Contribution à l'étude de l'arséniure de gallium par la technique des jets moléculaires PDF Download
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Author: Patrick Méquin
Publisher:
ISBN:
Category :
Languages : fr
Pages : 150
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Author: Patrick Méquin
Publisher:
ISBN:
Category :
Languages : fr
Pages : 150
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Author: NAKITA.. VODJDANI
Publisher:
ISBN:
Category :
Languages : fr
Pages : 207
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Book Description
ETAT DE L'ART SUR LES TECHNIQUES D'EPITAXIE PAR JETS MOLECULAIRES ET D'EPITAXIE EN PHASE VAPEUR A PARTIR DES COMPOSES ORGANOMETALLIQUES ET D'HYDRURES ET APPLICATION A LA CROISSANCE DE GAAS ET GA::(X)AL::(1-X)AS. DESCRIPTION DU SYSTEME UTILISE: MONTAGE ULTRAVIDE, DIFFERENTES TECHNIQUES D'ANALYSE IN SITU. ETUDES PRELIMINAIRES: INTERACTION DU TRIMETHYLGALLIUM, DU TRIMETHYLALUMINIUM ET DE L'ARSENIC AVEC UN SUPPORT CHAUFFE, ANALYSE DE LA DECOMPOSITION THERMIQUE DES ORGANOMETALLIQUES ET DES HYDRURES PAR SPECTROMETRIE DE MASSE. CROISSANCE EPITAXIQUE DE GAAS. EPITAXIE SELECTIVE DE GAAS
Author: Philippe Guétin
Publisher:
ISBN:
Category :
Languages : fr
Pages : 109
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Author: Adly el- Chamy (auteur d'une thèse de sciences.)
Publisher:
ISBN:
Category :
Languages : fr
Pages : 124
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Book Description
DEMONSTRATION DE LA FAISABILITE DES CONTACTS OHMIQUES ET DES JONCTIONS PN REALISEES PAR IMPLANTATION EN METTANT EN OEUVRE DES MOYENS SIMPLES D'ENCAPSULATION. DEVELOPPEMENT DE LA THEORIE GENERALE DE L'IMPLANTATION ET DE LA DIFFUSION DES IMPURETES DANS GAAS EN INSITANT SUR LES DEFAUTS CREES. DEDUCTION DES ENCAPSULANTS POUVANT SERVIR PENDANT LE RECUIT. PRESENTATION DES MOYENS EXPERIMENTAUX MIS EN OEUVRE ET DISCUSSION DES RESULTATS EXPERIMENTAUX OBTENUS
Author: Pierre Bourgeois
Publisher:
ISBN:
Category :
Languages : fr
Pages : 186
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Author: LAURENT.. GUILBERT
Publisher:
ISBN:
Category :
Languages : fr
Pages :
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UN EQUIPEMENT CZOCHRALSKI SILICIUM A ETE TRANSFORME POUR ELABORER DES LINGOTS DE GAAS DE 3 POUCES SOUS PRESSION REDUITE. UN PROCEDE ORIGINAL A ETE MIS EN UVRE POUR REALISER LA SYNTHESE DU COMPOSE AVANT LE TIRAGE DU CRISTAL SOUS ENCAPSULANT. DES MESURES THERMIQUES IN SITU MONTRENT QUE LES GRADIENTS SONT 2 A 4 FOIS PLUS FAIBLES QUE DANS UN FOUR CZOCHRALSKI HAUTE PRESSION, ET QUE LES ECHANGES S'OPERENT PRINCIPALEMENT PAR RADIATION A TRAVERS L'ENCAPSULANT. L'INFLUENCE DES CONDITIONS THERMIQUES SUR LA FORME D'INTERFACE ET LA GENERATION DES DEFAUTS EST ETUDIEE. LES REVELATIONS CHIMIQUES FONT APPARAITRE UNE STRUCTURE CELLULAIRE ANALOGUE A CELLE DU MATERIAU HAUTE PRESSION, AVEC TOUTEFOIS UNE DENSITE MOINDRE DE DISLOCATIONS, DES CELLULES PLUS GRANDES ET DES REGIONS EXEMPTES DE CELLULES. L'ETUDE DES PRECIPITES D'ARSENIC ATTACHES AUX DISLOCATIONS MONTRE QUE LE POINT DE FUSION CONGRUENTE DE GAAS EST DECALE VERS L'ARSENIC, QUE LA PRECIPITATION EST INACHEVEE DANS LE MATERIAU LEC BRUT DE CROISSANCE, ET QU'ELLE NECESSITE UN VIEILLISSEMENT PREALABLE DES DISLOCATIONS. PARTANT D'UNE SOLUTION SOLIDE GAAS INTRINSEQUE HOMOGENE ET SANS DISLOCATIONS AU POINT DE FUSION, LES PROCESSUS SUCCESSIFS METTANT EN JEU LES DISLOCATIONS ET LES DEFAUTS PONCTUELS SONT ENVISAGES. LES CONSEQUENCES SUR LA SEGREGATION ET SUR LA NUCLEATION DE L'ARSENIC EN EXCES SONT ETUDIEES. LES PREDICTIONS DE CE MODELE QUANT A LA MICROSTRUCTURE ET AUX HETEROGENEITES DU MATERIAU SONT EN ACCORD AVEC NOS OBSERVATIONS ET AVEC DE NOMBREUX RESULTATS DE PHOTOLUMINESCENCE, TOMOGRAPHIE ET MICROSCOPIQUE ELECTRONIQUE FOURNIS PAR D'AUTRES AUTEURS
Author: John Wilfred Orton
Publisher:
ISBN: 0199695822
Category : Science
Languages : en
Pages : 529
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Book Description
The book is a history of Molecular Beam Epitaxy (MBE) as applied to the growth of semiconductor thin films (note that it does not cover the subject of metal thin films). It begins by examining the origins of MBE, first of all looking at the nature of molecular beams and considering their application to fundamental physics, to the development of nuclear magnetic resonance and to the invention of the microwave MASER. It shows how molecular beams of silane (SiH4) were used to study the nucleation of silicon films on a silicon substrate and how such studies were extended to compound semiconductors such as GaAs. From such surface studies in ultra-high vacuum the technique developed into a method of growing high quality single crystal films of a wide range of semiconductors. Comparing this with earlier evaporation methods of deposition and with other epitaxial deposition methods such as liquid phase and vapour phase epitaxy (LPE and VPE). The text describes the development of MBE machines from the early 'home-made' variety to that of commercial equipment and show how MBE was gradually refined to produce high quality films with atomic dimensions. This was much aided by the use of various in-situ surface analysis techniques, such as reflection high energy electron diffraction (RHEED) and mass spectrometry, a feature unique to MBE. It looks at various modified versions of the basic MBE process, then proceed to describe their application to the growth of so-called 'low-dimensional structures' (LDS) based on ultra-thin heterostructure films with thickness of order a few molecular monolayers. Further chapters cover the growth of a wide range of different compounds and describe their application to fundamental physics and to the fabrication of electronic and opto-electronic devices. The authors study the historical development of all these aspects and emphasise both the (often unexpected) manner of their discovery and development and the unique features which MBE brings to the growth of extremely complex structures with monolayer accuracy.
Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1296
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Author: M.O. Manasreh
Publisher: Elsevier
ISBN: 0080534449
Category : Science
Languages : en
Pages : 463
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Book Description
Research advances in III-nitride semiconductor materials and device have led to an exponential increase in activity directed towards electronic and optoelectronic applications. There is also great scientific interest in this class of materials because they appear to form the first semiconductor system in which extended defects do not severely affect the optical properties of devices. The volume consists of chapters written by a number of leading researchers in nitride materials and device technology with the emphasis on the dopants incorporations, impurities identifications, defects engineering, defects characterization, ion implantation, irradiation-induced defects, residual stress, structural defects and phonon confinement. This unique volume provides a comprehensive review and introduction of defects and structural properties of GaN and related compounds for newcomers to the field and stimulus to further advances for experienced researchers. Given the current level of interest and research activity directed towards nitride materials and devices, the publication of the volume is particularly timely. Early pioneering work by Pankove and co-workers in the 1970s yielded a metal-insulator-semiconductor GaN light-emitting diode (LED), but the difficulty of producing p-type GaN precluded much further effort. The current level of activity in nitride semiconductors was inspired largely by the results of Akasaki and co-workers and of Nakamura and co-workers in the late 1980s and early 1990s in the development of p-type doping in GaN and the demonstration of nitride-based LEDs at visible wavelengths. These advances were followed by the successful fabrication and commercialization of nitride blue laser diodes by Nakamura et al at Nichia. The chapters contained in this volume constitutes a mere sampling of the broad range of research on nitride semiconductor materials and defect issues currently being pursued in academic, government, and industrial laboratories worldwide.
Author: International Atomic Energy Agency
Publisher: International Atomic Energy Agency
ISBN: 9789201063205
Category : Technology & Engineering
Languages : en
Pages : 72
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Book Description
This publication results from a technical meeting on phenomenology and technologies relevant to in-vessel melt retention (IVMR) and ex-vessel corium cooling (EVCC). The purpose of the publication is to capture the state of knowledge, at the time of that meeting, related to phenomenology and technologies as well as the challenges and pending issues relevant to IVMR and EVCC for water cooled reactors by summarizing the information provided by the meeting participants in a form useful to practitioners in Member States.
