The Silicon Dragon

The Silicon Dragon PDF Author: Terence Tsai
Publisher: Edward Elgar Publishing
ISBN: 1847203132
Category : Business & Economics
Languages : en
Pages : 253

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Book Description
The Silicon Dragon is a systematic study of the growth of high-tech giants in the Greater China Region, depicting the success story of the microelectronics industry in Taiwan. Literature and studies on Taiwan s success are surprisingly limited, and this book aims to fill this gap, addressing questions such as: How has Taiwan achieved such an outstanding performance in the information industry? How did Taiwan obtain and maintain its competitive advantage? What was the secret of success? What role did the government and manufacturers play during the development process? What insights can newcomers gain from these achievements? The book examines the government policies that acted as catalysts to the growth of high-tech industries in Taiwan, along with the roles of high-tech incubators and government-administered science parks. The authors provide case studies of high profile companies including Acer, Philips Semiconductors and Macronix International, and interviews with key decision makers to highlight the corporate strategies adopted in response to government policies and global commercial demand. Finally, insightful narratives on the birth and growth of a government-fostered strategic industry are provided, as is a synopsis of the Asian contribution to the evolution of the global microelectronics development. This book will strongly appeal to academics, researchers and students with an interest in engineering, technology and business management. Business managers and government officials will also find much to interest them in this book.

The Silicon Dragon

The Silicon Dragon PDF Author: Terence Tsai
Publisher: Edward Elgar Publishing
ISBN: 1847203132
Category : Business & Economics
Languages : en
Pages : 253

Get Book Here

Book Description
The Silicon Dragon is a systematic study of the growth of high-tech giants in the Greater China Region, depicting the success story of the microelectronics industry in Taiwan. Literature and studies on Taiwan s success are surprisingly limited, and this book aims to fill this gap, addressing questions such as: How has Taiwan achieved such an outstanding performance in the information industry? How did Taiwan obtain and maintain its competitive advantage? What was the secret of success? What role did the government and manufacturers play during the development process? What insights can newcomers gain from these achievements? The book examines the government policies that acted as catalysts to the growth of high-tech industries in Taiwan, along with the roles of high-tech incubators and government-administered science parks. The authors provide case studies of high profile companies including Acer, Philips Semiconductors and Macronix International, and interviews with key decision makers to highlight the corporate strategies adopted in response to government policies and global commercial demand. Finally, insightful narratives on the birth and growth of a government-fostered strategic industry are provided, as is a synopsis of the Asian contribution to the evolution of the global microelectronics development. This book will strongly appeal to academics, researchers and students with an interest in engineering, technology and business management. Business managers and government officials will also find much to interest them in this book.

Handbook of Semiconductor Manufacturing Technology

Handbook of Semiconductor Manufacturing Technology PDF Author: Yoshio Nishi
Publisher: CRC Press
ISBN: 1420017667
Category : Technology & Engineering
Languages : en
Pages : 1722

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Book Description
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

NASA Reference Publication

NASA Reference Publication PDF Author:
Publisher:
ISBN:
Category : Astronautics
Languages : en
Pages : 1092

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Book Description


Silicon Shield

Silicon Shield PDF Author: Craig Addison
Publisher: Authorlink
ISBN: 9781928704898
Category : Political Science
Languages : en
Pages : 0

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Book Description
Taiwan's Protection Against Chinese Attack

Non-linear Electromagnetic Systems

Non-linear Electromagnetic Systems PDF Author: Paolo Di Barba
Publisher: IOS Press
ISBN: 9781586030247
Category : Electromagnetism
Languages : en
Pages : 762

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Book Description
This text is a collection of contributions covering a wide range of topics of interdisciplinary character, from materials to systems, from microdevices to large equipment, with special emphasis on emerging subjects and particular attention to advanced computational methods in order to model both devices and systems. The book provides the solution to challenging problems of research on non-linear electromagnetic systems and is expected to help researchers working in this broad area.

Radio-Frequency Integrated-Circuit Engineering

Radio-Frequency Integrated-Circuit Engineering PDF Author: Cam Nguyen
Publisher: John Wiley & Sons
ISBN: 0471398209
Category : Technology & Engineering
Languages : en
Pages : 898

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Book Description
Die Technologie komplementärer Metalloxid-Halbleiter (Complementary Metal-Oxide Semiconductor, CMOS) kommt bei der Fertigung integrierter Schaltkreise zum Einsatz. In diesem Fachbuch werden Theorie, Analyse, Eigenschaften (Hochfrequenz/Hochgeschwindigkeit) und Anwendungen von Leiterplatten-Übertragungsleitungen, die in integrierten Schaltkreisen und Systemen verwendet werden, ausführlich behandelt. Weitere Themen sind Anwendungen in allen Bereichen der Hochfrequenztechnik, einschließlich drahtlose Kommunikation, Optik und Computer. Das Fachbuch ist durch das Lösungshandbuch ideal für Studenten im höheren Grundstudium, Ingenieure für Hochfrequenz-Mikrowellentechnik, Optikingenieure, Ingenieure für Festkörperbauelemente und für Computeringenieure.

NASA Tech Briefs

NASA Tech Briefs PDF Author:
Publisher:
ISBN:
Category : Technology
Languages : en
Pages : 558

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Book Description


Beam Processing Technologies

Beam Processing Technologies PDF Author: Norman G. Einspruch
Publisher: Academic Press
ISBN: 148321785X
Category : Technology & Engineering
Languages : en
Pages : 559

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Book Description
Beam Processing Technologies is a collection of papers that deals with the miniaturization of devices that will be faster, consume less power, and cost less per operation or fabrication. One paper discusses metal oxide semiconductor (MOS) integrated circuit technology including the operation of devices whose lateral and vertical dimensions are scaled down. If the devices' silicon doping profiles are increased by the same scale factor, they can operate on lower voltages and currents, with the same performance. Another paper describes laser beam processing and wafer-scale integration as techniques to increase the number of devices on a silicon chip. Electron beam technologies can be used in many fabrication processes such as in microlithography, selective oxidation, doping, metrology. Ion beam applications depend on the presence of the ion introduced into the device (e.g. implantation doping), on pseudoelastic collisions (e.g. physical sputtering or crystal damage), and on inelastic scattering (e.g. polymer resist exposure). Silicon molecular beam epitaxy (SiMBE) can also grow high-quality layers at low temperature, particularly concerning germanium, especially as reagrds the growth system design and utilization of n- and p-type doping. Chemical beam epitaxy (CBE) is another epitaxial growth technique that can surpass MBE and metal organic chemical vapor deposition (MO-CVD). The collection is suitable chemical engineers, industrial physicists, and researchers whose work involve micro-fabrication and development of integrated circuits.

Advances in Cryogenic Engineering

Advances in Cryogenic Engineering PDF Author: R.W. Fast
Publisher: Springer Science & Business Media
ISBN: 1461533686
Category : Science
Languages : en
Pages : 729

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Book Description
Proceedings of the 1991 Cryogenic Engineering Conference held in Huntsville, Alabama, June 11-14, 1991.

Official Gazette of the United States Patent and Trademark Office

Official Gazette of the United States Patent and Trademark Office PDF Author:
Publisher:
ISBN:
Category : Patents
Languages : en
Pages : 854

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Book Description