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Author: Hitoshi Habuka
Publisher: LAP Lambert Academic Publishing
ISBN: 9783659583001
Category :
Languages : en
Pages : 504
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Book Description
Silicon is an excellent material for microelectronics, power electronics and solar cells. For these applications, silicon films and surfaces are convenient. But, its production needs significantly high level process technology and engineering. This book provides the scientific approaches to the actual semiconductor silicon production problems. By separating and classifying the phenomena into chemistry, physics and chemical engineering, really simple understanding is possible. The silicon epitaxial growth and doping are the combination of chemical reactions occurring under the gas flow and temperature fields. The etching and surface contamination are similar. Rapid thermal process and flash lamp annealing are simple physics. For solving the cross linked chemistry and physics, numerical calculations are the useful and powerful tool. From the work considering the classical and advanced chemistry utilizing hydrogen, trichlorosilane, chlorine trifluoride and other gases, scientists and engineers will find a new route shedding future materials process development.
Author: Hitoshi Habuka
Publisher: LAP Lambert Academic Publishing
ISBN: 9783659583001
Category :
Languages : en
Pages : 504
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Book Description
Silicon is an excellent material for microelectronics, power electronics and solar cells. For these applications, silicon films and surfaces are convenient. But, its production needs significantly high level process technology and engineering. This book provides the scientific approaches to the actual semiconductor silicon production problems. By separating and classifying the phenomena into chemistry, physics and chemical engineering, really simple understanding is possible. The silicon epitaxial growth and doping are the combination of chemical reactions occurring under the gas flow and temperature fields. The etching and surface contamination are similar. Rapid thermal process and flash lamp annealing are simple physics. For solving the cross linked chemistry and physics, numerical calculations are the useful and powerful tool. From the work considering the classical and advanced chemistry utilizing hydrogen, trichlorosilane, chlorine trifluoride and other gases, scientists and engineers will find a new route shedding future materials process development.
Author: K. N. Tu
Publisher: Elsevier
ISBN: 1483218295
Category : Technology & Engineering
Languages : en
Pages : 351
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Book Description
Treatise on Materials Science and Technology, Volume 24: Preparation and Properties of Thin Films covers the progress made in the preparation of thin films and the corresponding study of their properties. The book discusses the preparation and property correlations in thin film; the variation of microstructure of thin films; and the molecular beam epitaxy of superlattices in thin film. The text also describes the epitaxial growth of silicon structures (thermal-, laser-, and electron-beam-induced); the characterization of grain boundaries in bicrystalline thin films; and the mechanical properties of thin films on substrates. The ion beam modification of thin film; the use of thin alloy films for metallization in microelectronic devices; and the fabrication and physical properties of ultrasmall structures are also encompassed. Materials scientists and materials engineers will find the book invaluable.
Author: V. G. Lifshits
Publisher: John Wiley & Sons
ISBN:
Category : Science
Languages : en
Pages : 472
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Book Description
Divided into two parts, this work begins with preliminary comments regarding the definition of ``surface phases'' and briefly describes the basics of two-dimensional crystallography, including background information about the formation and characterization of surface phases on silicon. The second half is devoted to the particular ``adsorbate/Si'' systems. Contains data on 300 plus surface structures formed on clean Si(111), Si(100) and Si(110) surfaces in the presence of foreign atoms at submonolayer coverages as well as without adsorbates at all. 64 adsorbates are reviewed along with preparation techniques of surface phases, models of their atomic structure and a description of surface properties and surface-related phenomena.
Author: E. T. Peters
Publisher:
ISBN:
Category : Boron
Languages : en
Pages : 14
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Book Description
Author: Sami Franssila
Publisher: John Wiley & Sons
ISBN: 1119991897
Category : Technology & Engineering
Languages : en
Pages : 534
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Book Description
This accessible text is now fully revised and updated, providing an overview of fabrication technologies and materials needed to realize modern microdevices. It demonstrates how common microfabrication principles can be applied in different applications, to create devices ranging from nanometer probe tips to meter scale solar cells, and a host of microelectronic, mechanical, optical and fluidic devices in between. Latest developments in wafer engineering, patterning, thin films, surface preparation and bonding are covered. This second edition includes: expanded sections on MEMS and microfluidics related fabrication issues new chapters on polymer and glass microprocessing, as well as serial processing techniques 200 completely new and 200 modified figures more coverage of imprinting techniques, process integration and economics of microfabrication 300 homework exercises including conceptual thinking assignments, order of magnitude estimates, standard calculations, and device design and process analysis problems solutions to homework problems on the complementary website, as well as PDF slides of the figures and tables within the book With clear sections separating basic principles from more advanced material, this is a valuable textbook for senior undergraduate and beginning graduate students wanting to understand the fundamentals of microfabrication. The book also serves as a handy desk reference for practicing electrical engineers, materials scientists, chemists and physicists alike. www.wiley.com/go/Franssila_Micro2e
Author: Rointan Framroze Bunshah
Publisher: William Andrew
ISBN: 0815513372
Category : Science
Languages : en
Pages : 888
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Book Description
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
Author: Anjana Devi
Publisher: The Electrochemical Society
ISBN: 9781566774277
Category : Technology & Engineering
Languages : en
Pages : 1128
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Book Description
Author: Sina Ebnesajjad
Publisher: William Andrew
ISBN: 1437744621
Category : Science
Languages : en
Pages : 449
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Book Description
Handbook of Adhesives and Surface Preparation provides a thoroughly practical survey of all aspects of adhesives technology from selection and surface preparation to industrial applications and health and environmental factors. The resulting handbook is a hard-working reference for a wide range of engineers and technicians working in the adhesives industry and a variety of industry sectors that make considerable use of adhesives. Particular attention is given to adhesives applications in the automotive, aerospace, medical, dental and electronics sectors. - A handbook that truly focuses on the applied aspects of adhesives selection and applications: this is a book that won't gather dust on the shelf - Provides practical techniques for rendering materials surfaces adherable - Sector-based studies explore the specific issues for automotive and aerospace, medical, dental and electronics
Author: Arup Bhattacharyya
Publisher: CRC Press
ISBN: 1351798324
Category : Technology & Engineering
Languages : en
Pages : 512
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Book Description
The primary focus of this book is on basic device concepts, memory cell design, and process technology integration. The first part provides in-depth coverage of conventional nonvolatile memory devices, stack structures from device physics, historical perspectives, and identifies limitations of conventional devices. The second part reviews advances made in reducing and/or eliminating existing limitations of NVM device parameters from the standpoint of device scalability, application extendibility, and reliability. The final part proposes multiple options of silicon based unified (nonvolatile) memory cell concepts and stack designs (SUMs). The book provides Industrial R&D personnel with the knowledge to drive the future memory technology with the established silicon FET-based establishments of their own. It explores application potentials of memory in areas such as robotics, avionics, health-industry, space vehicles, space sciences, bio-imaging, genetics etc.
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 412
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Book Description
