Author: Kamil A. Valiev
Publisher: Springer Science & Business Media
ISBN: 146153318X
Category : Science
Languages : en
Pages : 502
Book Description
This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.
The Physics of Submicron Lithography
Author: Kamil A. Valiev
Publisher: Springer Science & Business Media
ISBN: 146153318X
Category : Science
Languages : en
Pages : 502
Book Description
This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.
Publisher: Springer Science & Business Media
ISBN: 146153318X
Category : Science
Languages : en
Pages : 502
Book Description
This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.
Submicron Lithography
Author: Phillip D. Blais
Publisher:
ISBN:
Category : Art
Languages : en
Pages : 200
Book Description
Publisher:
ISBN:
Category : Art
Languages : en
Pages : 200
Book Description
Submicron Lithography
Author:
Publisher:
ISBN:
Category : Photolithography
Languages : en
Pages : 0
Book Description
Publisher:
ISBN:
Category : Photolithography
Languages : en
Pages : 0
Book Description
The Physics Of Submicron Lithography
Author: K.A. Valiev
Publisher:
ISBN:
Category :
Languages : it
Pages : 0
Book Description
Publisher:
ISBN:
Category :
Languages : it
Pages : 0
Book Description
Lithography for Submicron Structures
Author:
Publisher:
ISBN:
Category : Ion beam lithography
Languages : en
Pages : 208
Book Description
Publisher:
ISBN:
Category : Ion beam lithography
Languages : en
Pages : 208
Book Description
Submicron Lithography
Author: Phillip D. (chairman Blais (editor))
Publisher:
ISBN:
Category :
Languages : en
Pages : 179
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 179
Book Description
Patterning of Material Layers in Submicron Region
Author: U. S. Tandon
Publisher: John Wiley & Sons
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 206
Book Description
It invokes the interests of the reader into the wonderland of nanominiaturization for industrial, biological and fundamental applications. Its contents portray the advent and relevance of submicron structures and proffer a perception of materials, modules and schemes for preparing them.
Publisher: John Wiley & Sons
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 206
Book Description
It invokes the interests of the reader into the wonderland of nanominiaturization for industrial, biological and fundamental applications. Its contents portray the advent and relevance of submicron structures and proffer a perception of materials, modules and schemes for preparing them.
On submicron electron beam lithography using field emission cathodes
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 10
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 10
Book Description
On Submicron Electron Beam Lithography Using Field Emission Cathodes
Author: Göran Stille
Publisher:
ISBN:
Category :
Languages : en
Pages : 20
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 20
Book Description
Electron Beam Lithography and Dry Processing for Submicron Fabrication
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 414
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 414
Book Description