Rapid Thermal and Integrated Processing, II, Symposium Held 1993, San Francisco, California, U.S.A. PDF Download
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Author: Materials Research Society
Publisher:
ISBN:
Category :
Languages : en
Pages : 424
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Author: Materials Research Society
Publisher:
ISBN:
Category :
Languages : en
Pages : 424
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Book Description
Author: Jeffrey C. Gelpey
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 448
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: F. Roozeboom
Publisher: Springer Science & Business Media
ISBN: 9401587116
Category : Science
Languages : en
Pages : 568
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Book Description
Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Author: Jeffrey C. Gelpey
Publisher: Cambridge University Press
ISBN: 9781107409491
Category : Technology & Engineering
Languages : en
Pages : 444
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author:
Publisher:
ISBN:
Category : Rapid thermal processing
Languages : en
Pages : 914
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Author: F. Roozeboom
Publisher:
ISBN: 9789401587129
Category :
Languages : en
Pages : 580
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Book Description
Author: J. C. Gelpey
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 416
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Book Description
This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: Dim-Lee Kwong
Publisher: The Electrochemical Society
ISBN: 9781566773157
Category : Technology & Engineering
Languages : en
Pages : 458
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Book Description
"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."
Author:
Publisher:
ISBN:
Category : Rapid thermal processing
Languages : en
Pages : 416
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Book Description
