Scientific and Technical Aerospace Reports PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Scientific and Technical Aerospace Reports PDF full book. Access full book title Scientific and Technical Aerospace Reports by . Download full books in PDF and EPUB format.
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 692
Get Book Here
Book Description
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 692
Get Book Here
Book Description
Author: David L. Elliott
Publisher: Academic Press
ISBN: 1483296512
Category : Science
Languages : en
Pages : 367
Get Book Here
Book Description
Ultraviolet Laser Technology and Applications is a hands-on reference text that identifies the main areas of UV laser technology; describes how each is applied; offers clearly illustrated examples of UV opticalsystems applications; and includes technical data on optics, lasers, materials, and systems. This book is unique for its comprehensive, in-depth coverage. Each chapter deals with a different aspect of the subject, beginning with UV light itself; moving through the optics, sources, and systems; and concluding with detailed descriptions of applications in various fields. The text enables practicing engineers and researchers to utilize concepts and innovations to solve actual problems encountered in UV optical technology applications. It also offers a wealth of information for equipment designers and manufacturers. Those in laser fields (including medical, electronics, and semiconductors), students, engineers, technicians, as well as newcomers to the subject who require a basic introduction to the topic, will all find Ultraviolet Laser Technology and Applications to be an essential resource. Serves as a valuable, practical reference to UV laser technology Presents detailed technical data and techniques Offers highly illustrated optics designs and beam delivery systems Includes an extensive bibliography, references, and glossary Covers all major UV laser markets and technology systems
Author: Davide Bleiner
Publisher: Royal Society of Chemistry
ISBN: 1849735018
Category : Science
Languages : en
Pages : 469
Get Book Here
Book Description
Our ability to manipulate short wavelength radiation (0.01-100nm, equivalent to 120keV-12eV) has increased significantly over the last three decades. This has lead to major advances in applications in a wide range of disciplines such as: the life and medical sciences, including cancer-related studies; environmental science, including studies of pollution and its effects; archaeology and other cultural heritage disciplines; and materials science. Although expansion in application areas is due largely to modern synchrotron sources, many applications will not become widespread, and therefore routinely available as analytical tools, if they are confined to synchrotrons. There is a need to develop bright but small and low cost X-ray sources, not to replace synchrotrons but to complement them and this book will look at how to facilitate these developments. Written by a distinguished team of international authors, this book is based on the COST Action MP0601: Short Wavelength Laboratory Sources. The contents are divided into five main sections. the introductory section provides a comprehensive introduction to the fundamentals of radiation, generation mechanisms and short wavelength laboratory sources. The middle sections focus on modelling and simulation, source development: improvement and characterisation and integrated systems: sources, optics and detectors. The final section looks at recent applications. Aimed at academic and industrial researchers in physical chemistry and chemical physics, the contents provides practical information about the implementation of short wavelength laboratory sources and their applications.
Author: Richard Viskup
Publisher: BoD – Books on Demand
ISBN: 9535126067
Category : Science
Languages : en
Pages : 426
Get Book Here
Book Description
This book gives the readers an introduction to experimental and theoretical knowledge acquired by large-scale laser laboratories that are dealing with extra-high peak power and ultrashort laser pulses for research of terawatt (TW), petawatt (PW), or near-future exawatt (EW) laser interactions, for soft X-ray sources, for acceleration of particles, or for generation of hot dense thermal plasma for the laser fusion. The other part of this book is dealing with the small-scale laser laboratories that are using for its research on commercial sources of laser radiation, nanosecond (ns), picosecond (ps), or femtosecond (fs) laser pulses, either for basic research or for more advanced applications. This book is divided into six main sections dealing with short and ultrashort laser pulses, laser-produced soft X-ray sources, large-scale high-power laser systems, free-electron lasers, fiber-based sources of short optical pulse, and applications of short pulse lasers. In each chapter readers can find fascinating topics related to the high energy and/or short pulse laser technique. Individual chapters should serve the broad spectrum of readers of different expertise, layman, undergraduate and postgraduate students, scientists, and engineers, who may in this book find easily explained fundamentals as well as advanced principles of particular subjects related to these phenomena.
Author: John Sheffield
Publisher: Academic Press
ISBN: 0080952038
Category : Science
Languages : en
Pages : 512
Get Book Here
Book Description
This work presents one of the most powerful methods of plasma diagnosis in exquisite detail, to guide researchers in the theory and measurement techniques of light scattering in plasmas. Light scattering in plasmas is essential in the research and development of fusion energy, environmental solutions, and electronics.Referred to as the "Bible" by researchers, the work encompasses fusion and industrial applications essential in plasma research. It is the only comprehensive resource specific to the plasma scattering technique. It provides a wide-range of experimental examples and discussion of their principles with worked examples to assist researchers in applying the theory. - Computing techniques for solving basic equations helps researchers compare data to the actual experiment - New material on advances on the experimental side, such as the application of high density plasmas of inertial fusion - Worked out examples of the scattering technique for easier comprehension of theory
Author:
Publisher:
ISBN:
Category : Technology
Languages : en
Pages : 240
Get Book Here
Book Description
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 9780819458452
Category : Art
Languages : en
Pages : 1104
Get Book Here
Book Description
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author: Alan Michette
Publisher: Royal Society of Chemistry
ISBN: 1849734569
Category : Science
Languages : en
Pages : 468
Get Book Here
Book Description
Our ability to manipulate short wavelength radiation (0.01-100nm, equivalent to 120keV-12eV) has increased significantly over the last three decades. This has lead to major advances in applications in a wide range of disciplines such as: the life and medical sciences, including cancer-related studies; environmental science, including studies of pollution and its effects; archaeology and other cultural heritage disciplines; and materials science. Although expansion in application areas is due largely to modern synchrotron sources, many applications will not become widespread, and therefore routinely available as analytical tools, if they are confined to synchrotrons. This is because synchrotrons require enormous capital and infrastructure costs and are often, of necessity, national or international facilities. This seriously limits their scope for applications in research and analysis, in both academia and industry. How many universities, research institutes or even industrial laboratories would have electron microscopes if electron sources cost ú100M or more Hence the need to develop bright but small and (relatively) cheap x-ray sources, not to replace synchrotrons but to complement them. Written by a distinguished team of international authors this exemplary new handbook is based on the COST Action MP0601: Short Wavelength Laboratory Sources. The contents are divided into five main sections. The introductory section provides a comprehensive introduction to the fundamentals of radiation, generation mechanisms and short wavelength laboratory sources. The middle sections focus on modelling and simulation, source development: improvement and characterisation and integrated systems: sources, optics and detectors. The final section looks at recent applications.
Author: Bo Cui
Publisher: BoD – Books on Demand
ISBN: 953307602X
Category : Science
Languages : en
Pages : 630
Get Book Here
Book Description
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Author: David Attwood
Publisher: Cambridge University Press
ISBN: 1139643428
Category : Technology & Engineering
Languages : en
Pages : 611
Get Book Here
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
