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Author: Tsu-Jae King Liu
Publisher: Cambridge University Press
ISBN: 1107043182
Category : Computers
Languages : en
Pages : 439
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Book Description
Get up to speed with the future of logic switch design with this indispensable introduction to post-CMOS technologies.
Author: Tsu-Jae King Liu
Publisher: Cambridge University Press
ISBN: 1107043182
Category : Computers
Languages : en
Pages : 439
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Book Description
Get up to speed with the future of logic switch design with this indispensable introduction to post-CMOS technologies.
Author: Sangeeta Singh
Publisher: Springer Nature
ISBN: 981974623X
Category :
Languages : en
Pages : 331
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Book Description
Author: Krzysztof Iniewski
Publisher: John Wiley & Sons
ISBN: 1118016483
Category : Technology & Engineering
Languages : en
Pages : 425
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Book Description
The book will address the-state-of-the-art in integrated Bio-Microsystems that integrate microelectronics with fluidics, photonics, and mechanics. New exciting opportunities in emerging applications that will take system performance beyond offered by traditional CMOS based circuits are discussed in detail. The book is a must for anyone serious about microelectronics integration possibilities for future technologies. The book is written by top notch international experts in industry and academia. The intended audience is practicing engineers with electronics background that want to learn about integrated microsystems. The book will be also used as a recommended reading and supplementary material in graduate course curriculum.
Author: Harry Veendrick
Publisher: Springer Nature
ISBN: 303164249X
Category :
Languages : en
Pages : 697
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Book Description
Author: Karim Abbas
Publisher: Springer Nature
ISBN: 3030371956
Category : Technology & Engineering
Languages : en
Pages : 653
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Book Description
This book provides a comprehensive reference for everything that has to do with digital circuits. The author focuses equally on all levels of abstraction. He tells a bottom-up story from the physics level to the finished product level. The aim is to provide a full account of the experience of designing, fabricating, understanding, and testing a microchip. The content is structured to be very accessible and self-contained, allowing readers with diverse backgrounds to read as much or as little of the book as needed. Beyond a basic foundation of mathematics and physics, the book makes no assumptions about prior knowledge. This allows someone new to the field to read the book from the beginning. It also means that someone using the book as a reference will be able to answer their questions without referring to any external sources.
Author: Alessandro Cresti
Publisher: John Wiley & Sons
ISBN: 1789451272
Category : Technology & Engineering
Languages : en
Pages : 453
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Book Description
Author: Guilei Wang
Publisher: Springer Nature
ISBN: 9811500460
Category : Technology & Engineering
Languages : en
Pages : 127
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Book Description
This thesis presents the SiGe source and drain (S/D) technology in the context of advanced CMOS, and addresses both device processing and epitaxy modelling. As the CMOS technology roadmap calls for continuously downscaling traditional transistor structures, controlling the parasitic effects of transistors, e.g. short channel effect, parasitic resistances and capacitances is becoming increasingly difficult. The emergence of these problems sparked a technological revolution, where a transition from planar to three-dimensional (3D) transistor design occurred in the 22nm technology node. The selective epitaxial growth (SEG) method has been used to deposit SiGe as stressor material in S/D regions to induce uniaxial strain in the channel region. The thesis investigates issues of process integration in IC production and concentrates on the key parameters of high-quality SiGe selective epitaxial growth, with a special focus on its pattern dependency behavior and on key integration issues in both 2D and 3D transistor structures, the goal being to improve future applications of SiGe SEG in advanced CMOS.
Author: Dan Clein
Publisher: Elsevier
ISBN: 0080502113
Category : Technology & Engineering
Languages : en
Pages : 287
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Book Description
This book includes basic methodologies, review of basic electrical rules and how they apply, design rules, IC planning, detailed checklists for design review, specific layout design flows, specialized block design, interconnect design, and also additional information on design limitations due to production requirements.*Practical, hands-on approach to CMOS layout theory and design*Offers engineers and technicians the training materials they need to stay current in circuit design technology.*Covers manufacturing processes and their effect on layout and design decisions
Author: Henry Radamson
Publisher: Woodhead Publishing
ISBN: 0081021402
Category : Technology & Engineering
Languages : en
Pages : 280
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Book Description
CMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends. The book examines the challenges and opportunities that materials beyond silicon provide, including a close look at high-k materials and metal gate, strain engineering, channel material and mobility, and contacts. The book's key approach is on characterizations, device processing and electrical measurements. - Addresses challenges and opportunities for the use of CMOS - Covers the latest methods of strain engineering, materials integration to increase mobility, nano-scaled transistor processing, and integration of CMOS with photonic components - Provides a look at the evolution of CMOS technology, including the origins of the technology, current status and future possibilities
Author: Charles Chiang
Publisher: Springer Science & Business Media
ISBN: 1402051883
Category : Technology & Engineering
Languages : en
Pages : 277
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Book Description
This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.
