European Conference on Mask Technology for Integrated Circuits and Microcomponents PDF Download
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Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 246
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Book Description
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 246
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Book Description
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 264
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Book Description
Author: Uwe F. W. Behringer
Publisher: Society of Photo Optical
ISBN: 9780819450180
Category : Technology & Engineering
Languages : en
Pages : 264
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Book Description
Author: Uwe Behringer
Publisher: Margret Schneider
ISBN: 3800728753
Category :
Languages : en
Pages : 301
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Book Description
Author: Syed Rizvi
Publisher: CRC Press
ISBN: 1420028782
Category : Technology & Engineering
Languages : en
Pages : 730
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Book Description
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Author: Günter Wilkening
Publisher: John Wiley & Sons
ISBN: 3527606874
Category : Technology & Engineering
Languages : en
Pages : 541
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Book Description
The quantitative determination of the properties of micro- and nanostructures is essential in research and development. It is also a prerequisite in process control and quality assurance in industry. The knowledge of the geometrical dimensions of structures in most cases is the base, to which other physical and chemical properties are linked. Quantitative measurements require reliable and stable instruments, suitable measurement procedures as well as appropriate calibration artefacts and methods. The seminar "NanoScale 2004" (6th Seminar on Quantitative Microscopy and 2nd Seminar on Nanoscale Calibration Standards and Methods) at the National Metrology Institute (Physikalisch-Technische Bundesanstalt PTB), Braunschweig, Germany, continues the series of seminars on Quantitative Microscopy. The series stimulates the exchange of information between manufacturers of relevant hard- and software and the users in science and industry. Topics addressed in these proceedings are a) the application of quantitative measurements and measurement problems in: microelectronics, microsystems technology, nano/quantum/molecular electronics, chemistry, biology, medicine, environmental technology, materials science, surface processing b) calibration & correction methods: calibration methods, calibration standards, calibration procedures, traceable measurements, standardization, uncertainty of measurements c) instrumentation and methods: novel/improved instruments and methods, reproducible probe/sample positioning, position-measuring systems, novel/improved probe/detector systems, linearization methods, image processing
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 732
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Book Description
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 496
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Author:
Publisher:
ISBN:
Category : Nanotechnology
Languages : en
Pages : 420
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Book Description
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 494
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Book Description
