Author: Zinetula Insepov
Publisher: CRC Press
ISBN: 143987543X
Category : Science
Languages : en
Pages : 266
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Book Description
Cluster Ion-Solid Interactions: Theory, Simulation, and Experiment provides an overview of various concepts in cluster physics and related topics in physics, including the fundamentals and tools underlying novel cluster ion beam technology. The material is based on the author's highly regarded courses at Kyoto University, Purdue University, the Mos
Author: Michael Nastasi
Publisher: Cambridge University Press
ISBN: 052137376X
Category : Science
Languages : en
Pages : 572
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Book Description
Comprehensive guide to an important materials science technique for students and researchers.
Author: D. B. Poker
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 940
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Book Description
Several beam-solid interaction techniques have been developed that can either stand alone or be used in connection with others for materials processing, for fabrication of devices with enhanced electro-optical and mechanical properties, and with enhanced resistance to corrosion and erosion. For example, advances in focused ion beams (FIB) have brought out-of-reach ideas and applications to fruition. This book from MRS focuses on the developments in ion-beam-assisted processing of materials and reviews successful applications of the techniques. Topics include: fundamentals of ion-solid interactions; ion-beam mixing; radiation damage; insulators and wide bandgap materials; polymers; optical materials; plasma and ion-assisted techniques; metals and tribology; focused ion beams; fundamental semiconductor processing and compound semiconductors.
Author: Walter M. Gibson
Publisher:
ISBN:
Category : Language Arts & Disciplines
Languages : en
Pages : 726
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Book Description
Author: P.L.F. Hemment
Publisher: Newnes
ISBN: 0444596313
Category : Technology & Engineering
Languages : en
Pages : 630
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Book Description
Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.
Author: Sarah Fearn
Publisher: Morgan & Claypool Publishers
ISBN: 1681740885
Category : Technology & Engineering
Languages : en
Pages : 67
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Book Description
This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.
Author: I. Yamada
Publisher: Elsevier
ISBN: 1483164047
Category : Technology & Engineering
Languages : en
Pages : 646
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Book Description
Laser and Ion Beam Modification of Materials is a compilation of materials from the proceedings of the symposium U: Material Synthesis and Modification by Ion beams and Laser Beams. This collection discusses the founding of the KANSAI Science City in Japan, and the structures, equipment, and research projects of two institutions are discussed pertaining to eV-MeV ion beams. A description of ion beams as used in materials research and in manufacturing processes, along with trends in ion implantation technology in semiconductors, is discussed. Research into ion beams by China and its industrial uses in non-semiconductor area is noted. For industrial applications, developing technology in terms of high speed, large surface modifications and use of high doses is important. Thus, the development of different ion beam approaches is examined. Industrial applications of ion and laser processing are discussed as cluster beams are used in solid state physics and chemistry. Mention is made on a high power discharge pumped solid state physics (ArF) excimer laser as a potential light source for better material processing. Under ion beam material processing is nanofabrication using focused ion beams, important for research work in mesoscopic systems. Progress in the use of ion-beam mixing using kinetic energy of ion-beams to mingle with pre-deposited surface layers of substrate materials has shown promise. Advanced materials researchers and scientists, as well as academicians in the field of nuclear physics, will find this collection helpful.
Author: R. Vanselow
Publisher: Springer Science & Business Media
ISBN: 3642822533
Category : Technology & Engineering
Languages : en
Pages : 569
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Book Description
This volume contains review articles which were written by the invited speak ers of the Sixth International Summer Institute in Surface Science (ISISS), held at the University of Wisconsin-Milwaukee in August 1983. The objective of ISISS is to bring together a group of internationally recognized experts on various aspects of surface science to present tutorial review lectures over a period of one week. Each speaker is asked, in addi tion, to write a review paper on his lecture topic. The collected articles from previous Institutes have been published under the following titles: Surface Science: Recent Progress and Perspectives, Crit. Rev. Solid State Sci. 4, 124-559 (1974). Chemistry and Physics of Solid Surfaces, Vol. I (1976), Vol. II (1979), Vol. III (1982) (CRC Press, Boca Raton, FL), and Vol. IV (1982), Springer Ser. Chern. Phys. , Vol. 20 (Springer-Verlag Berlin, Heidelberg, New York 1982) No single collection of reviews (or one-week conference for that matter) can possibly cover the entire field of modern surface science, from heter ogeneous catalysis through semiconductor surface physics to metallurgy. It is intended, however, that the series Chemistry and Physics ofSolid Sur faces as a whole should provide experts and students alike with a comprehen ve set of reviews and literature references on as many aspects of the subject as possible, particular emphasis being placed on the gas-solid interface. Each volume is introduced with a historical review of the devel opment of one aspect of surface science by a distinguished participant in that development.
Author: Emile Knystautas
Publisher: CRC Press
ISBN: 1351836757
Category : Technology & Engineering
Languages : en
Pages : 362
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Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Author: Heinrich F. Beyer
Publisher: Springer Science & Business Media
ISBN: 3642585809
Category : Science
Languages : en
Pages : 404
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Book Description
This book is devoted to one of the most active domains of atomic physic- atomic physics of heavy positive ions. During the last 30 years, this terrain has attracted enormous attention from both experimentalists and theoreti cians. On the one hand, this interest is stimulated by rapid progress in the development of laboratory ion sources, storage rings, ion traps and methods for ion cooling. In many laboratories, a considerable number of complex and accurate experiments have been initiated, challenging new frontiers. Highly charged ions are used for investigations related to fundamental research and to more applied fields such as controlled nuclear fusion driven by heavy ions and its diagnostics, ion-surface interaction, physics of hollow atoms, x-ray lasers, x-ray spectroscopy, spectrometry of ions in storage rings and ion traps, biology, and medical therapy. On the other hand, the new technologies have stimulated elaborate theo retical investigations, especially in developing QED theory, relativistic many body techniques, plasma-kinetic modeling based on the Coulomb interactions of highly charged ions with photons and various atomic particles - electrons, atoms, molecules and ions. The idea of assembling this book matured while the editors were writ ing another book, X-Ray Radiation of Highly Charged Ions by H. F. Beyer, H. -J. Kluge and V. P. Shevelko (Springer, Berlin, Heidelberg 1997) covering a broad range of x-ray and other radiative phenomena central to atomic physics with heavy ions.
