Directed Self-assembly of Diblock Copolymer Thin Films on Chemically Nanopatterned Substrates PDF Download
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Author: Erik WiIliam Edwards
Publisher:
ISBN:
Category :
Languages : en
Pages : 248
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Book Description
Author: Erik WiIliam Edwards
Publisher:
ISBN:
Category :
Languages : en
Pages : 248
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Book Description
Author: Roel Gronheid
Publisher: Woodhead Publishing
ISBN: 0081002610
Category : Technology & Engineering
Languages : en
Pages : 328
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Book Description
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. - Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic - Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing - Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields
Author: Adam M. Welander
Publisher:
ISBN:
Category :
Languages : en
Pages : 118
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Book Description
Author: John A. Rogers
Publisher: John Wiley & Sons
ISBN: 0470405775
Category : Technology & Engineering
Languages : en
Pages : 616
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Book Description
Patterning or lithography is at the core of modern science and technology and cuts across all disciplines. With the emergence of nanotechnology, conventional methods based on electron beam lithography and extreme ultraviolet photolithography have become prohibitively expensive. As a result, a number of simple and unconventional methods have been introduced, beginning first with research demonstrations in the mid 1990s. This book focuses on these unconventional patterning techniques and their applications to optics, organic devices, electronic devices, biological devices, and fluidics.
Author: Stefano Cabrini
Publisher: CRC Press
ISBN: 1420090526
Category : Technology & Engineering
Languages : en
Pages : 548
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Book Description
While many books are dedicated to individual aspects of nanofabrication, there is no single source that defines and explains the total vision of the field. Filling this gap, Nanofabrication Handbook presents a unique collection of new and the most important established approaches to nanofabrication. Contributors from leading research facilities and academic institutions around the world define subfields, offer practical instructions and examples, and pave the way for future research. Helping readers to select the proper fabricating technique for their experiments, the book provides a broad vision of the most critical problems and explains how to solve them. It includes basic definitions and introduces the main underlying concepts of nanofabrication. The book also discusses the major advantages and disadvantages of each approach and offers a wide variety of examples of cutting-edge applications. Each chapter focuses on a particular method or aspect of study. For every method, the contributors describe the underlying theoretical basis, resolution, patterns and substrates used, and applications. They show how applications at the nanoscale require a different process and understanding than those at the microscale. For each experiment, they elucidate key solutions to problems relating to materials, methods, and surface considerations. A complete resource for this rapidly emerging interdisciplinary field, this handbook provides practical information for planning the experiments of any project that employs nanofabrication techniques. It gives readers a foundation to enter the complex world of nanofabrication and inspires the scientific community at large to push the limits of nanometer resolution.
Author: Bruce W. Smith
Publisher: CRC Press
ISBN: 1351643444
Category : Technology & Engineering
Languages : en
Pages : 913
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Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author: Ophelia Kwan Chui Tsui
Publisher: World Scientific
ISBN: 9812818820
Category : Science
Languages : en
Pages : 312
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Book Description
Ch. 1. Block copolymer thin films / J.-Y. Wang, S. Park and T. P. Russell -- ch. 2. Equilibration of block copolymer films on chemically patterned surfaces / G. S. W. Craig, H. Kang and P. F. Nealey -- ch. 3. Structure formation and evolution in confined cylinder-forming block copolymers / G. J. A. Sevink and J. G. E. M. Fraaije -- ch. 4. Block copolymer lithography for magnetic device fabrication / J. Y. Cheng and C. A. Ross -- ch. 5. Hierarchical structuring of polymer nanoparticles by self-organization / M. Shimomura ... [et al.] -- ch. 6. Wrinkling polymers for surface structure control and functionality / E. P. Chan and A. J. Crosby -- ch. 7. Crystallization in polymer thin films: morphology and growth / R. M. Van Horn and S. Z. D. Cheng -- ch. 8. Friction at soft polymer surface / M. K. Chaudhury, K. Vorvolakos and D. Malotky -- ch. 9. Relationship between molecular architecture, large-strain mechanical response and adhesive performance of model, block copolymer-based pressure sensitive adhesives / C. Creton and K. R. Shull -- ch. 10. Stability and dewetting of thin liquid films / K. Jacobs, R. Seemann and S. Herminghaus -- ch. 11. Anomalous dynamics of polymer Films / O. K. C. Tsui.
Author: J. Ping Liu
Publisher: Springer Science & Business Media
ISBN: 0387856005
Category : Science
Languages : en
Pages : 731
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Book Description
Nanoscale Magnetic Materials and Applications covers exciting new developments in the field of advanced magnetic materials. Readers will find valuable reviews of the current experimental and theoretical work on novel magnetic structures, nanocomposite magnets, spintronic materials, domain structure and domain-wall motion, in addition to nanoparticles and patterned magnetic recording media. Cutting-edge applications in the field are described by leading experts from academic and industrial communities. These include new devices based on domain wall motion, magnetic sensors derived from both giant and tunneling magnetoresistance, thin film devices in micro-electromechanical systems, and nanoparticle applications in biomedicine. In addition to providing an introduction to the advances in magnetic materials and applications at the nanoscale, this volume also presents emerging materials and phenomena, such as magnetocaloric and ferromagnetic shape memory materials, which motivate future development in this exciting field. Nanoscale Magnetic Materials and Applications also features a foreword written by Peter Grünberg, recipient of the 2007 Nobel Prize in Physics.
Author: Zheng Cui (author)
Publisher: Springer Nature
ISBN: 3031625463
Category :
Languages : en
Pages : 418
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Book Description
Author: Anbanandam Parthiban
Publisher: John Wiley & Sons
ISBN: 1118057465
Category : Technology & Engineering
Languages : en
Pages : 408
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Book Description
Understanding the reactivity of monomers is crucial in creating copolymers and determining the outcome of copolymerization. Covering the fundamental aspects of polymerization, Synthesis and Applications of Copolymers explores the reactivity of monomers and reaction conditions that ensure that the newly formed polymeric materials exhibit desired properties. Referencing a wide-range of disciplines, the book provides researchers, students, and scientists with the preparation of a diverse variety of copolymers and their recent developments, with a particular focus on copolymerization, crystallization, and techniques like nanoimprinting and micropatterning.
