Studies of Atomic Nitrogen in Low Pressure Discharges by Two-Photon Laser Induced Fluorescence PDF Download
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Author: Steven Frank Adams
Publisher:
ISBN: 9781423542940
Category :
Languages : en
Pages : 366
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Book Description
A series of diagnostic experiments have been compiled to investigate rf and microwave discharges in N2, such as those used for plasma processing of electronic materials. To develop a picture, as complete as possible, of the discharge chemistry, several reactive intermediates, e.g. N, N2(A), N2(B) and N2(C), were monitored. An alternative two-photon laser induced fluorescence (TALIF) scheme for detection of atomic nitrogen has been characterized and used to monitor and evaluate various atomic nitrogen sources. Photodissociation of N2O and subsequent detection of N atom photofragments by TALIF was also performed using the 207 NM laser pulse. From measurements within the pulsed rf discharge, a kinetic model was developed which predicted absolute concentrations of various discharge species. The behavior of several discharge species were also monitored in the N2 microwave discharge and compared to the model for the addition of small amounts of H2 and NH3. Atomic nitrogen destruction by surface and volume reaction was investigated by temporal N atom decay within a pulsed rf discharge. The volume loss rate of atomic nitrogen was also quantified to be substantially increased with the addition of as little as 0.1% O2 in an N2 rf discharge.
Author: Steven Frank Adams
Publisher:
ISBN: 9781423542940
Category :
Languages : en
Pages : 366
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Book Description
A series of diagnostic experiments have been compiled to investigate rf and microwave discharges in N2, such as those used for plasma processing of electronic materials. To develop a picture, as complete as possible, of the discharge chemistry, several reactive intermediates, e.g. N, N2(A), N2(B) and N2(C), were monitored. An alternative two-photon laser induced fluorescence (TALIF) scheme for detection of atomic nitrogen has been characterized and used to monitor and evaluate various atomic nitrogen sources. Photodissociation of N2O and subsequent detection of N atom photofragments by TALIF was also performed using the 207 NM laser pulse. From measurements within the pulsed rf discharge, a kinetic model was developed which predicted absolute concentrations of various discharge species. The behavior of several discharge species were also monitored in the N2 microwave discharge and compared to the model for the addition of small amounts of H2 and NH3. Atomic nitrogen destruction by surface and volume reaction was investigated by temporal N atom decay within a pulsed rf discharge. The volume loss rate of atomic nitrogen was also quantified to be substantially increased with the addition of as little as 0.1% O2 in an N2 rf discharge.
Author: William K. Bischel
Publisher:
ISBN:
Category :
Languages : en
Pages : 5
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Book Description
Author: Peter David Brewer
Publisher:
ISBN:
Category : Fluorescence
Languages : en
Pages : 196
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Book Description
Author: Paul K. Chu
Publisher: CRC Press
ISBN: 1466509902
Category : Science
Languages : en
Pages : 497
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Book Description
Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.
Author: David Lloyd Arthur Rall
Publisher:
ISBN:
Category :
Languages : en
Pages : 354
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Book Description
Author: J. Leon Shohet
Publisher: CRC Press
ISBN: 1482214318
Category : Technology & Engineering
Languages : en
Pages : 1654
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Book Description
Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail)
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Author:
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 1470
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Book Description
Author: Anton Nikiforov
Publisher: BoD – Books on Demand
ISBN: 1838802495
Category : Science
Languages : en
Pages : 146
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Book Description
Plasma as the fourth state of matter is an ionized gas consisting of both negative and positive ions, electrons, neutral atoms, radicals, and photons. In the last few decades, atmospheric-pressure plasmas have started to attract increasing attention from both scientists and industry due to a variety of potential applications. Because of increasing interest in the topic, the focus of this book is on providing engineers and scientists with a fundamental understanding of the physical and chemical properties of different atmospheric-pressure plasmas via plasma diagnostic techniques and their applications. The book has been organized into two parts. Part I focuses on the latest achievements in advanced diagnostics of different atmospheric-pressure plasmas. Part II deals with applications of different atmospheric-pressure plasmas.
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 804
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Book Description
Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 708
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Book Description
