Advances in Resist Technology and Processing PDF Download
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Author:
Publisher:
ISBN:
Category : Photoresists
Languages : en
Pages : 780
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Book Description
Author:
Publisher:
ISBN:
Category : Photoresists
Languages : en
Pages : 780
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Book Description
Author: Klaus D. Sattler
Publisher: CRC Press
ISBN: 1420075519
Category : Science
Languages : en
Pages : 782
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Book Description
Many bottom-up and top-down techniques for nanomaterial and nanostructure generation have enabled the development of applications in nanoelectronics and nanophotonics. Handbook of Nanophysics: Nanoelectronics and Nanophotonics explores important recent applications of nanophysics in the areas of electronics and photonics. Each peer-reviewed c
Author: Rasit Onur Topaloglu
Publisher: Bentham Science Publishers
ISBN: 1608050742
Category : Technology & Engineering
Languages : en
Pages : 200
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Book Description
"The last couple of years have been very busy for the semiconductor industry and researchers. The rapid speed of production channel length reduction has brought lithographic challenges to semiconductor modeling. These include stress optimization, transisto"
Author: D. Harame
Publisher: The Electrochemical Society
ISBN: 1607685434
Category :
Languages : en
Pages : 1042
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Book Description
Author:
Publisher:
ISBN:
Category : Microlithography
Languages : en
Pages : 688
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Book Description
Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 0323431720
Category : Science
Languages : en
Pages : 214
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Book Description
Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, Volume 9, part of the Developments in Surface Contamination and Cleaning series provide a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their associated cleaning methods. This newest volume in the series discusses methods of surface cleaning of contaminants and the resources that are needed to deal with them. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales. - Provides a comprehensive coverage of innovations in surface cleaning - Written by established experts in the surface cleaning field, presenting an authoritative resource - Contains a comprehensive review of the state-of-the-art, including case studies to enhance the learning process
Author:
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 360
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Book Description
Author: Elsa Reichmanis
Publisher:
ISBN:
Category : Computers
Languages : en
Pages : 640
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Book Description
Author: Aránzazu del Campo
Publisher: John Wiley & Sons
ISBN: 3527633464
Category : Technology & Engineering
Languages : en
Pages : 562
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Book Description
New micro and nanopatterning technologies have been developed in the last years as less costly and more flexible alternatives to phtolithograpic processing. These technologies have not only impacted on recent developments in microelectronics, but also in emerging fields such as disposable biosensors, scaffolds for tissue engineering, non-biofouling coatings, high adherence devices, or photonic structures for the visible spectrum. This handbook presents the current processing methods suitable for the fabrication of micro- and nanostructured surfaces made out of polymeric materials. It covers the steps and materials involved, the resulting structures, and is rounded off by a part on applications. As a result, chemists, material scientists, and physicists gain a critical understanding of this topic at an early stage of its development.
Author: Eitan N. Shauly
Publisher: CRC Press
ISBN: 1000631354
Category : Technology & Engineering
Languages : en
Pages : 831
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Book Description
Nowadays over 50% of integrated circuits are fabricated at wafer foundries. This book presents a foundry-integrated perspective of the field and is a comprehensive and up-to-date manual designed to serve process, device, layout, and design engineers. It comprises chapters carefully selected to cover topics relevant for them to deal with their work. The book provides an insight into the different types of design rules (DRs) and considerations for setting new DRs. It discusses isolation, gate patterning, S/D contacts, metal lines, MOL, air gaps, and so on. It explains in detail the layout rules needed to support advanced planarization processes, different types of dummies, and related utilities as well as presents a large set of guidelines and layout-aware modeling for RF CMOS and analog modules. It also discusses the layout DRs for different mobility enhancement techniques and their related modeling, listing many of the dedicated rules for static random-access memory (SRAM), embedded polyfuse (ePF), and LogicNVM. The book also provides the setting and calibration of the process parameters set and describes the 28~20 nm planar MOSFET process flow for low-power and high-performance mobile applications in a step-by-step manner. It includes FEOL and BEOL physical and environmental tests for qualifications together with automotive qualification and design for automotive (DfA). Written for the professionals, the book belongs to the bookshelf of microelectronic discipline experts.
