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Author: New York Public Library. Research Libraries
Publisher:
ISBN:
Category : Congresses and conventions
Languages : en
Pages : 672
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Book Description
Vols. for 1975- include publications cataloged by the Research Libraries of the New York Public Library with additional entries from the Library of Congress MARC tapes.
Author: New York Public Library. Research Libraries
Publisher:
ISBN:
Category : Congresses and conventions
Languages : en
Pages : 672
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Book Description
Vols. for 1975- include publications cataloged by the Research Libraries of the New York Public Library with additional entries from the Library of Congress MARC tapes.
Author:
Publisher:
ISBN:
Category : Union catalogs
Languages : en
Pages : 1034
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Book Description
Author: Library of Congress
Publisher:
ISBN:
Category : Corporate headings (Cataloging)
Languages : en
Pages : 1044
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Book Description
Author:
Publisher:
ISBN:
Category : Polycyclic aromatic hydrocarbons
Languages : en
Pages : 500
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Book Description
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507
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Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Author: David S. Ensor
Publisher: RTI Press
ISBN: 1934831018
Category : Science
Languages : en
Pages : 584
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Book Description
Aerosol Science and Technology: History and Reviews captures an exciting slice of history in the evolution of aerosol science. It presents in-depth biographies of four leading international aerosol researchers and highlights pivotal research institutions in New York, Minnesota, and Austria. One collection of chapters reflects on the legacy of the Pasadena smog experiment, while another presents a fascinating overview of military applications and nuclear aerosols. Finally, prominent researchers offer detailed reviews of aerosol measurement, processes, experiments, and technology that changed the face of aerosol science. This volume is the third in a series and is supported by the American Association for Aerosol Research (AAAR) History Working Group, whose goal is to produce archival books from its symposiums on the history of aerosol science to ensure a lasting record. It is based on papers presented at the Third Aerosol History Symposium on September 8 and 9, 2006, in St. Paul, Minnesota, USA.
Author: Manajit Sengupta
Publisher:
ISBN:
Category : Solar energy
Languages : en
Pages : 348
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Book Description
Author: H. Kenneth Hudnell
Publisher: Springer Science & Business Media
ISBN: 0387758658
Category : Medical
Languages : en
Pages : 955
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Book Description
With the ever-increasing incidence of harmful cyanobacterial algal blooms, this monograph has added urgency and will be essential reading for all sorts of researchers, from neuroscientists to cancer research specialists. The volume contains the proceedings of the 2005 International Symposium on Cyanobacterial Harmful Algal Blooms, and has been edited by H. Kenneth Hudnell, of the US Environmental Protection Agency. It contains much of the most recent research into the subject.
Author: National Research Council
Publisher: National Academies Press
ISBN: 0309068312
Category : Political Science
Languages : en
Pages : 90
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Book Description
The Committee on Developing a Federal Materials Facilities Strategy was appointed by the National Research Council (NRC) in response to a request by the federal agencies involved in funding and operating multidisciplinary user facilities for research with synchrotron radiation, neutrons, and high magnetic fields. Starting in August 1996, a series of conversations and meetings was held among NRC staff and officials from the National Science Foundation, the Department of Energy, the National Institute of Standards and Technology (Department of Commerce), and the National Institutes of Health. The agencies were concerned that facilities originally developed to support research in materials science were increasingly used by scientists from other fields-particularly the biological sciences-whose research was supported by agencies other than those responsible for the facilities. This trend, together with the introduction of several new, large user facilities in the last decade, led the agencies to seek advice on the possible need for interagency cooperation in the management of these federal research facilities.
Author: Francis F. Chen
Publisher: Springer Science & Business Media
ISBN: 9780306474972
Category : Science
Languages : en
Pages : 228
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Book Description
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
