Thin films - Optical properties Indium compounds Annealing of metals
Author: R.D Tomlinson
Publisher: CRC Press
ISBN: 9780750304382
Category : Science
Languages : en
Pages : 1070
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Book Description
Multinary compounds are now used in a wide range of devices, including photovoltaic solar cells, light emitters and detectors, and piezoelectric actuators. Ternary and Multinary Compounds provides an interdisciplinary forum for scientists and engineers working on fundamental and applied aspects of these materials. The volume focuses on optoelectronic properties, electronic band structure, charge carrier transport, optical and magnetic properties, and superconductivity. It includes chapters on the research and development of new techniques and novel materials, such as laser ablation deposition and ferroelectrics.
Author: Douglas B. Chrisey
Publisher: Wiley-Interscience
ISBN: 9780471592181
Category : Technology & Engineering
Languages : en
Pages : 0
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Book Description
A comprehensive overview of what is required to set up and begin research in this newly developing technology and understand the basics of the process. Internationally recognized experts in their fields cover such fundamentals as history, theory, film characteristics, surface modification, laser technology, materials and applications including excellent reviews regarding the entire areas of semiconductor buffer layers, thin-film ferroelectrics and ferrites along with the work involving films deposited by PLD.
Author: Dennis V. Savitskij
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 110
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Author: Harland G. Tompkins
Publisher: Momentum Press
ISBN: 1606507281
Category : Technology & Engineering
Languages : en
Pages : 138
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Book Description
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
