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Author: Ampere A. Tseng
Publisher: World Scientific
ISBN: 9812790896
Category : Technology & Engineering
Languages : en
Pages : 583
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Book Description
Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.
Author: Ampere A. Tseng
Publisher: World Scientific
ISBN: 9812790896
Category : Technology & Engineering
Languages : en
Pages : 583
Get Book Here
Book Description
Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.
Author: Bharat Bhushan
Publisher: Springer Science & Business Media
ISBN: 3642035353
Category : Technology & Engineering
Languages : en
Pages : 975
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Book Description
This book presents the physical and technical foundation of the state-of-the-art in applied scanning probe techniques. It constitutes a comprehensive overview of SPM applications. The chapters are written by leading researchers and application scientists.
Author: Bharat Bhushan
Publisher: Springer Science & Business Media
ISBN: 3642104975
Category : Technology & Engineering
Languages : en
Pages : 823
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Book Description
This book presents the physical and technical foundation of the state of the art in applied scanning probe techniques. It constitutes a timely and comprehensive overview of SPM applications. The chapters in this volume relate to scanning probe microscopy techniques, characterization of various materials and structures and typical industrial applications, including topographic and dynamical surface studies of thin-film semiconductors, polymers, paper, ceramics, and magnetic and biological materials. The chapters are written by leading researchers and application scientists from all over the world and from various industries to provide a broader perspective.
Author: Yu Kyoung Ryu
Publisher: CRC Press
ISBN: 1000804860
Category : Technology & Engineering
Languages : en
Pages : 145
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Book Description
The most complete book available on scanning probe lithography (SPL), this work details the modalities, mechanisms, and current technologies, applications, and materials on which SPL can be performed. It provides a comprehensive overview of this simple and cost-effective technique, which does not require clean room conditions and can be performed in any lab or industry facility to achieve high-resolution and high-quality patterns on a wide range of materials: biological, semiconducting, polymers, and 2D materials. • Introduces historical background of SPL, including evolution of the technique and tools • Explains the mechanism of sample modification/manipulation, types of AFM tips, technical parts of the experimental setup, and materials on which the technique can be applied • Shows the different types of devices and structures fabricated by SPL, together with the processing steps • Contains a complete and state-of-the art package of examples and different approaches, performed by different international research groups • Summarizes strengths, limitations, and potential of SPL This book is aimed at advanced students, technicians, and researchers in materials science, microelectronics, and others working with lithographic techniques and fabrication processes.
Author: Umberto Celano
Publisher: Springer
ISBN: 3030156125
Category : Science
Languages : en
Pages : 424
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Book Description
The tremendous impact of electronic devices on our lives is the result of continuous improvements of the billions of nanoelectronic components inside integrated circuits (ICs). However, ultra-scaled semiconductor devices require nanometer control of the many parameters essential for their fabrication. Through the years, this created a strong alliance between microscopy techniques and IC manufacturing. This book reviews the latest progress in IC devices, with emphasis on the impact of electrical atomic force microscopy (AFM) techniques for their development. The operation principles of many techniques are introduced, and the associated metrology challenges described. Blending the expertise of industrial specialists and academic researchers, the chapters are dedicated to various AFM methods and their impact on the development of emerging nanoelectronic devices. The goal is to introduce the major electrical AFM methods, following the journey that has seen our lives changed by the advent of ubiquitous nanoelectronics devices, and has extended our capability to sense matter on a scale previously inaccessible.
Author: Weilie Zhou
Publisher: Springer Science & Business Media
ISBN: 0387396209
Category : Technology & Engineering
Languages : en
Pages : 533
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Book Description
This book presents scanning electron microscopy (SEM) fundamentals and applications for nanotechnology. It includes integrated fabrication techniques using the SEM, such as e-beam and FIB, and it covers in-situ nanomanipulation of materials. The book is written by international experts from the top nano-research groups that specialize in nanomaterials characterization. The book will appeal to nanomaterials researchers, and to SEM development specialists.
Author: Anming Hu
Publisher: Springer Nature
ISBN: 3030593134
Category : Science
Languages : en
Pages : 360
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Book Description
This book provides a comprehensive overview of the latest advances in laser techniques for micro-nano-manufacturing and an in-depth analysis of applications, such as 3D printing and nanojoining. Lasers have gained increasing significance as a precise tool for advanced manufacturing. Written by world leading scientists, the first part of the book presents the fundamentals of laser interaction with materials at the micro- and nanoscale, including multiphoton excitation and nonthermal melting, and allows readers to better understand advanced processing. In the second part, the authors focus on various advanced fabrications, such as laser peening, surface nanoengineering, and plasmonic heating. Finally, case studies are devoted to special applications, such as 3D printing, microfluidics devices, energy devices, and plasmonic and photonic waveguides. This book integrates both theoretical and experimental analysis. The combination of tutorial chapters and concentrated case studies will be critically attractive to undergraduate and graduate students, researchers, and engineers in the relevant fields. Readers will grasp the full picture of the application of laser for micro-nanomanufacturing and 3D printing.
Author: Koji Sugioka
Publisher: MDPI
ISBN: 3038974102
Category : Science
Languages : en
Pages : 155
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Book Description
This book is a printed edition of the Special Issue "Laser-Based Nano Fabrication and Nano Lithography" that was published in Nanomaterials
Author:
Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636
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Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author: Sumio Hosaka
Publisher: BoD – Books on Demand
ISBN: 9535111752
Category : Science
Languages : en
Pages : 264
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Book Description
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.
