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Author:
Publisher:
ISBN:
Category : Fluid dynamics
Languages : en
Pages : 318
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Book Description
Author:
Publisher:
ISBN:
Category : Fluid dynamics
Languages : en
Pages : 318
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Book Description
Author: Tōhoku Daigaku. Ryūtai Kagaku Kenkyūjo
Publisher:
ISBN:
Category : Plasma engineering
Languages : en
Pages : 318
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Book Description
Author: National Research Council
Publisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88
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Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author: K. Nanbu
Publisher:
ISBN:
Category :
Languages : en
Pages : 318
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Book Description
Author: Michael A. Lieberman
Publisher: John Wiley & Sons
ISBN: 0471724246
Category : Science
Languages : en
Pages : 795
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Book Description
A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
Author: Toshiro Kaneko
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: Andrzej Stankiewicz
Publisher: CRC Press
ISBN: 9780203913291
Category : Technology & Engineering
Languages : en
Pages : 556
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Book Description
The first guide to compile current research and frontline developments in the science of process intensification (PI), Re-Engineering the Chemical Processing Plant illustrates the design, integration, and application of PI principles and structures for the development and optimization of chemical and industrial plants. This volume updates professionals on emerging PI equipment and methodologies to promote technological advances and operational efficacy in chemical, biochemical, and engineering environments and presents clear examples illustrating the implementation and application of specific process-intensifying equipment and methods in various commercial arenas.
Author: Emilio Martines
Publisher: MDPI
ISBN: 3039287362
Category : Technology & Engineering
Languages : en
Pages : 174
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Book Description
There is growing interest in the use of physical plasmas (ionized gases) for biomedical applications, especially in the framework of so-called “plasma medicine”, which exploits the action of low-power, atmospheric pressure plasmas for therapeutic purposes. Such plasmas are “cold plasmas”, in the sense that only electrons have a high temperature, whereas ions and the neutral gas particles are at or near room temperature. As a consequence, the “plasma flame” can be directly applied to living matter without appreciable thermal load. Reactive chemical species, charged particles, visible and UV radiation, and electric fields are interaction channels of the plasma with pathogens, cells, and tissues, which can trigger a variety of different responses. Possible applications include disinfection, wound healing, cancer treatment, non-thermal blood coagulation, just to mention some. The understanding of the mechanisms of plasma action on living matter requires a strongly interdisciplinary approach, with competencies ranging from plasma physics and technology to chemistry, to biology and finally to medicine. This book is a collection of work that explores recent advances in this field.
Author:
Publisher:
ISBN:
Category : Weights and measures
Languages : en
Pages : 476
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Book Description
Author: Michael A. Lieberman
Publisher: John Wiley & Sons
ISBN: 1394245378
Category : Technology & Engineering
Languages : en
Pages : 837
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Book Description
A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
