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Author: Joseph M. Proud
Publisher: Springer Science & Business Media
ISBN: 146845305X
Category : Technology & Engineering
Languages : en
Pages : 589
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Book Description
An Advanced Study Institute on Radiative Processes in Discharge Plasmas was held at the Atholl Palace Hotel, Pitlochry, Perthshire, Scotland, June 23 through July 5, 1985. This publication is the Pro ceedings from that Institute. The Institute was attended by eighty-five Participants and Lecturers representing the United States, Canada, France, West Germany, Greece, The Netherlands, Portugal, Turkey, the United Kingdom, and Switzerland. A distinguished faculty of eighteen Lecturers was assembled and the topical program organized with the assistance of an Advisory Committee composed of: Dr. John Waymouth, USA; Dr. Timm Teich, Switzerland; Dr. Arthur Phelps, USA; Dr. Nicol Peacock, England; Professor Erich Kunhardt, USA; Dr. Anthony Hyder, USA; and Dr. Arthur Guenther, USA. The underlying theme and objective of the Institute was the enhance ment of scientific communication and exchange among academic, industrial, and national laboratory groups having a common concern for radiative processes in discharge plasmas. The program was organized into four major sessions sequentially treating: the fundamental science of visible and near-visible radiation in plasmas; the technology of discharge light sources; recent and novel methods for the generation of plasmas; and an update on advances in laser-based diagnostics. Each major session culmi nated in a panel discussion comprised of the Lecturers for that session.
Author: Joseph M. Proud
Publisher: Springer Science & Business Media
ISBN: 146845305X
Category : Technology & Engineering
Languages : en
Pages : 589
Get Book Here
Book Description
An Advanced Study Institute on Radiative Processes in Discharge Plasmas was held at the Atholl Palace Hotel, Pitlochry, Perthshire, Scotland, June 23 through July 5, 1985. This publication is the Pro ceedings from that Institute. The Institute was attended by eighty-five Participants and Lecturers representing the United States, Canada, France, West Germany, Greece, The Netherlands, Portugal, Turkey, the United Kingdom, and Switzerland. A distinguished faculty of eighteen Lecturers was assembled and the topical program organized with the assistance of an Advisory Committee composed of: Dr. John Waymouth, USA; Dr. Timm Teich, Switzerland; Dr. Arthur Phelps, USA; Dr. Nicol Peacock, England; Professor Erich Kunhardt, USA; Dr. Anthony Hyder, USA; and Dr. Arthur Guenther, USA. The underlying theme and objective of the Institute was the enhance ment of scientific communication and exchange among academic, industrial, and national laboratory groups having a common concern for radiative processes in discharge plasmas. The program was organized into four major sessions sequentially treating: the fundamental science of visible and near-visible radiation in plasmas; the technology of discharge light sources; recent and novel methods for the generation of plasmas; and an update on advances in laser-based diagnostics. Each major session culmi nated in a panel discussion comprised of the Lecturers for that session.
Author: Joseph M. Proud
Publisher:
ISBN: 9781468453065
Category :
Languages : en
Pages : 604
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Book Description
Author: Advanced Study Institute on Radiative Processes in Discharge Plasmas
Publisher:
ISBN:
Category :
Languages : en
Pages : 29
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Book Description
Author: Boris M. Smirnov
Publisher: Springer
ISBN: 3319110659
Category : Science
Languages : en
Pages : 424
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Book Description
This book presents the theory of gas discharge plasmas in a didactical way. It explains the processes in gas discharge plasmas. A gas discharge plasma is an ionized gas which is supported by an external electric field. Therefore its parameters are determined by processes in it. The properties of a gas discharge plasma depend on its gas component, types of external fields, their geometry and regimes of gas discharge. Fundamentals of a gas discharge plasma include elementary, radiative and transport processes which are included in its kinetics influence. They are represented in this book together with the analysis of simple gas discharges. These general principles are applied to stationary gas discharge plasmas of helium and argon. The analysis of such plasmas under certain conditions is theoretically determined by numerical plasma parameters for given regimes and conditions.
Author: André Anders
Publisher: Andre Anders
ISBN: 9783055012631
Category : Plasma (Ionized gases)
Languages : en
Pages : 280
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Book Description
Author: JOSEPH M. PROUD
Publisher:
ISBN: 9780303425502
Category :
Languages : en
Pages : 0
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Book Description
Author: Tao Shao
Publisher: Springer Nature
ISBN: 9819911419
Category : Science
Languages : en
Pages : 1028
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Book Description
This book highlights the latest progress in pulsed discharge plasmas presented by front-line researchers worldwide. The science and technology surrounding pulsed discharge plasmas is advanced through a wide scope of interdisciplinary studies into pulsed power and plasma physics. Pulsed discharge plasmas with high-power density, high E/N and high-energy electrons can effectively generate highly reactive plasma. Related applications have gathered strong interests in various fields. With contributions from global scientists, the book elaborates on the theories, numerical simulations, diagnostic methods, discharge characteristics and application technologies of pulsed discharge plasmas. The book is divided into three parts with a total of 35 chapters, including 11 chapters on pulsed discharge generation and mechanism, 12 chapters on pulsed discharge characterization and 12 chapters on pulsed discharge applications (wastewater treatments, biomedicine, surface modification, and energy conversion, etc). The book is a must-have reference for researchers and engineers in related fields and graduate students interested in the subject.
Author: J. Leon Shohet
Publisher: CRC Press
ISBN: 1351204939
Category : Technology & Engineering
Languages : en
Pages : 3082
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Book Description
Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail)
[email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail)
[email protected]
Author: P.F. Williams
Publisher: Springer Science & Business Media
ISBN: 9401158843
Category : Technology & Engineering
Languages : en
Pages : 610
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Book Description
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author: M.A. Cayless
Publisher: Routledge
ISBN: 1135138087
Category : Architecture
Languages : en
Pages : 553
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Book Description
This book is a comprehensive guide to the theory and practice of lighting. Covering the physics of light production, light sources, circuits and a wide variety of lighting applications, it is both suitable as a detailed textbook and as thoroughly practical guide for practising lighting engineers. This fourth edition of Lamps and Lighting has been completely updated with new chapters on the latest lamp technology and applications. The editors ahve called upon a wide range of expertise and as a result many sections have been broadened to include both European and US practice. The book begins with a description of the fundamentals of light, vision, colour and measurement. Part II, the main section of the book, deals with lamps and control equipment and includes descriptions of all lamp types in use today. Part III on lighting covers both interior and exterior applications.
