Rapid Thermal and Integrated Processing III: Volume 342 PDF Download
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Author: Jimmie J. Wortman
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 472
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: Jimmie J. Wortman
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 472
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author:
Publisher:
ISBN:
Category : Rapid thermal processing
Languages : en
Pages : 416
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Book Description
Author: Magdy F. Iskander
Publisher:
ISBN:
Category : Materials
Languages : en
Pages : 784
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Book Description
Author: Easo P. George
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 584
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: S. P. Murarka
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 794
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Book Description
Author: F. Roozeboom
Publisher: Springer Science & Business Media
ISBN: 9401587116
Category : Science
Languages : en
Pages : 568
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Book Description
Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Author: Marvin J. Weber
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 548
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: Louis J. Terminello
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 368
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Book Description
Volume I in this series promised that the advent of third-generation light sources would enhance synchrotron-based materials research. This second volume fulfills the promise, featuring many experiments that required newer, higher-brightness sources, and could not have been performed with earlier vintage synchrotrons. The book focuses on the characterization of reduced dimensional systems, and highlights studies of surfaces, interfaces, polymers, glasses, thin films, magnetic materials, metal systems, multilayers and electronic materials. Topics include: thin films; magnetic materials; surfaces, clusters, quantum systems, and methods; interfaces (solid/solid, solid/liquid); layered compounds, alloys and novel materials; and microprobe, tomography and microscopy.
Author:
Publisher:
ISBN:
Category : Materials
Languages : en
Pages : 784
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Book Description
Author: Paul Siffert
Publisher: Springer Science & Business Media
ISBN: 3662098970
Category : Technology & Engineering
Languages : en
Pages : 552
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Book Description
With topics ranging from epitaxy through lattice defects and doping to quantum computation, this book provides a personalized survey of the development and use of silicon, the basis for the revolutionary changes in our lives sometimes called "The Silicon Age." Beginning with the very first developments more than 50 years ago, this reports on all aspects of silicon and silicon technology up to its use in exciting new technologies, including a glance at possible future developments.
