Fundamentals of Semiconductor Manufacturing and Process Control PDF Download
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Author: Gary S. May
Publisher: John Wiley & Sons
ISBN: 0471790273
Category : Technology & Engineering
Languages : en
Pages : 428
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Book Description
A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Author: Gary S. May
Publisher: John Wiley & Sons
ISBN: 0471790273
Category : Technology & Engineering
Languages : en
Pages : 428
Get Book Here
Book Description
A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Author: G. M. Crean
Publisher: North Holland
ISBN: 9780444899088
Category : Ellipsometry
Languages : en
Pages : 338
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Book Description
Reviews current research in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Contributions discuss the emergence and evaluation of in situ optical diagnostic techniques, such as photoreflectance and spectroellipsometry.
Author:
Publisher:
ISBN:
Category : Weights and measures
Languages : en
Pages : 790
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Book Description
Author: Y.I. Nissim
Publisher: Elsevier
ISBN: 0444596933
Category : Technology & Engineering
Languages : en
Pages : 173
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Book Description
Single chamber processing has attracted the attention of a number of researchers as well as industries as an alternative processing "philosophy" to complement or even replace the stringent environment of micro- and optoelectronics device fabrication. Up till now single chamber processing has been an elusive manufacturing objective throughout the history of integrated circuit technology. With the emergence of integrated processing tools in recent years, significant segments for continuous fabrication processes have been successfully realised and their potential has already innovated the industry. The 14 papers in this volume cover topics such as: The background of this approach and up-dated status; Design and concepts of relevant cluster tools equipment; Specific process modules such as deposition chambers (CVD, RTCVD, UVCVD, ...) annealing or etching reactors; and Standardization efforts. The work will provide both a stimulus for future research in this field, as well as useful reference material on the new technology trends in microelectronic device manufacturing technology.
Author: B.G. Yacobi
Publisher: Springer Science & Business Media
ISBN: 0306473615
Category : Science
Languages : en
Pages : 233
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Book Description
The main objective of this book is to provide an introductory perspective of the basic principles of semiconductors, being an integrated overview of the basic properties, applications, and characterization of semiconductors in a single volume. This book is suitable for both undergraduate and graduate students, and for researchers, working in a wide variety of fields in physical and engineering sciences, who require an introductory and concise description of the field of semiconductors.
Author: N.F. de Rooij
Publisher: Elsevier
ISBN: 0444596305
Category : Technology & Engineering
Languages : en
Pages : 559
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Book Description
This book contains the proceedings of 3 symposia dealing with various aspects of small scale structures. Symposium A deals with the development of new materials, including ceramics, polymers, metals, etc., their microstructuring as well as their potential for application in microsystems. All kinds of microsystems are considered, e.g. mechanical, magnetic, optical, chemical, biochemical and issues related to assembly and packaging were also covered.Symposium B deals with four topics: synthesis and preparation of nanostructured ceramics and composites with well-controlled geometric order and chemical composition; coupling of these structures to transducers for current and future chemical and biochemical devices based upon microoptics, microelectronics, microionics, microelectrodes or molecular cages; planar thin film structures and the control of covalent thin film/transducer couplings, the control of selective, stable and sensitive recognition centers at the surface, at grain boundaries or in the bulk of selected nanostructured materials with extremely narrow particle size distributions; analysis of these structures and sensor functions by means of techniques utilizing photons, electrons, ions, or atomic particle beam probes.Symposium E examines the structure-property relationships in thin films and multilayers, from the point of view of both fundamental studies and practical applications.
Author: A. Borghesi
Publisher: Newnes
ISBN: 044459633X
Category : Technology & Engineering
Languages : en
Pages : 580
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Book Description
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Author: P.L.F. Hemment
Publisher: Newnes
ISBN: 0444596313
Category : Technology & Engineering
Languages : en
Pages : 630
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Book Description
Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.
Author: Y. Shiraki
Publisher: Elsevier
ISBN: 0444596895
Category : Science
Languages : en
Pages : 289
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Book Description
The preparation of silicon germanium microstructures, their physical, chemical and electrical characterization, and their device processing and application are reviewed in this book. Special emphasis is given to ultrathin Si/Ge superlattices. Topics covered include: Wafer preparation and epitaxial growth; surface effects driven phenomena, such as clustering, segregation, 'surfactants'; Analysis, both in situ and ex situ; Strain adjustment methods; High quality buffers; Modification of material properties by quantum wells and superlattices; Devices: Novel concepts, processing, modelling, demonstrators. The questions highlighted, particularly those articles comparing related or competing activities, will provide a wealth of knowledge for all those interested in the future avenues of theory and applications in this field.
Author: E.H.C. Parker
Publisher: Newnes
ISBN: 0444596437
Category : Technology & Engineering
Languages : en
Pages : 465
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Book Description
This book contains the proceedings of two symposia which brought together crystal growers, chemists and physicists from across the world. The first part is concerned with silicon molecular beam epitaxy and presents an overview of the most research being done in the field. Part two discusses the problems dealing with purification, doping and defects of II-VI materials, mainly of the important semiconductors CdTe and ZnSe. The focus is on materials science issues which are the key for a better understanding of these materials and for any industrial application.
