A Traveling Wave-driven, Inductively Coupled Large Area Plasma Source for Flat Panel Processing PDF Download
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Author: Yaoxi Wu
Publisher: Ann Arbor, Mich. : University Microfilms International
ISBN:
Category :
Languages : en
Pages : 390
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Book Description
Author: Yaoxi Wu
Publisher: Ann Arbor, Mich. : University Microfilms International
ISBN:
Category :
Languages : en
Pages : 390
Get Book Here
Book Description
Author: Yaoxi Wu
Publisher:
ISBN:
Category :
Languages : en
Pages : 22
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Book Description
Author: Yaoxi Wu
Publisher:
ISBN:
Category :
Languages : en
Pages : 12
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Author:
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 458
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Author:
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ISBN:
Category : Physics
Languages : en
Pages : 846
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Author:
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ISBN:
Category :
Languages : en
Pages : 6
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Book Description
We describe initial experiments with a large (76-cm diameter) plasma source chamber to explore the problems associated with large-area inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400-mm semiconductor wafers. Our experiments typically use a 640-nun diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N2 over the pressure range 3-50 mtorr. RF inductive power was run up to 2000W, but typically data were taken over the range 100-1000W. Diagnostics include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400-mm processing are attainable.
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Category : Dissertations, Academic
Languages : en
Pages : 832
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ISBN:
Category : Chemistry
Languages : en
Pages : 2540
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ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 816
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Author:
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1230
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