C, H, N and O in Si and Characterization and Simulation of Materials and Processes PDF Download
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Author: A. Borghesi
Publisher: Newnes
ISBN: 044459633X
Category : Technology & Engineering
Languages : en
Pages : 580
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Book Description
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Author: A. Borghesi
Publisher: Newnes
ISBN: 044459633X
Category : Technology & Engineering
Languages : en
Pages : 580
Get Book Here
Book Description
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Author: David Michael Rowe
Publisher: CRC Press
ISBN: 1439840423
Category : Technology & Engineering
Languages : en
Pages : 1120
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Book Description
Comprising two volumes, Thermoelectrics and Its Energy Harvesting reviews the vast improvements in technology and application of thermoelectric energy with a specific intention to reduce and reuse waste heat and improve novel techniques for the efficient acquisition and use of energy.Materials, Preparation, and Characterization in Thermoelectrics i
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Publisher:
ISBN:
Category : Engineering
Languages : en
Pages : 422
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Book Description
Author: Gabriel O. Shonaike
Publisher: CRC Press
ISBN: 0203492900
Category : Technology & Engineering
Languages : en
Pages : 586
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Book Description
Featuring contributions from experts at some of the world's leading academic and industrial institutions, Advanced Polymeric Materials: Structure Property Relationships brings into book form a wealth of information previously available primarily only within computer programs. In a welcome narrative treatment, it provides comprehensive coverage of p
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Category : Aeronautics
Languages : en
Pages : 836
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Book Description
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ISBN:
Category : Weights and measures
Languages : en
Pages : 476
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Book Description
Author: United States. National Bureau of Standards
Publisher:
ISBN:
Category :
Languages : en
Pages : 470
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Book Description
Author: Dieter K. Schroder
Publisher: John Wiley & Sons
ISBN: 0471739065
Category : Technology & Engineering
Languages : en
Pages : 800
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Book Description
This Third Edition updates a landmark text with the latest findings The Third Edition of the internationally lauded Semiconductor Material and Device Characterization brings the text fully up-to-date with the latest developments in the field and includes new pedagogical tools to assist readers. Not only does the Third Edition set forth all the latest measurement techniques, but it also examines new interpretations and new applications of existing techniques. Semiconductor Material and Device Characterization remains the sole text dedicated to characterization techniques for measuring semiconductor materials and devices. Coverage includes the full range of electrical and optical characterization methods, including the more specialized chemical and physical techniques. Readers familiar with the previous two editions will discover a thoroughly revised and updated Third Edition, including: Updated and revised figures and examples reflecting the most current data and information 260 new references offering access to the latest research and discussions in specialized topics New problems and review questions at the end of each chapter to test readers' understanding of the material In addition, readers will find fully updated and revised sections in each chapter. Plus, two new chapters have been added: Charge-Based and Probe Characterization introduces charge-based measurement and Kelvin probes. This chapter also examines probe-based measurements, including scanning capacitance, scanning Kelvin force, scanning spreading resistance, and ballistic electron emission microscopy. Reliability and Failure Analysis examines failure times and distribution functions, and discusses electromigration, hot carriers, gate oxide integrity, negative bias temperature instability, stress-induced leakage current, and electrostatic discharge. Written by an internationally recognized authority in the field, Semiconductor Material and Device Characterization remains essential reading for graduate students as well as for professionals working in the field of semiconductor devices and materials. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department.
Author: Margrit Hanbücken
Publisher: John Wiley & Sons
ISBN: 3527639551
Category : Technology & Engineering
Languages : en
Pages : 354
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Book Description
Bringing together experts from the various disciplines involved, this first comprehensive overview of the current level of stress engineering on the nanoscale is unique in combining the theoretical fundamentals with simulation methods, model systems and characterization techniques. Essential reading for researchers in microelectronics, optoelectronics, sensing, and photonics.
Author: Nasim Uddin
Publisher: Elsevier
ISBN: 1845698037
Category : Technology & Engineering
Languages : en
Pages : 448
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Book Description
With the upsurge in terrorism in recent years and the possibility of accidental blast threats, there is growing interest in manufacturing blast ‘hardened’ structures and retrofitting blast mitigation materials to existing structures. Composites provide the ideal material for blast protection as they can be engineered to give different levels of protection by varying the reinforcements and matrices. Part one discusses general technical issues with chapters on topics such as blast threats and types of blast damage, processing polymer matrix composites for blast protection, standards and specifications for composite blast protection materials, high energy absorbing composite materials for blast resistant design, modelling the blast response of hybrid laminated composite plates and the response of composite panels to blast wave pressure loadings. Part two reviews applications including ceramic matrix composites for ballistic protection of vehicles and personnel, using composites to protect military vehicles from mine blasts, blast protection of buildings using FRP matrix composites, using composites in blast resistant walls for offshore, naval and defence related structures, using composites to improve the blast resistance of columns in buildings, retrofitting using fibre reinforced polymer composites for blast protection of buildings and retrofitting to improve the blast response of concrete masonry walls. With its distinguished editor and team of expert contributors, Blast protection of civil infrastructures and vehicles using composites is a standard reference for all those concerned with protecting structures from the effects of blasts in both the civil and military sectors. Reviews the role of composites in blast protection with an examination of technical issues, applications of composites and ceramic matrix composites Presents numerical examples of simplified blast load computation and an overview of the basics of high explosives includes important properties and physical forms Varying applications of composites for protection are explored including military and non-military vehicles and increased resistance in building columns and masonry walls
