Damage to VUV, EUV, and X-Ray Optics VI PDF Download
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Author: Libor Juha
Publisher:
ISBN: 9781510609730
Category :
Languages : en
Pages : 80
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Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author: Libor Juha
Publisher:
ISBN: 9781510609730
Category :
Languages : en
Pages : 80
Get Book Here
Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author: Libor Juha
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Science
Languages : en
Pages : 246
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Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author: Qiushi Huang
Publisher: Frontiers Media SA
ISBN: 2832513182
Category : Science
Languages : en
Pages : 95
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Book Description
Author: Libor Juha
Publisher:
ISBN: 9781510609747
Category :
Languages : en
Pages :
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Book Description
Author: Federico Canova
Publisher: Springer
ISBN: 3662474433
Category : Science
Languages : en
Pages : 205
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Book Description
The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Author: Michael Wang
Publisher: BoD – Books on Demand
ISBN: 9533070641
Category : Science
Languages : en
Pages : 680
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Book Description
Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
Author: Kiyoshi Ueda
Publisher: MDPI
ISBN: 3038428795
Category : Mathematics
Languages : en
Pages : 457
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Book Description
This book is a printed edition of the Special Issue "X-Ray Free-Electron Laser" that was published in Applied Sciences
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 434
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Book Description
Author: Libor Juha
Publisher: Society of Photo Optical
ISBN: 9780819476357
Category : Technology & Engineering
Languages : en
Pages : 308
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Book Description
Includes Proceedings Vol. 7821
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 9780819458452
Category : Art
Languages : en
Pages : 1104
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Book Description
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
