Ultra Clean Processing of Semiconductor Surfaces X PDF Download
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Author: Paul Mertens
Publisher: Trans Tech Publications Ltd
ISBN: 3038137006
Category : Technology & Engineering
Languages : en
Pages : 365
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Book Description
Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20-22, 2010, Ostend, Belgium
Author: Paul Mertens
Publisher: Trans Tech Publications Ltd
ISBN: 3038137006
Category : Technology & Engineering
Languages : en
Pages : 365
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Book Description
Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20-22, 2010, Ostend, Belgium
Author: Paul Mertens
Publisher: Trans Tech Publications Ltd
ISBN: 3038131954
Category : Technology & Engineering
Languages : en
Pages : 383
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Book Description
Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) held in Antwerp, Belgium, September 18-20, 2006
Author: Paul W. Mertens
Publisher: Trans Tech Publications Ltd
ISBN: 3035730849
Category : Technology & Engineering
Languages : en
Pages : 395
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Book Description
Selected, peer reviewed papers from the 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 12-14, 2016, Knokke, Belgium
Author: Jerzy Rużyłło
Publisher: The Electrochemical Society
ISBN: 9781566771887
Category : Technology & Engineering
Languages : en
Pages : 668
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Book Description
Author:
Publisher:
ISBN:
Category : Contamination control
Languages : en
Pages : 426
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Book Description
Author:
Publisher: The Electrochemical Society
ISBN: 9781566772594
Category : Technology & Engineering
Languages : en
Pages : 636
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Book Description
Author: A. Haase
Publisher: World Scientific
ISBN: 9789810230852
Category : Science
Languages : en
Pages : 726
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Book Description
To honour W C Rntgen and review the entire area of X-ray development in the various fields of natural, technical, and life sciences, his successors at the Physikalisches Institut of the Universitt Wrzburg organized a conference, named ?Rntgen Centennial?. It took place at the new ?Physikalisches Institut? not far from the historical site shortly before the actual 100th anniversary of the discovery. Over forty renowned scientists were invited as representative speakers in the various subfields of X-ray activities. They reviewed the development, gave examples, and described the present status. Most of them provided survey articles, which are gathered in this book. Since most X-ray-related activities are somehow represented, an almost complete overview of the entire field is provided. This book thus represents the enormous breadth of X-ray activities and allows one to recognize the potential and quality of today's X-ray research.
Author: Paul Mertens
Publisher:
ISBN: 9783908454038
Category :
Languages : en
Pages : 400
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Book Description
Author: Richard E. Novak
Publisher: The Electrochemical Society
ISBN: 9781566771153
Category : Technology & Engineering
Languages : en
Pages : 642
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Book Description
Author: Michael Liehr
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 440
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Book Description
Wafer cleaning, microcontamination and surface passivation are the key focus of this proceedings volume, the 3rd in a successful series from MRS. It is a field in which control of surface chemistry and surface morphology, as well as particle and molecular contamination removal, are of critical importance. This volume expands the scope of the topic to include ultraclean technology in a broader sense, emphasizing the identification and characterization of trace contamination, strategies for removal, and equipment considerations, as well as critical limits for impact on devices. Novel processes, such as chemical mechanical polishing (CMP), and their ramifications for contamination removal are also addressed.
