Chemical vapor deposition growth and characterization of undoped and doped silicon heterostructure quantum dots PDF Download
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Author: Chayan Kumar Seal
Publisher:
ISBN:
Category :
Languages : en
Pages : 104
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Author: Chayan Kumar Seal
Publisher:
ISBN:
Category :
Languages : en
Pages : 104
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Author: Rajeev Malik
Publisher:
ISBN:
Category :
Languages : en
Pages : 332
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Author: United States. Department of Energy
Publisher:
ISBN:
Category : Silicon
Languages : en
Pages : 260
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Author: S Neralla
Publisher: BoD – Books on Demand
ISBN: 9535125729
Category : Science
Languages : en
Pages : 292
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Book Description
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Author: Radhika Rangarajan
Publisher:
ISBN:
Category :
Languages : en
Pages : 78
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Author:
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Category : Ceramics
Languages : en
Pages : 500
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Author:
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ISBN:
Category : Electrical engineering
Languages : en
Pages : 2240
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Author:
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ISBN:
Category : Aeronautics
Languages : en
Pages : 1020
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Author: Scott Hill
Publisher:
ISBN:
Category :
Languages : en
Pages : 170
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This thesis describes the growth of GaSb quantum dots on silicon substrates. In this particular investigation, the main factors considered w.ere time and substrate temperature. Both were found to have a direct effect on the size and density of the dots grown. Also during this investigation, the growth of a Sb thin film as well as an annealing process prior to the deposition was found to improve the quality of the quantum dot growth. Other factors that are found to be critical to the GaSb dot growth is the pre processing of the wafer in 48% HF solution as well as the use of a hydrogen gas flow during the pre deposition, as well as the deposition itself.
Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2540
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