Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 246
Book Description
European Conference on Mask Technology for Integrated Circuits and Microcomponents
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 246
Book Description
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 246
Book Description
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Author: Uwe F. W. Behringer
Publisher: Society of Photo Optical
ISBN: 9780819436146
Category : Electronic book
Languages : en
Pages : 252
Book Description
Publisher: Society of Photo Optical
ISBN: 9780819436146
Category : Electronic book
Languages : en
Pages : 252
Book Description
15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
Author: BACUS (Technical group)
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Computers
Languages : en
Pages : 194
Book Description
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Computers
Languages : en
Pages : 194
Book Description
Handbook of Photomask Manufacturing Technology
Author: Syed Rizvi
Publisher: CRC Press
ISBN: 1420028782
Category : Technology & Engineering
Languages : en
Pages : 730
Book Description
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Publisher: CRC Press
ISBN: 1420028782
Category : Technology & Engineering
Languages : en
Pages : 730
Book Description
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
EMC 2004
Author:
Publisher: Margret Schneider
ISBN: 3800728117
Category : Integrated circuits
Languages : en
Pages : 258
Book Description
Publisher: Margret Schneider
ISBN: 3800728117
Category : Integrated circuits
Languages : en
Pages : 258
Book Description
EMLC 2005
Author: Uwe Behringer
Publisher: Margret Schneider
ISBN: 3800728753
Category :
Languages : en
Pages : 301
Book Description
Publisher: Margret Schneider
ISBN: 3800728753
Category :
Languages : en
Pages : 301
Book Description
Handbook of Liquids-Assisted Laser Processing
Author: Arvi Kruusing
Publisher: Elsevier
ISBN: 0080555047
Category : Technology & Engineering
Languages : en
Pages : 465
Book Description
Laser processing of solid materials has been commonly performed in gas ambient. Having the workpiece immersed into liquid, having a liquid film on it, or soaking the material with liquid gives several advantages such as removal of the debris, lowering the heat load on the workpiece, and confining the vapour and plasma, resulting in higher shock pressure on the surface. Introduced in the 1980s, neutral liquids assisted laser processing (LALP) has proved to be advantageous in the cutting of heat-sensitive materials, shock peening of machine parts, cleaning of surfaces, fabrication of micro-optical components, and for generation of nanoparticles in liquids. The liquids used range from water through organic solvents to cryoliquids. The primary aim of Handbook of Liquids-Assisted Laser Processing is to present the essentials of previous research (tabulated data of experimental conditions and results), and help researchers develop new processing and diagnostics techniques (presenting data of liquids and a review of physical phenomena associated with LALP). Engineers can use the research results and technological innovation information to plan their materials processing tasks. Laser processing in liquids has been applied to a number of different tasks in various fields such as mechanical engineering, microengineering, chemistry, optics, and bioscience. A comprehensive glossary with definitions of the terms and explanations has been added. The book covers the use of chemically inert liquids under normal conditions. Laser chemical processing examples are presented for comparison only. - First book in this rapidly growing field impacting mechanical and micro/nano-engineering - Covers different kinds of liquid-assisted laser processing of a large variety of materials - Covers lasers emitting from UV to IR with pulse lengths down to femtoseconds - Reviews over 500 scientific articles and 300 inventions and tabulates their main features - Gives a qualitative and quantitative description of the physical phenomena associated with LALP - Tabulates 61 parameters for 100 liquids - Glossary of over 200 terms and abbreviations
Publisher: Elsevier
ISBN: 0080555047
Category : Technology & Engineering
Languages : en
Pages : 465
Book Description
Laser processing of solid materials has been commonly performed in gas ambient. Having the workpiece immersed into liquid, having a liquid film on it, or soaking the material with liquid gives several advantages such as removal of the debris, lowering the heat load on the workpiece, and confining the vapour and plasma, resulting in higher shock pressure on the surface. Introduced in the 1980s, neutral liquids assisted laser processing (LALP) has proved to be advantageous in the cutting of heat-sensitive materials, shock peening of machine parts, cleaning of surfaces, fabrication of micro-optical components, and for generation of nanoparticles in liquids. The liquids used range from water through organic solvents to cryoliquids. The primary aim of Handbook of Liquids-Assisted Laser Processing is to present the essentials of previous research (tabulated data of experimental conditions and results), and help researchers develop new processing and diagnostics techniques (presenting data of liquids and a review of physical phenomena associated with LALP). Engineers can use the research results and technological innovation information to plan their materials processing tasks. Laser processing in liquids has been applied to a number of different tasks in various fields such as mechanical engineering, microengineering, chemistry, optics, and bioscience. A comprehensive glossary with definitions of the terms and explanations has been added. The book covers the use of chemically inert liquids under normal conditions. Laser chemical processing examples are presented for comparison only. - First book in this rapidly growing field impacting mechanical and micro/nano-engineering - Covers different kinds of liquid-assisted laser processing of a large variety of materials - Covers lasers emitting from UV to IR with pulse lengths down to femtoseconds - Reviews over 500 scientific articles and 300 inventions and tabulates their main features - Gives a qualitative and quantitative description of the physical phenomena associated with LALP - Tabulates 61 parameters for 100 liquids - Glossary of over 200 terms and abbreviations
Annual Symposium on Photomask Technology
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 606
Book Description
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 606
Book Description
16th European Conference EMC on Mask Technology for Integrated Circuits and Micro-Components '99
Author: Uwe Behringer (Engineer.)
Publisher:
ISBN: 9783800725038
Category : Integrated circuits
Languages : en
Pages : 227
Book Description
Publisher:
ISBN: 9783800725038
Category : Integrated circuits
Languages : en
Pages : 227
Book Description
Design of Polymeric Platforms for Selective Biorecognition
Author: Juan RodrÃguez-Hernández
Publisher: Springer
ISBN: 3319170619
Category : Technology & Engineering
Languages : en
Pages : 388
Book Description
This book addresses in an integrated manner all the critical aspects for building the next generation of biorecognition platforms - from biomolecular recognition to surface fabrication. The most recent strategies reported to create surface nano and micropatterns are thoroughly analyzed. This book contains descriptions of the types of molecules immobilized at surfaces that can be used for specific biorecognition, how to immobilize them, and how to control their arrangement and functionality at the surface. Small molecules, peptides, proteins and oligonucleotides are at the core of the biorecognition processes and will constitute a special part of this book. The authors include detailed information on biological processes, biomolecular screening, biosensing, diagnostic and detection devices, tissue engineering, development of biocompatible materials and biomedical devices.
Publisher: Springer
ISBN: 3319170619
Category : Technology & Engineering
Languages : en
Pages : 388
Book Description
This book addresses in an integrated manner all the critical aspects for building the next generation of biorecognition platforms - from biomolecular recognition to surface fabrication. The most recent strategies reported to create surface nano and micropatterns are thoroughly analyzed. This book contains descriptions of the types of molecules immobilized at surfaces that can be used for specific biorecognition, how to immobilize them, and how to control their arrangement and functionality at the surface. Small molecules, peptides, proteins and oligonucleotides are at the core of the biorecognition processes and will constitute a special part of this book. The authors include detailed information on biological processes, biomolecular screening, biosensing, diagnostic and detection devices, tissue engineering, development of biocompatible materials and biomedical devices.