Deposition of Silicon Thin Films by Ion Beam Assisted Deposition PDF Download
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Author: Tejaswini Miryala
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 88
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Book Description
Author: Tejaswini Miryala
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 88
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Book Description
Author: Krishna Seshan
Publisher: William Andrew
ISBN: 1437778739
Category : Science
Languages : en
Pages : 412
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Book Description
Resumen: The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Author: Agustin Gonzalez-elipe
Publisher: World Scientific
ISBN: 1783261048
Category : Science
Languages : en
Pages : 299
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Book Description
This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 68
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Book Description
Author: T. Itoh
Publisher: Elsevier
ISBN: 0444599088
Category : Science
Languages : en
Pages : 458
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Book Description
This volume provides up to date information on the experimental, theoretical and technological aspects of film growth assisted by ion beams. Ion beam assisted film growth is one of the most effective techniques in aiding the growth of high-quality thin solid films in a controlled way. Moreover, ion beams play a dominant role in the reduction of the growth temperature of thin films of high melting point materials. In this way, ion beams make a considerable and complex contribution to film growth. The volume will be essential reading for scientists, engineers and students working in this field.
Author: Matthew James Adams
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: Joy George
Publisher: CRC Press
ISBN: 9780849306518
Category : Technology & Engineering
Languages : en
Pages : 394
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Book Description
"Preparation of Thin Films provides a comprehensive account of various deposition techniques for the preparation of thin films of elements, compounds, alloys, ceramics, and semiconductors - emphasizing inorganic compound thin films and discussing high vacuum and chemical deposition methods used for preparing high temperature superconducting oxide thin films. "
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 13
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Book Description
The direct ion beam deposition (IBD) technique has been used to study the formation of oriented aluminum films on single crystal silicon substrates. In the IBD process, thin film growth is accomplished by decelerating a magnetically-analyzed ion beam to low energies (10--200 eV) for direct deposition onto the substrate under UHV conditions. The energy of the incident ions can be selected to provide the desired growth conditions, and the mass analysis ensures good beam purity. The aluminum on silicon system is one which has been studied extensively by ionized cluster beam (ICB) deposition. In this work, we have studied the formation of such films by IBD with emphasis on the effects of ion energy, substrate temperature, and surface cleanliness. Oriented films have been grown on Si(111) at temperatures from 40° to 300°C and with ion energies from 30 to 120 eV per ion. Completed films were analyzed by ion scattering, x-ray diffraction, scanning electron microscopy, and optical microscopy. Results achieved for thin films grown by IBD are compared with results for similar films grown by ICB deposition. 15 refs., 3 figs.
Author: Jerome J. Cuomo
Publisher: William Andrew
ISBN:
Category : Science
Languages : en
Pages : 464
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Book Description
This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.
Author: Rointan Framroze Bunshah
Publisher: William Andrew
ISBN: 0815513372
Category : Science
Languages : en
Pages : 888
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Book Description
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
