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Author: Ivo Utke
Publisher: Oxford University Press
ISBN: 0199920990
Category : Technology & Engineering
Languages : en
Pages : 830
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Book Description
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
Author: Ivo Utke
Publisher: Oxford University Press
ISBN: 0199920990
Category : Technology & Engineering
Languages : en
Pages : 830
Get Book Here
Book Description
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
Author: José María de Teresa
Publisher:
ISBN: 9780750326087
Category : Nanolithography
Languages : en
Pages : 0
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Book Description
A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Author: Andreas Schmidt-Ott
Publisher: CRC Press
ISBN: 1000730441
Category : Science
Languages : en
Pages : 293
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Book Description
Spark ablation has been used worldwide for decades. However, in many fields, the special properties of nanoparticles, which come into play especially for sizes
Author: Maria Stepanova
Publisher: Springer Science & Business Media
ISBN: 3709104246
Category : Technology & Engineering
Languages : en
Pages : 344
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Book Description
Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Author: Oddur Ingólfsson
Publisher: CRC Press
ISBN: 0429602766
Category : Science
Languages : en
Pages : 254
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Book Description
Low-energy electrons are ubiquitous in nature and play an important role in natural phenomena as well as many potential and current industrial processes. Authored by 16 active researchers, this book describes the fundamental characteristics of low-energy electron–molecule interactions and their role in different fields of science and technology, including plasma processing, nanotechnology, and health care, as well as astro- and atmospheric physics and chemistry. The book is packed with illustrative examples, from both fundamental and application sides, features about 130 figures, and lists over 800 references. It may serve as an advanced graduate-level study course material where selected chapters can be used either individually or in combination as a basis to highlight and study specific aspects of low-energy electron–molecule interactions. It is also directed at researchers in the fields of plasma physics, nanotechnology, and radiation damage to biologically relevant material (such as in cancer therapy), especially those with an interest in high-energy-radiation-induced processes, from both an experimental and a theoretical point of view.
Author: Ruquan Ye
Publisher:
ISBN: 9789814877275
Category : Graphene
Languages : en
Pages : 88
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Book Description
LIG is a revolutionary technique that uses a common CO2 infrared laser scriber, like the one used in any machine shop, for the direct conversion of polymers into porous graphene under ambient conditions. This technique combines the preparation and patterning of 3D graphene in a single step, without the use of wet chemicals. The ease in the structural engineering and excellent mechanical properties of the 3D graphene obtained have made LIG a versatile technique for applications across many fields. This book compiles cutting-edge research on LIG by different research groups all over the world. It discusses the strategies that have been developed to synthesize and engineer graphene, including controlling its properties such as porosity, composition, and surface characteristics. The authors are pioneers in the discovery and development of LIG and the book will appeal to anyone involved in nanotechnology, chemistry, environmental sciences, and device development, especially those with an interest in the synthesis and applications of graphene-based materials.
Author: Gustaaf van Tendeloo
Publisher: John Wiley & Sons
ISBN: 3527641874
Category : Technology & Engineering
Languages : en
Pages : 1484
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Book Description
This completely revised successor to the Handbook of Microscopy supplies in-depth coverage of all imaging technologies from the optical to the electron and scanning techniques. Adopting a twofold approach, the book firstly presents the various technologies as such, before going on to cover the materials class by class, analyzing how the different imaging methods can be successfully applied. It covers the latest developments in techniques, such as in-situ TEM, 3D imaging in TEM and SEM, as well as a broad range of material types, including metals, alloys, ceramics, polymers, semiconductors, minerals, quasicrystals, amorphous solids, among others. The volumes are divided between methods and applications, making this both a reliable reference and handbook for chemists, physicists, biologists, materials scientists and engineers, as well as graduate students and their lecturers.
Author: Sung-Hoon Kim
Publisher: Elsevier
ISBN: 0080465625
Category : Science
Languages : en
Pages : 283
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Book Description
In the last 10 years organic dyes, traditionally used for coloring textiles and other materials, have become increasingly important in the hi-tech industries of electronics and optoelectronics. They can be used in optical data storage, new solar cells and biomedical sensors.Functional Dyes discusses the synthesis of these new, high-value dyes and pigments as well as their applications and performance. The chapters are arranged so that the reader logically advances from the fundamental concepts to more practical aspects of the technology in which they are used.In providing the reader with current information on functional dye chemistry, as well as important developments within the field, Functional Dyes is a valuable information source for dye and material chemists, researchers and graduates, who want a summary of the key advances in the field over the last 10 years and an authoritative view on future developments.* Provides a broad introduction to the science technology of the functional dye application* Reviews recent advances on synthesis and characteristics of the functional dyes and their applications* Is a valuable information source for dye and material chemists and researchers
Author: Julien Bachmann
Publisher: John Wiley & Sons
ISBN: 3527694838
Category : Technology & Engineering
Languages : en
Pages : 366
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Book Description
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.
Author: Maurizio Dapor
Publisher: Springer
ISBN: 3319474928
Category : Science
Languages : en
Pages : 192
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Book Description
This new edition describes all the mechanisms of elastic and inelastic scattering of electrons with the atoms of the target as simple as possible. The use of techniques of quantum mechanics is described in detail for the investigation of interaction processes of electrons with matter. It presents the strategies of the Monte Carlo method, as well as numerous comparisons among the results of the simulations and the experimental data available in the literature. New in this edition is the description of the Mermin theory, a comparison between Mermin theory and Drude theory, a discussion about the dispersion laws, and details about the calculation of the phase shifts that are used in the relativistic partial wave expansion method. The role of secondary electrons in proton cancer therapy is discussed in the chapter devoted to applications. In this context, Monte Carlo results about the radial distribution of the energy deposited in PMMA by secondary electrons generated by energetic proton beams are presented.
