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Author: Earl J. Kirkland
Publisher: Springer Science & Business Media
ISBN: 1441965335
Category : Science
Languages : en
Pages : 289
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Book Description
Preface to Second Edition Several new topics have been added, some small errors have been corrected and some new references have been added in this edition. New topics include aberration corrected instruments, scanning confocal mode of operations, Bloch wave eigenvalue methods and parallel computing techniques. The ?rst edition - cluded a CD with computer programs, which is not included in this edition. - stead the associated programs will be available on an associated web site (currently people.ccmr.cornell.edu/ ̃kirkland,but may move as time goes on). I wish to thank Mick Thomas for preparing the specimen used to record the image in Fig.5.26 and to thank Stephen P. Meisburger for suggesting an interesting biological specimen to use in Fig.7.24. Again, I apologize in advance for leaving out some undoubtedlyoutstanding r- erences. I also apologize for the as yet undiscovered errors that remain in the text. Earl J. Kirkland, December 2009 Preface to First Edition Image simulation has become a common tool in HREM (High Resolution El- tron Microscopy) in recent years. However, the literature on the subject is scattered among many different journals and conference proceedings that have occurred in the last two or three decades. It is dif?cult for beginners to get started in this ?eld.
Author: Earl J. Kirkland
Publisher: Springer Science & Business Media
ISBN: 1441965335
Category : Science
Languages : en
Pages : 289
Get Book Here
Book Description
Preface to Second Edition Several new topics have been added, some small errors have been corrected and some new references have been added in this edition. New topics include aberration corrected instruments, scanning confocal mode of operations, Bloch wave eigenvalue methods and parallel computing techniques. The ?rst edition - cluded a CD with computer programs, which is not included in this edition. - stead the associated programs will be available on an associated web site (currently people.ccmr.cornell.edu/ ̃kirkland,but may move as time goes on). I wish to thank Mick Thomas for preparing the specimen used to record the image in Fig.5.26 and to thank Stephen P. Meisburger for suggesting an interesting biological specimen to use in Fig.7.24. Again, I apologize in advance for leaving out some undoubtedlyoutstanding r- erences. I also apologize for the as yet undiscovered errors that remain in the text. Earl J. Kirkland, December 2009 Preface to First Edition Image simulation has become a common tool in HREM (High Resolution El- tron Microscopy) in recent years. However, the literature on the subject is scattered among many different journals and conference proceedings that have occurred in the last two or three decades. It is dif?cult for beginners to get started in this ?eld.
Author: Roar Kilaas
Publisher:
ISBN:
Category : Computer simulation
Languages : en
Pages : 192
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Book Description
Author: Peter Buseck
Publisher: Oxford University Press
ISBN: 0195364651
Category : Science
Languages : en
Pages : 668
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Book Description
This book provides an introduction to the fundamental concepts, techniques, and methods used for electron microscopy at high resolution in space, energy, and even in time. It delineates the theory of elastic scattering, which is most useful for spectroscopic and chemical analyses. There are also discussions of the theory and practice of image calculations, and applications of HRTEM to the study of solid surfaces, highly disordered materials, solid state chemistry, mineralogy, semiconductors and metals. Contributors include J. Cowley, J. Spence, P. Buseck, P. Self, and M.A. O'Keefe. Compiled by experts in the fields of geology, physics and chemistry, this comprehensive text will be the standard reference for years to come.
Author: Jian Min Zuo
Publisher: Springer
ISBN: 1493966073
Category : Technology & Engineering
Languages : en
Pages : 741
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Book Description
This volume expands and updates the coverage in the authors' popular 1992 book, Electron Microdiffraction. As the title implies, the focus of the book has changed from electron microdiffraction and convergent beam electron diffraction to all forms of advanced transmission electron microscopy. Special attention is given to electron diffraction and imaging, including high-resolution TEM and STEM imaging, and the application of these methods to crystals, their defects, and nanostructures. The authoritative text summarizes and develops most of the useful knowledge which has been gained over the years from the study of the multiple electron scattering problem, the recent development of aberration correctors and their applications to materials structure characterization, as well as the authors' extensive teaching experience in these areas. Advanced Transmission Electron Microscopy: Imaging and Diffraction in Nanoscience is ideal for use as an advanced undergraduate or graduate level text in support of course materials in Materials Science, Physics or Chemistry departments.
Author: David B. Williams
Publisher: Springer Science & Business Media
ISBN: 0387765018
Category : Technology & Engineering
Languages : en
Pages : 805
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Book Description
This profusely illustrated text on Transmission Electron Microscopy provides the necessary instructions for successful hands-on application of this versatile materials characterization technique. The new edition also includes an extensive collection of questions for the student, providing approximately 800 self-assessment questions and over 400 questions suitable for homework assignment.
Author: Frances M. Ross
Publisher: Cambridge University Press
ISBN: 1107116570
Category : Science
Languages : en
Pages : 529
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Book Description
2.6.2 Electrodes for Electrochemistry
Author: Brent Fultz
Publisher: Springer Science & Business Media
ISBN: 3642297609
Category : Science
Languages : en
Pages : 775
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Book Description
This book explains concepts of transmission electron microscopy (TEM) and x-ray diffractometry (XRD) that are important for the characterization of materials. The fourth edition adds important new techniques of TEM such as electron tomography, nanobeam diffraction, and geometric phase analysis. A new chapter on neutron scattering completes the trio of x-ray, electron and neutron diffraction. All chapters were updated and revised for clarity. The book explains the fundamentals of how waves and wavefunctions interact with atoms in solids, and the similarities and differences of using x-rays, electrons, or neutrons for diffraction measurements. Diffraction effects of crystalline order, defects, and disorder in materials are explained in detail. Both practical and theoretical issues are covered. The book can be used in an introductory-level or advanced-level course, since sections are identified by difficulty. Each chapter includes a set of problems to illustrate principles, and the extensive Appendix includes laboratory exercises.
Author: Joseph Goldstein
Publisher: Springer Science & Business Media
ISBN: 1461332737
Category : Science
Languages : en
Pages : 679
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Book Description
This book has evolved by processes of selection and expansion from its predecessor, Practical Scanning Electron Microscopy (PSEM), published by Plenum Press in 1975. The interaction of the authors with students at the Short Course on Scanning Electron Microscopy and X-Ray Microanalysis held annually at Lehigh University has helped greatly in developing this textbook. The material has been chosen to provide a student with a general introduction to the techniques of scanning electron microscopy and x-ray microanalysis suitable for application in such fields as biology, geology, solid state physics, and materials science. Following the format of PSEM, this book gives the student a basic knowledge of (1) the user-controlled functions of the electron optics of the scanning electron microscope and electron microprobe, (2) the characteristics of electron-beam-sample inter actions, (3) image formation and interpretation, (4) x-ray spectrometry, and (5) quantitative x-ray microanalysis. Each of these topics has been updated and in most cases expanded over the material presented in PSEM in order to give the reader sufficient coverage to understand these topics and apply the information in the laboratory. Throughout the text, we have attempted to emphasize practical aspects of the techniques, describing those instru ment parameters which the microscopist can and must manipulate to obtain optimum information from the specimen. Certain areas in particular have been expanded in response to their increasing importance in the SEM field. Thus energy-dispersive x-ray spectrometry, which has undergone a tremendous surge in growth, is treated in substantial detail.
Author: A. Borghesi
Publisher: North Holland
ISBN:
Category : Science
Languages : en
Pages : 624
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Book Description
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry.The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Author: Earl J. Kirkland
Publisher: Springer Nature
ISBN: 3030332608
Category : Science
Languages : en
Pages : 357
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Book Description
This updated and revised edition of a classic work provides a summary of methods for numerical computation of high resolution conventional and scanning transmission electron microscope images. At the limits of resolution, image artifacts due to the instrument and the specimen interaction can complicate image interpretation. Image calculations can help the user to interpret and understand high resolution information in recorded electron micrographs. The book contains expanded sections on aberration correction, including a detailed discussion of higher order (multipole) aberrations and their effect on high resolution imaging, new imaging modes such as ABF (annular bright field), and the latest developments in parallel processing using GPUs (graphic processing units), as well as updated references. Beginning and experienced users at the advanced undergraduate or graduate level will find the book to be a unique and essential guide to the theory and methods of computation in electron microscopy.
