Spectroscopic Ellipsometry And Reflectometry User'S Guide PDF Download
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Author: H.G. Tompkins
Publisher:
ISBN:
Category :
Languages : it
Pages : 0
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Book Description
Author: H.G. Tompkins
Publisher:
ISBN:
Category :
Languages : it
Pages : 0
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Book Description
Author: Harland G. Tompkins
Publisher: Wiley-Interscience
ISBN: 9780471181729
Category : Science
Languages : en
Pages : 0
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Book Description
While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers in a variety of disciplines, it addresses a broad range of applications in physics, chemistry, electrical engineering, and materials science.
Author: Harland G. Tompkins
Publisher: Courier Corporation
ISBN: 0486151921
Category : Technology & Engineering
Languages : en
Pages : 496
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Book Description
This text on optics for graduate students explains how to determine material properties and parameters for inaccessible substrates and unknown films as well as how to measure extremely thin films. Its 14 case studies illustrate concepts and reinforce applications of ellipsometry — particularly in relation to the semiconductor industry and to studies involving corrosion and oxide growth. A User's Guide to Ellipsometry will enable readers to move beyond limited turn-key applications of ellipsometers. In addition to its comprehensive discussions of the measurement of film thickness and optical constants in film, it also considers the trajectories of the ellipsometric parameters Del and Psi and how changes in materials affect parameters. This volume also addresses the use of polysilicon, a material commonly employed in the microelectronics industry, and the effects of substrate roughness. Three appendices provide helpful references.
Author: Harland Tompkins
Publisher: William Andrew
ISBN: 0815517475
Category : Science
Languages : en
Pages : 887
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Book Description
The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.
Author: Harland G. Tompkins
Publisher: Momentum Press
ISBN: 1606507281
Category : Technology & Engineering
Languages : en
Pages : 138
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Book Description
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
Author: Michael Bass
Publisher: McGraw Hill Professional
ISBN: 0071629254
Category : Technology & Engineering
Languages : en
Pages : 1251
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Book Description
The most comprehensive and up-to-date optics resource available Prepared under the auspices of the Optical Society of America, the five carefully architected and cross-referenced volumes of the Handbook of Optics, Third Edition, contain everything a student, scientist, or engineer requires to actively work in the field. From the design of complex optical systems to world-class research and development methods, this definitive publication provides unparalleled access to the fundamentals of the discipline and its greatest minds. Individual chapters are written by the world's most renowned experts who explain, illustrate, and solve the entire field of optics. Each volume contains a complete chapter listing for the entire Handbook, extensive chapter glossaries, and a wealth of references. This pioneering work offers unprecedented coverage of optics data, techniques, and applications. Volume I covers geometrical and physical optics, polarized light, components, and instruments.
Author: Toru Yoshizawa
Publisher: CRC Press
ISBN: 1351831844
Category : Technology & Engineering
Languages : en
Pages : 744
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Book Description
Handbook of Optical Metrology: Principles and Applications begins by discussing key principles and techniques before exploring practical applications of optical metrology. Designed to provide beginners with an introduction to optical metrology without sacrificing academic rigor, this comprehensive text: Covers fundamentals of light sources, lenses, prisms, and mirrors, as well as optoelectronic sensors, optical devices, and optomechanical elements Addresses interferometry, holography, and speckle methods and applications Explains Moiré metrology and the optical heterodyne measurement method Delves into the specifics of diffraction, scattering, polarization, and near-field optics Considers applications for measuring length and size, displacement, straightness and parallelism, flatness, and three-dimensional shapes This new Second Edition is fully revised to reflect the latest developments. It also includes four new chapters—nearly 100 pages—on optical coherence tomography for industrial applications, interference microscopy for surface structure analysis, noncontact dimensional and profile metrology by video measurement, and optical metrology in manufacturing technology.
Author: Hiroyuki Fujiwara
Publisher: John Wiley & Sons
ISBN: 9780470060186
Category : Technology & Engineering
Languages : en
Pages : 388
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Book Description
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
Author: Rointan Framroze Bunshah
Publisher: William Andrew
ISBN: 0815513372
Category : Science
Languages : en
Pages : 888
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Book Description
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
Author: Syed Rizvi
Publisher: CRC Press
ISBN: 1420028782
Category : Technology & Engineering
Languages : en
Pages : 728
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Book Description
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
