Silicon Selective Epitaxial Growth by Low Pressure Chemical Vapor Deposition

Silicon Selective Epitaxial Growth by Low Pressure Chemical Vapor Deposition PDF Author: Yangchin Shih
Publisher:
ISBN:
Category :
Languages : en
Pages : 394

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Silicon Selective Epitaxial Growth by Low Pressure Chemical Vapor Deposition

Silicon Selective Epitaxial Growth by Low Pressure Chemical Vapor Deposition PDF Author: Yangchin Shih
Publisher:
ISBN:
Category :
Languages : en
Pages : 394

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Selective Silicon Epitaxial Growth at 800[degrees]C by Ultralow-pressure Chemical Vapor Deposition Using SiH4 and SiH4/H2

Selective Silicon Epitaxial Growth at 800[degrees]C by Ultralow-pressure Chemical Vapor Deposition Using SiH4 and SiH4/H2 PDF Author: Tri-Rung Yew
Publisher:
ISBN:
Category :
Languages : en
Pages : 26

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Selective Epitaxy of Silicon at Low Temperatures

Selective Epitaxy of Silicon at Low Temperatures PDF Author: Jen-Chung Lou
Publisher:
ISBN:
Category :
Languages : en
Pages : 392

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Low Temperature Silicon Epitaxy by Low Pressure Chemical Vapor Deposition with and Without Plasma Enchancement

Low Temperature Silicon Epitaxy by Low Pressure Chemical Vapor Deposition with and Without Plasma Enchancement PDF Author: Wayne Robert Burger
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 119

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Proceedings of the ... International Conference on Chemical Vapor Deposition

Proceedings of the ... International Conference on Chemical Vapor Deposition PDF Author:
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 1294

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Low Temperature Silicon Epitaxy by Low Pressure Chemical Vapor Deposition with and Without Plasma Enhancement

Low Temperature Silicon Epitaxy by Low Pressure Chemical Vapor Deposition with and Without Plasma Enhancement PDF Author: Wayne Robert Burger
Publisher:
ISBN:
Category :
Languages : en
Pages : 238

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Hot-wall Silicon Epitaxy

Hot-wall Silicon Epitaxy PDF Author: Carl Johan Galewski
Publisher:
ISBN:
Category :
Languages : en
Pages : 680

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Silicon Epitaxy

Silicon Epitaxy PDF Author:
Publisher: Elsevier
ISBN: 0080541003
Category : Science
Languages : en
Pages : 514

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Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.

Low Temperature Silicon Epitaxy Using Low Pressure Chemical Vapor Deposition with and Without Plasma Enhancement

Low Temperature Silicon Epitaxy Using Low Pressure Chemical Vapor Deposition with and Without Plasma Enhancement PDF Author: Thomas Joseph Donahue
Publisher:
ISBN:
Category : Silicon crystals
Languages : en
Pages : 9

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Low-temperature Silicon Epitaxy Deposited by Very Low Pressure Chemical Vapor Deposition

Low-temperature Silicon Epitaxy Deposited by Very Low Pressure Chemical Vapor Deposition PDF Author: T. J. Donahue
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 30

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