Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films PDF Download
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Author: David Christopher Gilmer
Publisher:
ISBN:
Category :
Languages : en
Pages : 314
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Author: David Christopher Gilmer
Publisher:
ISBN:
Category :
Languages : en
Pages : 314
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Book Description
Author: Daniel Dobkin
Publisher: Springer Science & Business Media
ISBN: 9781402012488
Category : Technology & Engineering
Languages : en
Pages : 298
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Book Description
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author: Peter M. Martin
Publisher: William Andrew
ISBN: 0815520328
Category : Technology & Engineering
Languages : en
Pages : 932
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Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Author: Polly Wanda Chu
Publisher:
ISBN:
Category :
Languages : en
Pages : 434
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Book Description
Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.
Author: Jiaguo Yu
Publisher:
ISBN: 9783110429152
Category :
Languages : en
Pages :
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Author: Theodor Schneller
Publisher: Springer Science & Business Media
ISBN: 3211993118
Category : Technology & Engineering
Languages : en
Pages : 801
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Book Description
This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.
Author: Mark Donald Allendorf
Publisher: The Electrochemical Society
ISBN: 9781566772785
Category : Technology & Engineering
Languages : en
Pages : 826
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Book Description
Author: Dongfang Yang
Publisher: BoD – Books on Demand
ISBN: 1789233267
Category : Technology & Engineering
Languages : en
Pages : 520
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Book Description
Titanium dioxide is currently being used in many industrial products. It provides unique photocatalytic properties for water splitting and purification, bacterial inactivation, and organics degradation. It has also been widely used as the photoanode for dye-sensitized solar cells and coatings for self-cleaning surfaces, biomedical implants, and nanomedicine. This book covers various aspects of titanium dioxide nanomaterials including their unique one-dimensional, two-dimensional, mesoporous, and hierarchical nanostructures and their synthetic methods such as sol-gel, hydrothermal, anodic oxidation, and electrophoretic deposition, as well as its key applications in environmental and energy sectors. Through these 24 chapters written by experts from the international scientific community, readers will have access to a comprehensive overview of the recent research and development findings on the titanium dioxide nanomaterials.
Author: Francesco Parrino
Publisher: Elsevier
ISBN: 0128204346
Category : Technology & Engineering
Languages : en
Pages : 735
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Book Description
Scientific interest in TiO2-based materials has exponentially grown in the last few decades. Titanium Dioxide (TiO2) and Its Applications introduces the main physicochemical properties of TiO2 which are the basis of its applications in various fields. While the basic principles of the TiO2 properties have been the subject of various previous publications, this book is mainly devoted to TiO2 applications. The book includes contributions written by experts from a wide range of disciplines in order to address titanium dioxide's utilization in energy, consumer, materials, devices, and catalytic applications. The various applications identified include: photocatalysis, catalysis, optics, electronics, energy storage and production, ceramics, pigments, cosmetics, sensors, and heat transfer. Titanium Dioxide (TiO2) and Its Applications is suitable for a wide readership in the disciplines of materials science, chemistry, and engineering in both academia and industry. - Includes a wide range of current and emerging applications of titanium dioxide in the fields of energy, consumer applications, materials, and devices - Provides a brief overview of titanium dioxide and its properties, as well as techniques to design, deposit, and study the material - Discusses the relevant properties, preparation methods, and other apposite considerations in each application-focused chapter
Author: Pietro Mandracci
Publisher: BoD – Books on Demand
ISBN: 1789849608
Category : Technology & Engineering
Languages : en
Pages : 166
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Book Description
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
