Semiconductor materials analysis and fabrication process control : proceedings of Symposium D on Diagnostic Techniques for Semiconductor Materials Analysis and Fabrication Process Control of the 1992 E-MRS Spring Conference ; Strasbourg, France, June 2 - 5, 1992 PDF Download
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Author: G. M. Crean
Publisher:
ISBN:
Category :
Languages : en
Pages : 338
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Book Description
Author: G. M. Crean
Publisher:
ISBN:
Category :
Languages : en
Pages : 338
Get Book Here
Book Description
Author: G. M. Crean
Publisher: North Holland
ISBN: 9780444899088
Category : Ellipsometry
Languages : en
Pages : 338
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Book Description
Reviews current research in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Contributions discuss the emergence and evaluation of in situ optical diagnostic techniques, such as photoreflectance and spectroellipsometry.
Author: G.M. Crean
Publisher: Elsevier
ISBN: 0444596917
Category : Science
Languages : en
Pages : 352
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Book Description
There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.
Author: G. M Crean
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: European Materials Research Society. Meeting
Publisher: North Holland
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 186
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Book Description
Single chamber processing has attracted the attention of a number of researchers as well as industries as an alternative processing "philosophy" to complement or even replace the stringent environment of micro- and optoelectronics device fabrication. Up till now single chamber processing has been an elusive manufacturing objective throughout the history of integrated circuit technology. With the emergence of integrated processing tools in recent years, significant segments for continuous fabrication processes have been successfully realised and their potential has already innovated the industry. The 14 papers in this volume cover topics such as: The background of this approach and up-dated status; Design and concepts of relevant cluster tools equipment; Specific process modules such as deposition chambers (CVD, RTCVD, UVCVD, ...) annealing or etching reactors; and Standardization efforts. The work will provide both a stimulus for future research in this field, as well as useful reference material on the new technology trends in microelectronic device manufacturing technology.
Author: G. M. Crean
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author: R. Stuck
Publisher:
ISBN:
Category :
Languages : en
Pages : 338
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Book Description
Author: Dieter K. Schroder
Publisher: The Electrochemical Society
ISBN: 9781566770927
Category : Technology & Engineering
Languages : en
Pages : 408
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Book Description
Author: Bernd O. Kolbesen (Chemiker.)
Publisher: The Electrochemical Society
ISBN: 9781566772396
Category : Technology & Engineering
Languages : en
Pages : 568
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Book Description
Author: M. Meyyappan
Publisher: The Electrochemical Society
ISBN: 9781566771368
Category : Technology & Engineering
Languages : en
Pages : 366
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