Ultra Clean Processing of Semiconductor Surfaces XI PDF Download
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Author: Paul Mertens
Publisher: Trans Tech Publications Ltd
ISBN: 3038139084
Category : Technology & Engineering
Languages : en
Pages : 328
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Book Description
Selected, peer reviewed papers from the 11th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 17-19, 2012, Gent, Belgium
Author: Paul Mertens
Publisher: Trans Tech Publications Ltd
ISBN: 3038139084
Category : Technology & Engineering
Languages : en
Pages : 328
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Book Description
Selected, peer reviewed papers from the 11th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 17-19, 2012, Gent, Belgium
Author: Paul Mertens
Publisher: Trans Tech Publications Limited
ISBN: 9783038139089
Category : Technology & Engineering
Languages : en
Pages : 350
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Book Description
Selected, peer reviewed papers from the 11th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 17-19, 2012, Gent, Belgium
Author: Paul Mertens
Publisher:
ISBN:
Category : Electronic book
Languages : en
Pages : 350
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Book Description
Annotation This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications. Also covered are studies of general topics such as particle removal using acoustic enhancement, the removal of metallic contamination, pattern collapse of fine flexible and fragile features, wetting and drying, contamination control and contamination metrology. The FEOL and BEOL contributions also treat the surface chemistry of silicon and other semiconductors, cleaning related to new gate stacks, cleaning at the interconnect level, resist strip and polymer removal, cleaning and contamination control for various new materials and cleaning following CMP (chemical mechanical polishing).
Author: Paul Mertens
Publisher: Trans Tech Publications Ltd
ISBN: 3038131954
Category : Technology & Engineering
Languages : en
Pages : 383
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Book Description
Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) held in Antwerp, Belgium, September 18-20, 2006
Author: Takeshi Hattori
Publisher: Springer Science & Business Media
ISBN: 3662035359
Category : Technology & Engineering
Languages : en
Pages : 634
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Book Description
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Author: Paul Mertens
Publisher: Trans Tech Publications Ltd
ISBN: 3038130257
Category : Technology & Engineering
Languages : en
Pages : 383
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Book Description
UCPSS 2004 Proceddings of the 7th International Symposium on Ultra Cleyn Processing of Silicon Surfaces (UCPSS), Brussels, Belgium, Sept. 20-22, 2004
Author: Marc Heyns
Publisher: Trans Tech Publications Ltd
ISBN: 3035706832
Category : Technology & Engineering
Languages : en
Pages : 311
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Book Description
Proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 1998
Author: Takeshi Hattori
Publisher: The Electrochemical Society
ISBN: 1566777429
Category : Semiconductor wafers
Languages : en
Pages : 407
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Book Description
This issue of ECS Transactions includes papers presented during the 11th International Symposium on Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing held during the ECS Fall Meeting in Vienna, Austria, October 4-9, 2009.
Author: Takeshi Hattori
Publisher: The Electrochemical Society
ISBN: 156677568X
Category : Microelectronics
Languages : en
Pages : 497
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Book Description
This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.
Author: Ohmi
Publisher: Routledge
ISBN: 1351406426
Category : Science
Languages : en
Pages : 948
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Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
