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Author: Anand Asundi
Publisher: John Wiley & Sons
ISBN: 1119972787
Category : Technology & Engineering
Languages : en
Pages : 189
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Book Description
Approaching the topic of digital holography from the practical perspective of industrial inspection, Digital Holography for MEMS and Microsystem Metrology describes the process of digital holography and its growing applications for MEMS characterization, residual stress measurement, design and evaluation, and device testing and inspection. Asundi also provides a thorough theoretical grounding that enables the reader to understand basic concepts and thus identify areas where this technique can be adopted. This combination of both practical and theoretical approach will ensure the book's relevance and appeal to both researchers and engineers keen to evaluate the potential of digital holography for integration into their existing machines and processes. Addresses particle characterization where digital holography has proven capability for dynamic measurement of particles in 3D for sizing and shape characterization, with applications in microfluidics as well as crystallization and aerosol detection studies. Discusses digital reflection holography, digital transmission holography, digital in-line holography, and digital holographic tomography and applications. Covers other applications including micro-optical and diffractive optical systems and the testing of these components, and bio-imaging.
Author: Anand Asundi
Publisher: John Wiley & Sons
ISBN: 1119972787
Category : Technology & Engineering
Languages : en
Pages : 189
Get Book Here
Book Description
Approaching the topic of digital holography from the practical perspective of industrial inspection, Digital Holography for MEMS and Microsystem Metrology describes the process of digital holography and its growing applications for MEMS characterization, residual stress measurement, design and evaluation, and device testing and inspection. Asundi also provides a thorough theoretical grounding that enables the reader to understand basic concepts and thus identify areas where this technique can be adopted. This combination of both practical and theoretical approach will ensure the book's relevance and appeal to both researchers and engineers keen to evaluate the potential of digital holography for integration into their existing machines and processes. Addresses particle characterization where digital holography has proven capability for dynamic measurement of particles in 3D for sizing and shape characterization, with applications in microfluidics as well as crystallization and aerosol detection studies. Discusses digital reflection holography, digital transmission holography, digital in-line holography, and digital holographic tomography and applications. Covers other applications including micro-optical and diffractive optical systems and the testing of these components, and bio-imaging.
Author: Horacio D. Espinosa
Publisher: John Wiley & Sons
ISBN: 111848259X
Category : Technology & Engineering
Languages : en
Pages : 519
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Book Description
Research in nano and cell mechanics has received much attention from the scientific community as a result of society needs and government initiatives to accelerate developments in materials, manufacturing, electronics, medicine and healthcare, energy, and the environment. Engineers and scientists are currently engaging in increasingly complex scientific problems that require interdisciplinary approaches. In this regard, studies in this field draw from fundamentals in atomistic scale phenomena, biology, statistical and continuum mechanics, and multiscale modeling and experimentation. As a result, contributions in these areas are spread over a large number of specialized journals, which prompted the Editors to assemble this book. Nano and Cell Mechanics: Fundamentals and Frontiers brings together many of the new developments in the field for the first time, and covers fundamentals and frontiers in mechanics to accelerate developments in nano- and bio-technologies. Key features: • Provides an overview of recent advances in nano and cell mechanics. • Covers experimental, analytical, and computational tools used to investigate biological and nanoscale phenomena. • Covers fundamentals and frontiers in mechanics to accelerate developments in nano- and bio-technologies. • Presents multiscale-multiphysics modeling and experimentation techniques. • Examines applications in materials, manufacturing, electronics, medicine and healthcare. Nano and Cell Mechanics: Fundamentals and Frontiers is written by internationally recognized experts in theoretical and applied mechanics, applied physics, chemistry, and biology. It is an invaluable reference for graduate students of nano- and bio-technologies, researchers in academia and industry who are working in nano and cell mechanics, and practitioners who are interested in learning about the latest analysis tools. The book can also serve as a text for graduate courses in theoretical and applied mechanics, mechanical engineering, materials science, and applied physics.
Author: Nuno Silvestre
Publisher: John Wiley & Sons
ISBN: 1119068932
Category : Technology & Engineering
Languages : en
Pages : 327
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Book Description
Contains the latest research advances in computational nanomechanics in one comprehensive volume Covers computational tools used to simulate and analyse nanostructures Includes contributions from leading researchers Covers of new methodologies/tools applied to computational nanomechanics whilst also giving readers the new findings on carbon-based aggregates (graphene, carbon-nanotubes, nanocomposites) Evaluates the impact of nanoscale phenomena in materials
Author: Jun Taniguchi
Publisher: John Wiley & Sons
ISBN: 1118535065
Category : Technology & Engineering
Languages : en
Pages : 306
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Book Description
Nanoscale pattern transfer technology using molds is a rapidly advancing area and one that has seen much recent attention due to its potential for use in nanotechnology industries and applications. However, because of these rapid advances, it can be difficult to keep up with the technological trends and the latest cutting-edge methods. In order to fully understand these pioneering technologies, a comprehensive understanding of the basic science and an overview of the techniques are required. Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers covers the latest nanotransfer science based on polymer behaviour. Polymer fluid dynamics are described in detail, and injection moulding, nanoimprint lithography and micro contact printing are also discussed. Cutting-edge nanotransfer technologies and applications are also considered and future trends in industry are examined. Key features: • Covers the fundamentals of nanoimprint technology • Presents cutting-edge techniques and applications • Provides industrial examples and describes the mold fabrication process • Considers nanotransfer of thermoplastics by simulation • Describes the design and evaluation of UV curable polymer Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers is a comprehensive reference for industry engineers as well as graduate and undergraduate students, and is a useful source of information for anyone looking to improve their understanding of nanotransfer mechanisms and methods.
Author: Toru Yoshizawa
Publisher: CRC Press
ISBN: 1351831844
Category : Technology & Engineering
Languages : en
Pages : 866
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Book Description
Handbook of Optical Metrology: Principles and Applications begins by discussing key principles and techniques before exploring practical applications of optical metrology. Designed to provide beginners with an introduction to optical metrology without sacrificing academic rigor, this comprehensive text: Covers fundamentals of light sources, lenses, prisms, and mirrors, as well as optoelectronic sensors, optical devices, and optomechanical elements Addresses interferometry, holography, and speckle methods and applications Explains Moiré metrology and the optical heterodyne measurement method Delves into the specifics of diffraction, scattering, polarization, and near-field optics Considers applications for measuring length and size, displacement, straightness and parallelism, flatness, and three-dimensional shapes This new Second Edition is fully revised to reflect the latest developments. It also includes four new chapters—nearly 100 pages—on optical coherence tomography for industrial applications, interference microscopy for surface structure analysis, noncontact dimensional and profile metrology by video measurement, and optical metrology in manufacturing technology.
Author: Wolfgang Osten
Publisher: CRC Press
ISBN: 1498779506
Category : Science
Languages : en
Pages : 585
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Book Description
Where conventional testing and inspection techniques fail at the microscale, optical techniques provide a fast, robust, noninvasive, and relatively inexpensive alternative for investigating the properties and quality of microsystems. Speed, reliability, and cost are critical factors in the continued scale-up of microsystems technology across many industries, and optical techniques are in a unique position to satisfy modern commercial and industrial demands. Optical Inspection of Microsystems, Second Edition, extends and updates the first comprehensive survey of the most important optical measurement techniques to be successfully used for the inspection of microsystems. Under the guidance of accomplished researcher Wolfgang Osten, expert contributors from industrial and academic institutions around the world share their expertise and experience with techniques such as image processing, image correlation, light scattering, scanning probe microscopy, confocal microscopy, fringe projection, grid and moire techniques, interference microscopy, laser-Doppler vibrometry, digital holography, speckle metrology, spectroscopy, and sensor fusion technologies. They also examine modern approaches to data acquisition and processing, such as the determination of surface features and the estimation of uncertainty of measurement results. The book emphasizes the evaluation of various system properties and considers encapsulated components to increase quality and reliability. Numerous practical examples and illustrations of optical testing reinforce the concepts. Supplying effective tools for increased quality and reliability, this book Provides a comprehensive, up-to-date overview of optical techniques for the measurement and inspection of microsystems Discusses image correlation, displacement and strain measurement, electro-optic holography, and speckle metrology techniques Offers numerous practical examples and illustrations Includes calibration of optical measurement systems for the inspection of MEMS Presents the characterization of dynamics of MEMS
Author: Wolfgang Osten
Publisher: CRC Press
ISBN: 1420019163
Category : Science
Languages : en
Pages : 524
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Book Description
Where conventional testing and inspection techniques fail at the micro-scale, optical techniques provide a fast, robust, and relatively inexpensive alternative for investigating the properties and quality of microsystems. Speed, reliability, and cost are critical factors in the continued scale-up of microsystems technology across many industries, and optical techniques are in a unique position to satisfy modern commercial and industrial demands. Optical Inspection of Microsystems is the first comprehensive, up-to-date survey of the most important and widely used full-field optical metrology and inspection technologies. Under the guidance of accomplished researcher Wolfgang Osten, expert contributors from industrial and academic institutions around the world share their expertise and experience with techniques such as image correlation, light scattering, scanning probe microscopy, confocal microscopy, fringe projection, grid and moiré techniques, interference microscopy, laser Doppler vibrometry, holography, speckle metrology, and spectroscopy. They also examine modern approaches to data acquisition and processing. The book emphasizes the evaluation of various properties to increase reliability and promote a consistent approach to optical testing. Numerous practical examples and illustrations reinforce the concepts. Supplying advanced tools for microsystem manufacturing and characterization, Optical Inspection of Microsystems enables you to reach toward a higher level of quality and reliability in modern micro-scale applications.
Author: Gary S. Schajer
Publisher: John Wiley & Sons
ISBN: 1118402820
Category : Technology & Engineering
Languages : en
Pages : 328
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Book Description
An introductory and intermediate level handbook written in pragmatic style to explain residual stresses and to provide straightforward guidance about practical measurement methods. Residual stresses play major roles in engineering structures, with highly beneficial effects when designed well, and catastrophic effects when ignored. With ever-increasing concern for product performance and reliability, there is an urgent need for a renewed assessment of traditional and modern measurement techniques. Success critically depends on being able to make the most practical and effective choice of measurement method for a given application. Practical Residual Stress Measurement Methods provides the reader with the information needed to understand key residual stress concepts and to make informed technical decisions about optimal choice of measurement technique. Each chapter, written by invited specialists, follows a focused and pragmatic format, with subsections describing the measurement principle, residual stress evaluation, practical measurement procedures, example applications, references and further reading. The chapter authors represent both international academia and industry. Each of them brings to their writing substantial hands-on experience and expertise in their chosen field. Fully illustrated throughout, the book provides a much-needed practical approach to residual stress measurements. The material presented is essential reading for industrial practitioners, academic researchers and interested students. Key features: • Presents an overview of the principal residual stress measurement methods, both destructive and non-destructive, with coverage of new techniques and modern enhancements of established techniques • Includes stand-alone chapters, each with its own figures, tables and list of references, and written by an invited team of international specialists
Author: Olena Fesenko
Publisher: Springer
ISBN: 3319564226
Category : Science
Languages : en
Pages : 871
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Book Description
This book presents some of the latest achievements in nanotechnology and nanomaterials from leading researchers in Ukraine, Europe, and beyond. It features selected peer-reviewed contributions from participants in the 4th International Science and Practice Conference Nanotechnology and Nanomaterials (NANO2016) held in Lviv, Ukraine on August 24-27, 2016. The International Conference was organized jointly by the Institute of Physics of the National Academy of Sciences of Ukraine, Ivan Franko National University of Lviv (Ukraine), University of Tartu (Estonia), University of Turin (Italy), and Pierre and Marie Curie University (France). Internationally recognized experts from a wide range of universities and research institutions share their knowledge and key results on topics ranging from nanooptics, nanoplasmonics, and interface studies to energy storage and biomedical applications.
Author: Wolfgang Osten
Publisher: Springer Science & Business Media
ISBN: 3642363598
Category : Technology & Engineering
Languages : en
Pages : 975
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Book Description
In continuation of the FRINGE Workshop Series this Proceeding contains all contributions presented at the 7. International Workshop on Advanced Optical Imaging and Metrology. The FRINGE Workshop Series is dedicated to the presentation, discussion and dissemination of recent results in Optical Imaging and Metrology. Topics of particular interest for the 7. Workshop are: - New methods and tools for the generation, acquisition, processing, and evaluation of data in Optical Imaging and Metrology (digital wavefront engineering, computational imaging, model-based reconstruction, compressed sensing, inverse problems solution) - Application-driven technologies in Optical Imaging and Metrology (high-resolution, adaptive, active, robust, reliable, flexible, in-line, real-time) - High-dynamic range solutions in Optical Imaging and Metrology (from macro to nano) - Hybrid technologies in Optical Imaging and Metrology (hybrid optics, sensor and data fusion, model-based solutions, multimodality) - New optical sensors, imaging and measurement systems (integrated, miniaturized, in-line, real-time, traceable, remote) Special emphasis is put on new strategies, taking into account the active combination of physical modeling, computer aided simulation and experimental data acquisition. In particular attention is directed towards new approaches for the extension of existing resolution limits that open the gates to wide-scale metrology, ranging from macro to nano, by considering dynamic changes and using advanced optical imaging and sensor systems.
