Author: Yuri Mishin
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 576
Book Description
Participants of the symposium held in April 1998 in San Francisco as part of the 1998 MRS Spring Meeting cleared the fog at least on some aspects of solid-state diffusion, particularly experimental and simulation techniques that provide access to atomic-scale mechanisms of diffusion in diverse classes of crystalline materials. The 68 contributions (including 18 invited talks) added to the knowledge base in several key areas: diffusion mechanisms in metals and alloys, in intermetallic compounds, and in semiconductors; grain boundary and surface diffusion, and diffusion in quasicrystals; and diffusion and ionic conductivity in ionic materials. Annotation copyrighted by Book News, Inc., Portland, OR
Diffusion Mechanisms in Crystalline Materials: Volume 527
Author: Yuri Mishin
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 576
Book Description
Participants of the symposium held in April 1998 in San Francisco as part of the 1998 MRS Spring Meeting cleared the fog at least on some aspects of solid-state diffusion, particularly experimental and simulation techniques that provide access to atomic-scale mechanisms of diffusion in diverse classes of crystalline materials. The 68 contributions (including 18 invited talks) added to the knowledge base in several key areas: diffusion mechanisms in metals and alloys, in intermetallic compounds, and in semiconductors; grain boundary and surface diffusion, and diffusion in quasicrystals; and diffusion and ionic conductivity in ionic materials. Annotation copyrighted by Book News, Inc., Portland, OR
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 576
Book Description
Participants of the symposium held in April 1998 in San Francisco as part of the 1998 MRS Spring Meeting cleared the fog at least on some aspects of solid-state diffusion, particularly experimental and simulation techniques that provide access to atomic-scale mechanisms of diffusion in diverse classes of crystalline materials. The 68 contributions (including 18 invited talks) added to the knowledge base in several key areas: diffusion mechanisms in metals and alloys, in intermetallic compounds, and in semiconductors; grain boundary and surface diffusion, and diffusion in quasicrystals; and diffusion and ionic conductivity in ionic materials. Annotation copyrighted by Book News, Inc., Portland, OR
Diffusion Processes in Advanced Technological Materials
Author: Devendra Gupta
Publisher: Springer Science & Business Media
ISBN: 9780080947082
Category : Science
Languages : en
Pages : 552
Book Description
This new game book for understanding atoms at play aims to document diffusion processes and various other properties operative in advanced technological materials. Diffusion in functional organic chemicals, polymers, granular materials, complex oxides, metallic glasses, and quasi-crystals among other advanced materials is a highly interactive and synergic phenomenon. A large variety of atomic arrangements are possible. Each arrangement affects the performance of these advanced, polycrystalline multiphase materials used in photonics, MEMS, electronics, and other applications of current and developing interest. This book is written by pioneers in industry and academia for engineers, chemists, and physicists in industry and academia at the forefront of today's challenges in nanotechnology, surface science, materials science, and semiconductors.
Publisher: Springer Science & Business Media
ISBN: 9780080947082
Category : Science
Languages : en
Pages : 552
Book Description
This new game book for understanding atoms at play aims to document diffusion processes and various other properties operative in advanced technological materials. Diffusion in functional organic chemicals, polymers, granular materials, complex oxides, metallic glasses, and quasi-crystals among other advanced materials is a highly interactive and synergic phenomenon. A large variety of atomic arrangements are possible. Each arrangement affects the performance of these advanced, polycrystalline multiphase materials used in photonics, MEMS, electronics, and other applications of current and developing interest. This book is written by pioneers in industry and academia for engineers, chemists, and physicists in industry and academia at the forefront of today's challenges in nanotechnology, surface science, materials science, and semiconductors.
Handbook of Solid State Diffusion: Volume 1
Author: Aloke Paul
Publisher: Elsevier
ISBN: 0128043601
Category : Science
Languages : en
Pages : 550
Book Description
Handbook of Solid State Diffusion, Volume 1: Diffusion Fundamentals and Techniques covers the basic fundamentals, techniques, applications, and latest developments in the area of solid-state diffusion, offering a pedagogical understanding for students, academicians, and development engineers. Both experimental techniques and computational methods find equal importance in the first of this two-volume set. Volume 1 covers the fundamentals and techniques of solid-state diffusion, beginning with a comprehensive discussion of defects, then different analyzing methods, and finally concluding with an exploration of the different types of modeling techniques. - Presents a handbook with a short mathematical background and detailed examples of concrete applications of the sophisticated methods of analysis - Enables readers to learn the basic concepts of experimental approaches and the computational methods involved in solid-state diffusion - Covers bulk, thin film, and nanomaterials - Introduces the problems and analysis in important materials systems in various applications - Collates contributions from academic and industrial problems from leading scientists involved in developing key concepts across the globe
Publisher: Elsevier
ISBN: 0128043601
Category : Science
Languages : en
Pages : 550
Book Description
Handbook of Solid State Diffusion, Volume 1: Diffusion Fundamentals and Techniques covers the basic fundamentals, techniques, applications, and latest developments in the area of solid-state diffusion, offering a pedagogical understanding for students, academicians, and development engineers. Both experimental techniques and computational methods find equal importance in the first of this two-volume set. Volume 1 covers the fundamentals and techniques of solid-state diffusion, beginning with a comprehensive discussion of defects, then different analyzing methods, and finally concluding with an exploration of the different types of modeling techniques. - Presents a handbook with a short mathematical background and detailed examples of concrete applications of the sophisticated methods of analysis - Enables readers to learn the basic concepts of experimental approaches and the computational methods involved in solid-state diffusion - Covers bulk, thin film, and nanomaterials - Introduces the problems and analysis in important materials systems in various applications - Collates contributions from academic and industrial problems from leading scientists involved in developing key concepts across the globe
Rapid Thermal and Integrated Processing VII
Author: Materials Research Society
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 432
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 432
Book Description
Hydrogen in Semiconductors and Metals
Author: Norbert H. Nickel
Publisher:
ISBN:
Category : Metals
Languages : en
Pages : 480
Book Description
Publisher:
ISBN:
Category : Metals
Languages : en
Pages : 480
Book Description
Nanostructured Powders and Their Industrial Applications
Author: Gregory Beaucage
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 344
Book Description
Industrial and academic researchers describe their experience with synthesizing and using such powders as fumed silica, pyrolytic titania, precipitated silica, and less conventional species such as exfoliated clays. Of the 38 papers, the first four provide an overview and the rest focus on physical aspects, synthesis, and applications. Topics of invited papers include drying nano-size materials, synthesis by a room-temperature aerosol process, and gel mineralization as a model for bone formation. Annotation copyrighted by Book News, Inc., Portland, OR
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 344
Book Description
Industrial and academic researchers describe their experience with synthesizing and using such powders as fumed silica, pyrolytic titania, precipitated silica, and less conventional species such as exfoliated clays. Of the 38 papers, the first four provide an overview and the rest focus on physical aspects, synthesis, and applications. Topics of invited papers include drying nano-size materials, synthesis by a room-temperature aerosol process, and gel mineralization as a model for bone formation. Annotation copyrighted by Book News, Inc., Portland, OR
Properties and Processing of Vapor-Deposited Coatings: Volume 555
Author: Roger N. Johnson
Publisher:
ISBN:
Category : Reference
Languages : en
Pages : 456
Book Description
Sixty-one papers from the 1998 MRS fall meeting present research associated with generating microstructure-property-performance relationships of coatings produced by chemical and physical vapor deposition methods. Coverage includes properties and processing of PVD coatings, CVD coatings and films, CVD diamond, CVD diamond-like carbon, and hard coatings; coatings for harsh environments; CVD- chemistry and kinetics; and novel techniques. Annotation copyrighted by Book News, Inc., Portland, OR
Publisher:
ISBN:
Category : Reference
Languages : en
Pages : 456
Book Description
Sixty-one papers from the 1998 MRS fall meeting present research associated with generating microstructure-property-performance relationships of coatings produced by chemical and physical vapor deposition methods. Coverage includes properties and processing of PVD coatings, CVD coatings and films, CVD diamond, CVD diamond-like carbon, and hard coatings; coatings for harsh environments; CVD- chemistry and kinetics; and novel techniques. Annotation copyrighted by Book News, Inc., Portland, OR
Materials Science of Microelectromechanical Systems (MEMS) Devices
Author: Arthur H. Heuer
Publisher:
ISBN: 9781558994522
Category : Technology & Engineering
Languages : en
Pages : 270
Book Description
Publisher:
ISBN: 9781558994522
Category : Technology & Engineering
Languages : en
Pages : 270
Book Description
Dopant-dopant and Dopant-defect Processes Underlying Activation Kinetics
Author: Ali Mokhberi
Publisher:
ISBN:
Category :
Languages : en
Pages : 168
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 168
Book Description
Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon
Author: Peter Pichler
Publisher: Springer Science & Business Media
ISBN: 3709105978
Category : Technology & Engineering
Languages : en
Pages : 576
Book Description
This book contains the first comprehensive review of intrinsic point defects, impurities and their complexes in silicon. Besides compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behaviour from investigations, it gives a comprehensive introduction into the relevant fundamental concepts.
Publisher: Springer Science & Business Media
ISBN: 3709105978
Category : Technology & Engineering
Languages : en
Pages : 576
Book Description
This book contains the first comprehensive review of intrinsic point defects, impurities and their complexes in silicon. Besides compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behaviour from investigations, it gives a comprehensive introduction into the relevant fundamental concepts.