Updates in Advanced Lithography PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Updates in Advanced Lithography PDF full book. Access full book title Updates in Advanced Lithography by Sumio Hosaka. Download full books in PDF and EPUB format.
Author: Sumio Hosaka
Publisher: BoD – Books on Demand
ISBN: 9535111752
Category : Science
Languages : en
Pages : 264
Get Book Here
Book Description
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.
Author: Sumio Hosaka
Publisher: BoD – Books on Demand
ISBN: 9535111752
Category : Science
Languages : en
Pages : 264
Get Book Here
Book Description
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.
Author: Yayi Wei
Publisher: SPIE Press
ISBN: 0819475572
Category : Art
Languages : en
Pages : 338
Get Book Here
Book Description
This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning.
Author: Zheng Cui
Publisher: Springer
ISBN: 3319393618
Category : Technology & Engineering
Languages : en
Pages : 442
Get Book Here
Book Description
This second edition of Nanofabrication is one of the most comprehensive introductions on nanofabrication technologies and processes. A practical guide and reference, this book introduces readers to all of the developed technologies that are capable of making structures below 100nm. The principle of each technology is introduced and illustrated with minimum mathematics involved. Also analyzed are the capabilities of each technology in making sub-100nm structures, and the limits of preventing a technology from going further down the dimensional scale. This book provides readers with a toolkit that will help with any of their nanofabrication challenges.
Author: Andreas Erdmann
Publisher:
ISBN: 9781510639010
Category :
Languages : en
Pages :
Get Book Here
Book Description
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : ru
Pages : 704
Get Book Here
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: Bruce W. Smith
Publisher: CRC Press
ISBN: 1420051539
Category : Technology & Engineering
Languages : en
Pages : 866
Get Book Here
Book Description
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Author: Manu Srivastava
Publisher: CRC Press
ISBN: 1351049364
Category : Technology & Engineering
Languages : en
Pages : 320
Get Book Here
Book Description
There is a growing need for manufacturing optimization all over the world. The immense market of Additive Manufacturing (AM) technologies dictates a need for a book that will provide knowledge of the various aspects of AM for anyone interested in learning about this fast-growing topic. This book disseminates knowledge of AM amongst scholars at graduate level, post graduate level, doctoral level, as well as industry personnel. The objective is to offer a state-of-the-art book which covers all aspects of AM and incorporates all information regarding trends, historical developments, classifications, materials, tooling, software issues, dynamic design, principles, limitations, and communication interfaces in a one-stop resource. Features: Breaks down systematic coverage of various aspects of AM within four distinct sections Contains details of various AM techniques based on ASTM guidelines Discusses many AM applications with suitable illustrations Includes recent trends in the field of AM Covers engineering materials utilized as raw materials in AM Compares AM techniques with different traditional manufacturing methods
Author: Tommaso Baldacchini
Publisher: William Andrew
ISBN: 032335405X
Category : Technology & Engineering
Languages : en
Pages : 514
Get Book Here
Book Description
Three-Dimensional Microfabrication Using Two-Photon Polymerization (TPP) is the first comprehensive guide to TPP microfabrication—essential reading for researchers and engineers in areas where miniaturization of complex structures is key, such as in the optics, microelectronics, and medical device industries. TPP stands out among microfabrication techniques because of its versatility, low costs, and straightforward chemistry. TPP microfabrication attracts increasing attention among researchers and is increasingly employed in a range of industries where miniaturization of complex structures is crucial: metamaterials, plasmonics, tissue engineering, and microfluidics, for example. Despite its increasing importance and potential for many more applications, no single book to date is dedicated to the subject. This comprehensive guide, edited by Professor Baldacchini and written by internationally renowned experts, fills this gap and includes a unified description of TPP microfabrication across disciplines. The guide covers all aspects of TPP, including the pros and cons of TPP microfabrication compared to other techniques, as well as practical information on material selection, equipment, processes, and characterization. Current and future applications are covered and case studies provided as well as challenges for adoption of TPP microfabrication techniques in other areas are outlined. The freeform capability of TPP is illustrated with numerous scanning electron microscopy images. - Comprehensive account of TPP microfabrication, including both photophysical and photochemical aspects of the fabrication process - Comparison of TPP microfabrication with conventional and unconventional micromanufacturing techniques - Covering applications of TPP microfabrication in industries such as microelectronics, optics and medical devices industries, and includes case studies and potential future directions - Illustrates the freeform capability of TPP using numerous scanning electron microscopy images
Author: Daniela Nunes
Publisher: Elsevier
ISBN: 0443216576
Category : Technology & Engineering
Languages : en
Pages : 619
Get Book Here
Book Description
Flexible devices based on metal oxides: Achievements and prospects focuses on the integration of flexibility in electronic circuitry, sensing applications, energy conversion and storage, and environmental remediation. Flexibility in these applications offers great potential, especially in the areas of wearable sensors, solar cells, transistors, electronic skin, and human body monitoring. The book investigates flexible and wearable devices based on metal oxide nanostructures or thin films that are capable of bending, rolling, compression, and folding, all while maintaining their performance. Metal oxide nanomaterials display exceptional properties that include mechanical stress tolerance, high optical transparency, high carrier mobilities, wide band gap, high dielectric constant, and superconductivity, amongst others. In some cases, they are also earth abundant, environmentally benign, cost-effective, chemically stable, and compatible with low-cost wet-chemical synthesis routes. The focus of the book is on wearables manufactured using sustainable manufacturing methods and integrated into substrates that are flexible, inexpensive, recyclable, abundant, and lightweight, including polymer, textile, cellulose and cork substrates. - Provides a comprehensive guide to flexibility in next-generation devices and applications - Emphasizes green technologies and sustainability in production, including substrates - Considers current and future problems for the continued development of flexible devices and applications
Author: Burn Jeng Lin
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9781510639959
Category : Lasers
Languages : en
Pages : 0
Get Book Here
Book Description
This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
