Author: Sumio Hosaka
Publisher: BoD – Books on Demand
ISBN: 9535111752
Category : Science
Languages : en
Pages : 264
Book Description
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.
Updates in Advanced Lithography
Author: Sumio Hosaka
Publisher: BoD – Books on Demand
ISBN: 9535111752
Category : Science
Languages : en
Pages : 264
Book Description
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.
Publisher: BoD – Books on Demand
ISBN: 9535111752
Category : Science
Languages : en
Pages : 264
Book Description
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.
Advances in Unconventional Lithography
Author: Gorgi Kostovski
Publisher: BoD – Books on Demand
ISBN: 9533076070
Category : Science
Languages : en
Pages : 202
Book Description
The term Lithography encompasses a range of contemporary technologies for micro and nano scale fabrication. Originally driven by the evolution of the semiconductor industry, lithography has grown from its optical origins to demonstrate increasingly fine resolution and to permeate fields as diverse as photonics and biology. Today, greater flexibility and affordability are demanded from lithography more than ever before. Diverse needs across many disciplines have produced a multitude of innovative new lithography techniques. This book, which is the final instalment in a series of three, provides a compelling overview of some of the recent advances in lithography, as recounted by the researchers themselves. Topics discussed include nanoimprinting for plasmonic biosensing, soft lithography for neurobiology and stem cell differentiation, colloidal substrates for two-tier self-assembled nanostructures, tuneable diffractive elements using photochromic polymers, and extreme-UV lithography.
Publisher: BoD – Books on Demand
ISBN: 9533076070
Category : Science
Languages : en
Pages : 202
Book Description
The term Lithography encompasses a range of contemporary technologies for micro and nano scale fabrication. Originally driven by the evolution of the semiconductor industry, lithography has grown from its optical origins to demonstrate increasingly fine resolution and to permeate fields as diverse as photonics and biology. Today, greater flexibility and affordability are demanded from lithography more than ever before. Diverse needs across many disciplines have produced a multitude of innovative new lithography techniques. This book, which is the final instalment in a series of three, provides a compelling overview of some of the recent advances in lithography, as recounted by the researchers themselves. Topics discussed include nanoimprinting for plasmonic biosensing, soft lithography for neurobiology and stem cell differentiation, colloidal substrates for two-tier self-assembled nanostructures, tuneable diffractive elements using photochromic polymers, and extreme-UV lithography.
Unconventional Nanopatterning Techniques and Applications
Author: John A. Rogers
Publisher: John Wiley & Sons
ISBN: 0470405775
Category : Technology & Engineering
Languages : en
Pages : 616
Book Description
Patterning or lithography is at the core of modern science and technology and cuts across all disciplines. With the emergence of nanotechnology, conventional methods based on electron beam lithography and extreme ultraviolet photolithography have become prohibitively expensive. As a result, a number of simple and unconventional methods have been introduced, beginning first with research demonstrations in the mid 1990s. This book focuses on these unconventional patterning techniques and their applications to optics, organic devices, electronic devices, biological devices, and fluidics.
Publisher: John Wiley & Sons
ISBN: 0470405775
Category : Technology & Engineering
Languages : en
Pages : 616
Book Description
Patterning or lithography is at the core of modern science and technology and cuts across all disciplines. With the emergence of nanotechnology, conventional methods based on electron beam lithography and extreme ultraviolet photolithography have become prohibitively expensive. As a result, a number of simple and unconventional methods have been introduced, beginning first with research demonstrations in the mid 1990s. This book focuses on these unconventional patterning techniques and their applications to optics, organic devices, electronic devices, biological devices, and fluidics.
Advances in Unconventional Lithography
Author: Gorgi Kostovski
Publisher:
ISBN: 9789535155966
Category :
Languages : en
Pages : 200
Book Description
The term Lithography encompasses a range of contemporary technologies for micro and nano scale fabrication. Originally driven by the evolution of the semiconductor industry, lithography has grown from its optical origins to demonstrate increasingly fine resolution and to permeate fields as diverse as photonics and biology. Today, greater flexibility and affordability are demanded from lithography more than ever before. Diverse needs across many disciplines have produced a multitude of innovative new lithography techniques. This book, which is the final instalment in a series of three, provides a compelling overview of some of the recent advances in lithography, as recounted by the researchers themselves. Topics discussed include nanoimprinting for plasmonic biosensing, soft lithography for neurobiology and stem cell differentiation, colloidal substrates for two-tier self-assembled nanostructures, tuneable diffractive elements using photochromic polymers, and extreme-UV lithography.
Publisher:
ISBN: 9789535155966
Category :
Languages : en
Pages : 200
Book Description
The term Lithography encompasses a range of contemporary technologies for micro and nano scale fabrication. Originally driven by the evolution of the semiconductor industry, lithography has grown from its optical origins to demonstrate increasingly fine resolution and to permeate fields as diverse as photonics and biology. Today, greater flexibility and affordability are demanded from lithography more than ever before. Diverse needs across many disciplines have produced a multitude of innovative new lithography techniques. This book, which is the final instalment in a series of three, provides a compelling overview of some of the recent advances in lithography, as recounted by the researchers themselves. Topics discussed include nanoimprinting for plasmonic biosensing, soft lithography for neurobiology and stem cell differentiation, colloidal substrates for two-tier self-assembled nanostructures, tuneable diffractive elements using photochromic polymers, and extreme-UV lithography.
Handbook of Nanosensors
Author: Gomaa A. M. Ali
Publisher: Springer Nature
ISBN: 3031471806
Category :
Languages : en
Pages : 1769
Book Description
Publisher: Springer Nature
ISBN: 3031471806
Category :
Languages : en
Pages : 1769
Book Description
Alternative Lithography
Author: Clivia M. Sotomayor Torres
Publisher: Springer Science & Business Media
ISBN: 1441992049
Category : Science
Languages : en
Pages : 343
Book Description
Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.
Publisher: Springer Science & Business Media
ISBN: 1441992049
Category : Science
Languages : en
Pages : 343
Book Description
Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.
Advances in Nanostructured Materials and Nanopatterning Technologies
Author: Vincenzo Guarino
Publisher: Elsevier
ISBN: 0128173130
Category : Technology & Engineering
Languages : en
Pages : 474
Book Description
Advances in Nanostructured Materials and Nanopatterning Technologies: Applications for Healthcare, Environment and Energy demonstrates how to apply micro- and nanofabrication and bioextrusion based systems for cell printing, electrophoretic deposition, antimicrobial applications, and nanoparticles technologies for use in a range of green industry sectors, with an emphasis on emerging applications. - Details strategies to design and realize smart nanostructured/patterned substrates for healthcare and energy and environmental applications - Enables the preparation, characterization and fundamental understanding of nanostructured materials for promising applications in health, environmental and energy related sectors - Provides a broader view of the context around existing projects and techniques, including discussions on potential new routes for fabrication
Publisher: Elsevier
ISBN: 0128173130
Category : Technology & Engineering
Languages : en
Pages : 474
Book Description
Advances in Nanostructured Materials and Nanopatterning Technologies: Applications for Healthcare, Environment and Energy demonstrates how to apply micro- and nanofabrication and bioextrusion based systems for cell printing, electrophoretic deposition, antimicrobial applications, and nanoparticles technologies for use in a range of green industry sectors, with an emphasis on emerging applications. - Details strategies to design and realize smart nanostructured/patterned substrates for healthcare and energy and environmental applications - Enables the preparation, characterization and fundamental understanding of nanostructured materials for promising applications in health, environmental and energy related sectors - Provides a broader view of the context around existing projects and techniques, including discussions on potential new routes for fabrication
Materials and Processes for Next Generation Lithography
Author:
Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636
Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636
Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Principles of Lithography
Author: Harry J. Levinson
Publisher: SPIE Press
ISBN: 9780819456601
Category : Technology & Engineering
Languages : en
Pages : 446
Book Description
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Publisher: SPIE Press
ISBN: 9780819456601
Category : Technology & Engineering
Languages : en
Pages : 446
Book Description
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Micromanufacturing Processes
Author: V.K. Jain
Publisher: CRC Press
ISBN: 143985291X
Category : Technology & Engineering
Languages : en
Pages : 421
Book Description
Increased demand for and developments in micromanufacturing have created a need for a resource that covers both the science and technology of this rapidly growing area. With contributions from eminent professors and researchers actively engaged in teaching, research, and development, Micromanufacturing Processes details the basic principles, tools,
Publisher: CRC Press
ISBN: 143985291X
Category : Technology & Engineering
Languages : en
Pages : 421
Book Description
Increased demand for and developments in micromanufacturing have created a need for a resource that covers both the science and technology of this rapidly growing area. With contributions from eminent professors and researchers actively engaged in teaching, research, and development, Micromanufacturing Processes details the basic principles, tools,