Ultra-Clean Technology Handbook PDF Download
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Author: Ohmi
Publisher: Routledge
ISBN: 1351406426
Category : Science
Languages : en
Pages : 948
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Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: Ohmi
Publisher: Routledge
ISBN: 1351406426
Category : Science
Languages : en
Pages : 948
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Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: Tadahiro Ōmi
Publisher:
ISBN:
Category : Manufacturing processes
Languages : en
Pages :
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Book Description
Author: Ohmi
Publisher: CRC Press
ISBN: 9780367402341
Category :
Languages : en
Pages : 944
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Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: S. Lerman
Publisher:
ISBN:
Category : Saline water conversion
Languages : en
Pages : 1
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Book Description
This work is the first in what appears to be a comprehensive treatise on ultraclean technology in the semiconductor industry and other industries that require ultraclean technology. As the title indicates, this is a handbook, or more accurately, an in-depth encyclopedic treatment of the subject. Its audience includes scientists, engineers, and others involved with virtually any aspect of ultrapure water, and, although the author's target is the semiconductor industry, this volume is valuable to anyone working with ultrapure water.
Author:
Publisher:
ISBN:
Category : Clean rooms
Languages : en
Pages : 157
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Book Description
Author: Karen Reinhardt
Publisher: William Andrew
ISBN: 0815517734
Category : Technology & Engineering
Languages : en
Pages : 749
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Book Description
The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process Editors are two of the top names in the field and are both extensively published Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol
Author: Karen A. Reinhardt
Publisher: John Wiley & Sons
ISBN: 1118099516
Category : Technology & Engineering
Languages : en
Pages : 596
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Book Description
Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.
Author: Tadahiro Ohmi
Publisher: CRC Press
ISBN: 1420026860
Category : Science
Languages : en
Pages : 400
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Book Description
As science pushes closer toward the atomic size scale, new challenges arise to slow the pace of the miniaturization that has transformed our society and fueled the information age. New technologies are necessary to surpass these obstacles and realize the tremendous growth predicted by Moore's law. Assembled from the works of pioneering researchers, Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing presents new developments and technologies for producing the next generation of electronic circuits and displays. This book introduces radical-reaction-based semiconductor manufacturing technologies that overcome the limitations of the existing molecule-reaction-based technologies. It systematically details the procedures and underlying concepts involved in wet process technologies and applications. Following an introduction to semiconductor surface chemical electronics, expert contributors discuss the principles and technology of high-performance wet cleaning; etching technologies and processes; antistatic technology; wet vapor resist stripping technology; and process and safety technologies including waste reclamation, chemical composition control, and ultrapure water and liquid chemical supply systems and materials for fluctuation-free facilities. Currently, large production runs are needed to balance the costs of acquiring and tuning equipment for specialized operating conditions. Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing explains the technologies and processes used to meet the demand for variety and low volumes that exists in today's digital electronics marketplace.
Author: Zeman
Publisher: Routledge
ISBN: 135143151X
Category : Medical
Languages : en
Pages : 642
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Book Description
Integrates knowledge on microfiltration and ultrification, membrane chemistry, and characterization methods with the engineering and economic aspects of device performance, device and module design, processes, and applications. The text provides a discussion of membrane fundamentals and an analytical framework for designing and developing new filtrations systems for a broad range of technologically important functions. It offers information on membrane liquid precursors, fractal and stochastic pore space analysis, novel and advanced module designs, and original process design calculations.
Author: Allan Johansson
Publisher: CRC Press
ISBN: 9780873715034
Category : Technology & Engineering
Languages : en
Pages : 212
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Book Description
Due to pressure from government regulations, the design and development of new manufacturing processes are shifting to pollution prevention and waste reduction at the source through the implementation of proper process and product design. Clean Technology incorporates ideas for pollution prevention/waste reduction at the early stages of process design and development. It covers guidelines for development projects, provides background information, and presents general principles for sound engineering together with pollution reduction alternatives. Industrial and hazardous waste, process engineering, energy systems, materials and product design, recycling, and biodegradability are among the subjects discussed. Market mechanisms, economy in production, and policy questions are also covered. Clean Technology will be an important reference for environmental engineers, process and design engineers, consultants, students, and libraries. It provides engineers, consultants, and students with background and techniques for improved waste reduction and pollution control through proper engineering. It will also be a valuable textbook for advanced engineering programs that are working within today's environmental policies.
