Transactions: Symposium session papers

Transactions: Symposium session papers PDF Author:
Publisher:
ISBN:
Category : Soil science
Languages : en
Pages : 480

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Transactions: Symposium session papers

Transactions: Symposium session papers PDF Author:
Publisher:
ISBN:
Category : Soil science
Languages : en
Pages : 466

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Ashrae Transactions 2008 Winter Meeting, New York

Ashrae Transactions 2008 Winter Meeting, New York PDF Author:
Publisher:
ISBN: 9789997028815
Category :
Languages : en
Pages :

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Ashrae Transactions 2007 Winter Meeting, Dallas, Tx

Ashrae Transactions 2007 Winter Meeting, Dallas, Tx PDF Author:
Publisher:
ISBN: 9789997023261
Category :
Languages : en
Pages :

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Papers and Transactions for ... and Proceedings of the ... Annual Meeting

Papers and Transactions for ... and Proceedings of the ... Annual Meeting PDF Author: Connecticut Society of Civil Engineers. Meeting
Publisher:
ISBN:
Category : Civil engineering
Languages : en
Pages : 184

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Sixty-first Annual Meeting Papers

Sixty-first Annual Meeting Papers PDF Author:
Publisher: ASTM International
ISBN:
Category :
Languages : en
Pages : 66

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Proceedings of the IRE.

Proceedings of the IRE. PDF Author:
Publisher:
ISBN:
Category : Radio
Languages : en
Pages : 1248

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ULSI Process Integration 9

ULSI Process Integration 9 PDF Author: C. Claeys
Publisher: The Electrochemical Society
ISBN: 1607686759
Category :
Languages : en
Pages : 335

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Publications of the Geological Survey

Publications of the Geological Survey PDF Author: Geological Survey (U.S.)
Publisher:
ISBN:
Category : Geology
Languages : en
Pages : 876

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Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment PDF Author: E. P. Gusev
Publisher: The Electrochemical Society
ISBN: 1566777917
Category : Science
Languages : en
Pages : 426

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These proceedings describe processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics: strained Si/SiGe and Si/SiGe on insulator; high-mobility channels including III-V¿s, etc.; nanowires and carbon nanotubes; high-k dielectrics, metal and FUSI gate electrodes; doping/annealing for ultra-shallow junctions; low-resistivity contacts; advanced deposition (e.g. ALD, CVD, MBE), RTP, UV, plasma and laser-assisted processes.

Semiconductor Process Integration 10

Semiconductor Process Integration 10 PDF Author: J. Murota
Publisher: The Electrochemical Society
ISBN: 1607688212
Category :
Languages : en
Pages : 325

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